JPS5916255A - 電子銃 - Google Patents

電子銃

Info

Publication number
JPS5916255A
JPS5916255A JP57124342A JP12434282A JPS5916255A JP S5916255 A JPS5916255 A JP S5916255A JP 57124342 A JP57124342 A JP 57124342A JP 12434282 A JP12434282 A JP 12434282A JP S5916255 A JPS5916255 A JP S5916255A
Authority
JP
Japan
Prior art keywords
electron beam
cathode
electrode
deflection
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57124342A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0335775B2 (enrdf_load_stackoverflow
Inventor
Akihira Fujinami
藤波　明平
Tomoaki Sakai
酒井　智昭
Mamoru Kondo
衛 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57124342A priority Critical patent/JPS5916255A/ja
Publication of JPS5916255A publication Critical patent/JPS5916255A/ja
Publication of JPH0335775B2 publication Critical patent/JPH0335775B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP57124342A 1982-07-19 1982-07-19 電子銃 Granted JPS5916255A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57124342A JPS5916255A (ja) 1982-07-19 1982-07-19 電子銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57124342A JPS5916255A (ja) 1982-07-19 1982-07-19 電子銃

Publications (2)

Publication Number Publication Date
JPS5916255A true JPS5916255A (ja) 1984-01-27
JPH0335775B2 JPH0335775B2 (enrdf_load_stackoverflow) 1991-05-29

Family

ID=14882979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57124342A Granted JPS5916255A (ja) 1982-07-19 1982-07-19 電子銃

Country Status (1)

Country Link
JP (1) JPS5916255A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63237340A (ja) * 1987-03-26 1988-10-03 Canon Inc 表示装置
JPS63274048A (ja) * 1987-05-06 1988-11-11 Canon Inc 電子放出素子およびその製造方法
JPS6454649A (en) * 1987-08-26 1989-03-02 Canon Kk Electron emission element
JPS6454650A (en) * 1987-08-26 1989-03-02 Canon Kk Electron emission element
JPH01311929A (ja) * 1988-06-11 1989-12-15 Nitto Denko Corp 車体外装材の固定部材
JPH02186545A (ja) * 1988-11-01 1990-07-20 Internatl Business Mach Corp <Ibm> 荷電粒子ビーム発生装置
US5384463A (en) * 1991-06-10 1995-01-24 Fujisu Limited Pattern inspection apparatus and electron beam apparatus
US5430292A (en) * 1991-06-10 1995-07-04 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5746605A (en) * 1994-06-06 1998-05-05 Red Ant, Inc. Method and system for music training
JP2007518223A (ja) * 2003-12-30 2007-07-05 コミツサリア タ レネルジー アトミーク 発散制御機能を有したハイブリッド型マルチビーム電子放出デバイス
JP2010118361A (ja) * 2005-09-06 2010-05-27 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 放出パターンの放出領域を選択するための装置及び方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63237340A (ja) * 1987-03-26 1988-10-03 Canon Inc 表示装置
JPS63274048A (ja) * 1987-05-06 1988-11-11 Canon Inc 電子放出素子およびその製造方法
JPS6454649A (en) * 1987-08-26 1989-03-02 Canon Kk Electron emission element
JPS6454650A (en) * 1987-08-26 1989-03-02 Canon Kk Electron emission element
JPH01311929A (ja) * 1988-06-11 1989-12-15 Nitto Denko Corp 車体外装材の固定部材
JPH02186545A (ja) * 1988-11-01 1990-07-20 Internatl Business Mach Corp <Ibm> 荷電粒子ビーム発生装置
US5384463A (en) * 1991-06-10 1995-01-24 Fujisu Limited Pattern inspection apparatus and electron beam apparatus
US5430292A (en) * 1991-06-10 1995-07-04 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5746605A (en) * 1994-06-06 1998-05-05 Red Ant, Inc. Method and system for music training
JP2007518223A (ja) * 2003-12-30 2007-07-05 コミツサリア タ レネルジー アトミーク 発散制御機能を有したハイブリッド型マルチビーム電子放出デバイス
JP2010118361A (ja) * 2005-09-06 2010-05-27 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 放出パターンの放出領域を選択するための装置及び方法

Also Published As

Publication number Publication date
JPH0335775B2 (enrdf_load_stackoverflow) 1991-05-29

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