JPS59155924A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS59155924A
JPS59155924A JP58031114A JP3111483A JPS59155924A JP S59155924 A JPS59155924 A JP S59155924A JP 58031114 A JP58031114 A JP 58031114A JP 3111483 A JP3111483 A JP 3111483A JP S59155924 A JPS59155924 A JP S59155924A
Authority
JP
Japan
Prior art keywords
film
resin film
radiation
whole surface
sensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58031114A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0425695B2 (cs
Inventor
Kazuhiko Tsuji
和彦 辻
Masaru Sasago
勝 笹子
Koichi Kugimiya
公一 釘宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58031114A priority Critical patent/JPS59155924A/ja
Publication of JPS59155924A publication Critical patent/JPS59155924A/ja
Publication of JPH0425695B2 publication Critical patent/JPH0425695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58031114A 1983-02-25 1983-02-25 パタ−ン形成方法 Granted JPS59155924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58031114A JPS59155924A (ja) 1983-02-25 1983-02-25 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58031114A JPS59155924A (ja) 1983-02-25 1983-02-25 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS59155924A true JPS59155924A (ja) 1984-09-05
JPH0425695B2 JPH0425695B2 (cs) 1992-05-01

Family

ID=12322370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58031114A Granted JPS59155924A (ja) 1983-02-25 1983-02-25 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS59155924A (cs)

Also Published As

Publication number Publication date
JPH0425695B2 (cs) 1992-05-01

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