JPS59151156A - Mask designing sheet - Google Patents

Abstract

PURPOSE:To obtain a mask designing sheet capable of rapid feedback in response to designing of a circuit or pattern and shortening of time for manufacture of a semiconductor device by forming an electrically conductive material layer on the predetermined part for forming a conductive layer on an insulating base. CONSTITUTION:A mask designing sheet 2 is obtained by forming a layer 2 of a conductive material, such as aluminum foil, on the predetermined part for forming a conductive layer, such as wiring parts or diffusion parts, of an insulating base 1 made of a blank sheet having lines for indicating the border line of data drawn on it. In addition, the insulating bases 1, 3 and the conductive material layers 4, 5 may have such an alternate laminated constitution that a part of each conductive material layer is exposed. The presence of disconnection between the 2 points of the conductive line, wiring resistance, capacity between lines, etc. can be electrically confirmed by using said sheet and needles at optional 2 points of the conductive layer, without depending on confirmation by sight, and checking of a drawing, and detection of defective points can be easily and securely achieved.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a mask design sheet used when designing a semiconductor device.

[Technical backbone of invention]

As is well known, when manufacturing a semiconductor device such as T or SI, a mask design sheet is generally used (1). Conventionally, such a mask design sheet was prepared as shown in FIG. , firstly, after the circuit design,
100 to 1% of the actual mask pattern.
After drawing two lines on a drawing of 1,000 times the size and digitizing the coordinates using a computer, draw the drawing using a plotter (two lines = t). This drawing is the mask design sheet.Here Then, if there are any corrections or errors in the design, perform the circuit design again. Next, visually inspect the mask design sheet.・Carry out turn design. From the above, the LSI photoetching process (
Making masks for the second envoy (mask making).

LSIs are manufactured based on these masks, and the LSI's design is completed. Based on the evaluation, feedback is provided to the circuit design and pattern design.

[Problems with background technology]

However, the mask design sheet mentioned above (the two sides are
Since the drawings are inspected visually, there is a drawback that it is not possible to detect wiring errors in conductive layers such as wiring or to adequately estimate the parasitic resistance of the conductive layers.

As a countermeasure for these, for the former two C, we usually use a computer (
Therefore, although we have performed all design rule checks, we cannot detect cases where conductive layers are incorrectly connected. Also,
There is a method for calculating the latter (the latter two are by computer) by calculating from the k-reading conductive layer, but calculating the two dimensions of width and length generally takes an enormous amount of calculation time. Moreover, it is virtually impossible to measure the resistance between any two points on the conductive layer, so the only way to measure the conductive layer resistance is after the actual step is completed. I can't hit it.

As mentioned above, as the capacity of integrated circuits has increased in recent years, conductive layers have become more complex, and as the chip size increases (2), the possibility of incorrect connections and wiring increases. In addition, as the capacity increases and devices become smaller, the effect of the resistance of the conductive layer tends to increase relatively.This means that the circuit design must be accurate and faithful to it. (Even if it is a two-pattern layout, L
This means that in the worst case, when the SI is completed, it may not work.

Note that the above-mentioned case was discovered by visual inspection after pattern design, but if it were not discovered, there is a possibility that it would be discovered after a long period of time spent manufacturing the LSI or performing defect analysis. There is. Therefore, it takes a lot of time to provide feedback to the circuit design and seven-turn design.

[Purpose of the invention]

The present invention has been made in view of the above-mentioned circumstances, and its entire purpose is to provide a mask design sheet that can provide quick feedback for circuit design and pattern design (2) to shorten the manufacturing period of semiconductor devices.

[Summary of the invention]

The present invention examines the area on which a conductive layer is to be formed (2 conductive material layers are formed) on an insulating base material in an inspection after 9-turn design to determine whether or not there are discontinuities in the conductive layer, and whether or not the conductive layer is parasitic. Resistance can be detected electrically, allowing circuit design and pattern design (
This enables quick feedback and shortens the manufacturing period of semiconductor devices.

[Embodiments of the invention]

Hereinafter, one embodiment of the present invention will be described with reference to FIG. 2(a) and Fbl.

1 in the figure is an insulating base material with a size of 100 (FAX 100 bias) and on which a line indicating the boundary line of ζ data is drawn on a blank sheet of paper. Conductive layers such as wiring and diffusion regions are formed on this insulating base material 1. The planned portion C2 includes a conductive material layer 2 made of, for example, foil.
... is formed. Note that the sheet resistance of the conductive material layer 2 does not necessarily have to conform to the value of the actual device.

However, according to the mask design sheet with the structure described above,
Areas where conductive layers are to be formed, such as wiring and diffusion areas on the insulating base material 1 (
Since two conductive material layers 2... are formed, if the conductive layer is a wiring, it is necessary to touch any two points of the conductive layer with a needle. If the conductive layer is a diffusion region, the wiring resistance can be electrically confirmed using the mask design sheet 5. If the conductive layer is a diffusion region, it is the same as above (and the presence or absence of discontinuity between those contacts and the electrical resistance can be confirmed). can.

It should be noted that the mask design sheet according to the present invention is not limited to that of the above embodiments (for example, as shown in FIG. It is also possible to have a structure in which ≦2 layers are stacked so that each of the conductive material layers 4 and 5 is partially exposed.A mask design sheet for such a structure (= waviness allows the total capacitance between the conductive material layers 4 and 5 to be measured. .

[Effects of the Invention] As described in detail above, the present invention C2 allows electrical detection of the presence or absence of discontinuities in the conductive layer and the parasitic resistance of the conductive layer in the inspection drawing C2 after pattern design, thereby improving circuit design. It is possible to provide a mask design sheet that can be fed back to the mask pattern design and pattern design, and can shorten the entire manufacturing period of semiconductor devices.

[Brief explanation of drawings]

FIG. 1 is a diagram showing the LSI manufacturing process, FIG. 2 (ta+) is a plan view of a mask design sheet showing an embodiment of the present invention, and FIG. FIG. 3 is a cross-sectional view taken along the X-ray ζ2 (al is a plan view of a mask design sheet showing another embodiment of the present invention, and tel of the same figure is a cross-sectional view taken along the Y-Y line C2 of the same figure (α). 1.3... Insulating base material, 2,4.5... Conductive material layer. Figure 1 L--, J Figure 2 (a) - Figure 3 (a) (b)

Claims (1)

[Scope of Claims] (2) When designing a semiconductor device (2) A mask design sheet used (2) A mask design sheet (2) in which a layer on an insulating base material is to be formed (2) (2) Patent No. 14 sought, characterized in that an insulating base material and a conductive material layer are laminated alternately so that each conductive material layer partially protrudes. A mask design sheet according to item 1 of the scope.