JPS59136310A - レンズ用樹脂 - Google Patents

レンズ用樹脂

Info

Publication number
JPS59136310A
JPS59136310A JP1096883A JP1096883A JPS59136310A JP S59136310 A JPS59136310 A JP S59136310A JP 1096883 A JP1096883 A JP 1096883A JP 1096883 A JP1096883 A JP 1096883A JP S59136310 A JPS59136310 A JP S59136310A
Authority
JP
Japan
Prior art keywords
weight
refractive index
methacrylate
resin
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1096883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH039925B2 (enrdf_load_stackoverflow
Inventor
Masahiko Iwano
岩野　雅彦
Koji Arakawa
荒川　興二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyowa Gas Chemical Industry Co Ltd
Original Assignee
Kyowa Gas Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Gas Chemical Industry Co Ltd filed Critical Kyowa Gas Chemical Industry Co Ltd
Priority to JP1096883A priority Critical patent/JPS59136310A/ja
Publication of JPS59136310A publication Critical patent/JPS59136310A/ja
Publication of JPH039925B2 publication Critical patent/JPH039925B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP1096883A 1983-01-26 1983-01-26 レンズ用樹脂 Granted JPS59136310A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1096883A JPS59136310A (ja) 1983-01-26 1983-01-26 レンズ用樹脂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1096883A JPS59136310A (ja) 1983-01-26 1983-01-26 レンズ用樹脂

Publications (2)

Publication Number Publication Date
JPS59136310A true JPS59136310A (ja) 1984-08-04
JPH039925B2 JPH039925B2 (enrdf_load_stackoverflow) 1991-02-12

Family

ID=11764962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1096883A Granted JPS59136310A (ja) 1983-01-26 1983-01-26 レンズ用樹脂

Country Status (1)

Country Link
JP (1) JPS59136310A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5132384A (en) * 1989-11-22 1992-07-21 Nippon Shokubai Co., Ltd. Optical material of low specific gravity and excellent impact resistance, optical molding product using the optical material and manufacturing method thereof
US5281683A (en) * 1991-12-18 1994-01-25 Nippon Shokubai Co., Ltd. Process for producing water-absorbent resin
US5403901A (en) * 1990-11-07 1995-04-04 Nestle S.A. Flexible, high refractive index polymers
US6833391B1 (en) * 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
US7045558B2 (en) 2003-08-29 2006-05-16 General Electric Company Method of making a high refractive index optical management coating and the coating
US7271283B2 (en) 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5132384A (en) * 1989-11-22 1992-07-21 Nippon Shokubai Co., Ltd. Optical material of low specific gravity and excellent impact resistance, optical molding product using the optical material and manufacturing method thereof
US5403901A (en) * 1990-11-07 1995-04-04 Nestle S.A. Flexible, high refractive index polymers
US5433746A (en) * 1990-11-07 1995-07-18 Nestle S.A. Flexible intraocular lenses made from high refractive index polymers
US5674960A (en) * 1990-11-07 1997-10-07 Nestle S.A. Flexible high refractive index, cross-linked, acrylic copolymers
US5861031A (en) * 1990-11-07 1999-01-19 Nestle, S.A. Intraocular lens from arylalkyl(meth)acrylate polymer(s)
US5281683A (en) * 1991-12-18 1994-01-25 Nippon Shokubai Co., Ltd. Process for producing water-absorbent resin
US6833391B1 (en) * 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
US7045558B2 (en) 2003-08-29 2006-05-16 General Electric Company Method of making a high refractive index optical management coating and the coating
US7271283B2 (en) 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom

Also Published As

Publication number Publication date
JPH039925B2 (enrdf_load_stackoverflow) 1991-02-12

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