JPS59132126A - 位置合わせ装置 - Google Patents

位置合わせ装置

Info

Publication number
JPS59132126A
JPS59132126A JP58005184A JP518483A JPS59132126A JP S59132126 A JPS59132126 A JP S59132126A JP 58005184 A JP58005184 A JP 58005184A JP 518483 A JP518483 A JP 518483A JP S59132126 A JPS59132126 A JP S59132126A
Authority
JP
Japan
Prior art keywords
light
mark
light beam
mask
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58005184A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0427683B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Junji Hazama
間　潤治
Shoichi Tanimoto
昭一 谷元
Kinya Kato
欣也 加藤
Hisao Izawa
伊沢　久男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58005184A priority Critical patent/JPS59132126A/ja
Priority to US06/570,189 priority patent/US4636626A/en
Publication of JPS59132126A publication Critical patent/JPS59132126A/ja
Publication of JPH0427683B2 publication Critical patent/JPH0427683B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP58005184A 1983-01-14 1983-01-18 位置合わせ装置 Granted JPS59132126A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58005184A JPS59132126A (ja) 1983-01-18 1983-01-18 位置合わせ装置
US06/570,189 US4636626A (en) 1983-01-14 1984-01-12 Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58005184A JPS59132126A (ja) 1983-01-18 1983-01-18 位置合わせ装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1234596A Division JPH02191314A (ja) 1989-09-12 1989-09-12 パターン検出装置

Publications (2)

Publication Number Publication Date
JPS59132126A true JPS59132126A (ja) 1984-07-30
JPH0427683B2 JPH0427683B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-05-12

Family

ID=11604142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58005184A Granted JPS59132126A (ja) 1983-01-14 1983-01-18 位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS59132126A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6262519A (ja) * 1985-09-13 1987-03-19 Canon Inc 位置検出装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6262519A (ja) * 1985-09-13 1987-03-19 Canon Inc 位置検出装置

Also Published As

Publication number Publication date
JPH0427683B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-05-12

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