JPS5916326A - 薄膜の製造方法 - Google Patents

薄膜の製造方法

Info

Publication number
JPS5916326A
JPS5916326A JP57124478A JP12447882A JPS5916326A JP S5916326 A JPS5916326 A JP S5916326A JP 57124478 A JP57124478 A JP 57124478A JP 12447882 A JP12447882 A JP 12447882A JP S5916326 A JPS5916326 A JP S5916326A
Authority
JP
Japan
Prior art keywords
gas
vacuum
thin film
film
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57124478A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0427689B2 (enExample
Inventor
Hajime Ichiyanagi
一柳　肇
Nobuhiko Fujita
藤田　順彦
Hiroshi Kawai
弘 川合
Hideo Itozaki
糸崎　秀夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP57124478A priority Critical patent/JPS5916326A/ja
Publication of JPS5916326A publication Critical patent/JPS5916326A/ja
Publication of JPH0427689B2 publication Critical patent/JPH0427689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H10P14/24—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photovoltaic Devices (AREA)
JP57124478A 1982-07-19 1982-07-19 薄膜の製造方法 Granted JPS5916326A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57124478A JPS5916326A (ja) 1982-07-19 1982-07-19 薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57124478A JPS5916326A (ja) 1982-07-19 1982-07-19 薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS5916326A true JPS5916326A (ja) 1984-01-27
JPH0427689B2 JPH0427689B2 (enExample) 1992-05-12

Family

ID=14886505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57124478A Granted JPS5916326A (ja) 1982-07-19 1982-07-19 薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS5916326A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59161813A (ja) * 1983-03-07 1984-09-12 Agency Of Ind Science & Technol 不純物をド−プした半導体薄膜の製造方法
JPS63224322A (ja) * 1987-03-13 1988-09-19 Sanyo Electric Co Ltd 非晶質シリコンアロイ膜
JPS63257246A (ja) * 1987-04-15 1988-10-25 Hitachi Ltd プラズマｃｖｄ平坦化成膜方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51121255A (en) * 1975-04-16 1976-10-23 Matsushita Electric Ind Co Ltd Production method for thin film with piezo-electric characteristics

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51121255A (en) * 1975-04-16 1976-10-23 Matsushita Electric Ind Co Ltd Production method for thin film with piezo-electric characteristics

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59161813A (ja) * 1983-03-07 1984-09-12 Agency Of Ind Science & Technol 不純物をド−プした半導体薄膜の製造方法
JPS63224322A (ja) * 1987-03-13 1988-09-19 Sanyo Electric Co Ltd 非晶質シリコンアロイ膜
JPS63257246A (ja) * 1987-04-15 1988-10-25 Hitachi Ltd プラズマｃｖｄ平坦化成膜方法

Also Published As

Publication number Publication date
JPH0427689B2 (enExample) 1992-05-12

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