JPS59143146A - ミラ−集光型照明光学系 - Google Patents

ミラ−集光型照明光学系

Info

Publication number
JPS59143146A
JPS59143146A JP58018697A JP1869783A JPS59143146A JP S59143146 A JPS59143146 A JP S59143146A JP 58018697 A JP58018697 A JP 58018697A JP 1869783 A JP1869783 A JP 1869783A JP S59143146 A JPS59143146 A JP S59143146A
Authority
JP
Japan
Prior art keywords
conical
light
parallel
optical axis
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58018697A
Other languages
English (en)
Japanese (ja)
Other versions
JPH043528B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Makoto Uehara
誠 上原
Sumio Hashimoto
純夫 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58018697A priority Critical patent/JPS59143146A/ja
Priority to US06/576,477 priority patent/US4637691A/en
Publication of JPS59143146A publication Critical patent/JPS59143146A/ja
Publication of JPH043528B2 publication Critical patent/JPH043528B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/001—Axicons, waxicons, reflaxicons

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58018697A 1983-02-07 1983-02-07 ミラ−集光型照明光学系 Granted JPS59143146A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58018697A JPS59143146A (ja) 1983-02-07 1983-02-07 ミラ−集光型照明光学系
US06/576,477 US4637691A (en) 1983-02-07 1984-02-02 Mirror converging-type illumination optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58018697A JPS59143146A (ja) 1983-02-07 1983-02-07 ミラ−集光型照明光学系

Publications (2)

Publication Number Publication Date
JPS59143146A true JPS59143146A (ja) 1984-08-16
JPH043528B2 JPH043528B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-01-23

Family

ID=11978814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58018697A Granted JPS59143146A (ja) 1983-02-07 1983-02-07 ミラ−集光型照明光学系

Country Status (2)

Country Link
US (1) US4637691A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS59143146A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5345292A (en) * 1992-03-31 1994-09-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
JP2007047335A (ja) * 2005-08-08 2007-02-22 Ricoh Co Ltd 照明装置、光変調装置、及び投射型表示装置

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62266513A (ja) * 1986-05-14 1987-11-19 Canon Inc 投影露光光学系
US4842393A (en) * 1987-07-09 1989-06-27 University Of Houston-University Park Cuspated lens
US4974094A (en) * 1989-12-04 1990-11-27 Yuhkoh Morito Direct lighting/illuminating system for miniature CCD camera
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
DE4109484C2 (de) * 1991-03-22 2001-03-01 Zeiss Carl Fa Meßobjektiv
NL194929C (nl) * 1992-10-20 2003-07-04 Samsung Electronics Co Ltd Projectiebelichtingssysteem.
US5757544A (en) * 1993-03-09 1998-05-26 Olympus Optical Co., Ltd. Image display apparatus
JP2690680B2 (ja) * 1993-11-26 1997-12-10 株式会社ミツトヨ 光電式エンコーダ
WO1996013943A1 (en) * 1994-11-01 1996-05-09 Raychem Corporation Hole eliminator for lamp with reflector
US5953166A (en) * 1995-03-22 1999-09-14 Moritex Corporation Laser trapping apparatus
US5680257A (en) * 1995-07-31 1997-10-21 Texas Instruments Incorporated Light collection optics for spatial light modulator
US5892620A (en) * 1995-10-03 1999-04-06 Stone; Thomas W. Optical shuffle device
US5966250A (en) * 1995-11-30 1999-10-12 Philips Electronics North America Corp. Method and light collection system for producing uniform arc image size
EP2264427B1 (en) 1997-01-31 2017-05-03 Xy, Llc Optical apparatus with focussing reflector for converging radiation onto a flow of particles, and related method of analysis
US6024452A (en) * 1997-04-22 2000-02-15 3M Innovative Properties Company Prismatic light beam homogenizer for projection displays
US6071689A (en) * 1997-12-31 2000-06-06 Xy, Inc. System for improving yield of sexed embryos in mammals
US6149867A (en) * 1997-12-31 2000-11-21 Xy, Inc. Sheath fluids and collection systems for sex-specific cytometer sorting of sperm
EP2283848A1 (en) 1998-07-30 2011-02-16 Xy, Llc Equine system for non-surgical articificial insemination
US7208265B1 (en) * 1999-11-24 2007-04-24 Xy, Inc. Method of cryopreserving selected sperm cells
US6606371B2 (en) 1999-12-20 2003-08-12 Agere Systems Inc. X-ray system
EP2258174A3 (en) * 2000-05-09 2012-06-13 Xy, Llc High purity x-chromosome bearing and y-chromosome bearing populations of spermatozoa
EP1294293A4 (en) * 2000-06-12 2009-11-04 Xy Inc INTEGRATED FLUID MANAGEMENT SYSTEM USING ISOLATED POPULATIONS OF X- AND Y-CHROMOSOME-CARRYING SPERMATOZOES
US20040031071A1 (en) * 2000-10-05 2004-02-12 Xy, Inc. System of hysteroscopic insemination of mares
US7713687B2 (en) 2000-11-29 2010-05-11 Xy, Inc. System to separate frozen-thawed spermatozoa into x-chromosome bearing and y-chromosome bearing populations
WO2002043486A1 (en) 2000-11-29 2002-06-06 Xy, Inc. System for in-vitro fertilization with spermatozoa separated into x-chromosome and y-chromosome bearing populations
US8486618B2 (en) 2002-08-01 2013-07-16 Xy, Llc Heterogeneous inseminate system
CN1674780A (zh) * 2002-08-01 2005-09-28 Xy公司 低压精子分离系统
MXPA05001654A (es) * 2002-08-15 2005-10-18 Xy Inc Citometro de flujo de alta resolucion.
US7169548B2 (en) 2002-09-13 2007-01-30 Xy, Inc. Sperm cell processing and preservation systems
EP2305172B1 (en) 2003-03-28 2016-05-11 Inguran, LLC Apparatus and methods for providing sex-sorted animal sperm
AU2004242121B2 (en) 2003-05-15 2010-06-24 Xy, Llc. Efficient haploid cell sorting for flow cytometer systems
NO320941B1 (no) * 2003-09-12 2006-02-13 Kongsberg Defence & Aerospace Optisk transformator
US7542217B2 (en) * 2003-12-19 2009-06-02 Carl Zeiss Smt Ag Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus
EP1730266A2 (en) 2004-03-29 2006-12-13 Monsanto Technology, LLC Sperm suspensions for sorting into x or y chromosome-bearing enriched populations
BRPI0513685A (pt) 2004-07-22 2008-05-13 Monsanto Technology Llc processo para enriquecimento de uma população de células de esperma
US7618770B2 (en) * 2005-07-29 2009-11-17 Xy, Inc. Methods and apparatus for reducing protein content in sperm cell extenders
US8589851B2 (en) * 2009-12-15 2013-11-19 Memoir Systems, Inc. Intelligent memory system compiler
JP6784260B2 (ja) * 2015-09-30 2020-11-11 ソニー株式会社 光通信コネクタ、光通信ケーブル及び電子機器

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5714117U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1980-06-27 1982-01-25

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3547526A (en) * 1967-10-26 1970-12-15 Kollsman Instr Corp Optical beam cross-section converter
US4498742A (en) * 1981-09-10 1985-02-12 Nippon Kogaku K.K. Illumination optical arrangement

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5714117U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1980-06-27 1982-01-25

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5345292A (en) * 1992-03-31 1994-09-06 Canon Kabushiki Kaisha Illumination device for projection exposure apparatus
US5726740A (en) * 1992-03-31 1998-03-10 Canon Kabushiki Kaisha Projection exposure apparatus having illumination device with ring-like or spot-like light source
JP2007047335A (ja) * 2005-08-08 2007-02-22 Ricoh Co Ltd 照明装置、光変調装置、及び投射型表示装置

Also Published As

Publication number Publication date
JPH043528B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-01-23
US4637691A (en) 1987-01-20

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