JPS5912900A - Method of forming relief - Google Patents

Method of forming relief

Info

Publication number
JPS5912900A
JPS5912900A JP12235282A JP12235282A JPS5912900A JP S5912900 A JPS5912900 A JP S5912900A JP 12235282 A JP12235282 A JP 12235282A JP 12235282 A JP12235282 A JP 12235282A JP S5912900 A JPS5912900 A JP S5912900A
Authority
JP
Japan
Prior art keywords
shadow mask
coating film
relief
pattern
turn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12235282A
Other languages
Japanese (ja)
Other versions
JPH0256239B2 (en
Inventor
柳沢 和典
和彦 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyushu Hitachi Maxell Ltd
Maxell Ltd
Original Assignee
Kyushu Hitachi Maxell Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyushu Hitachi Maxell Ltd, Hitachi Maxell Ltd filed Critical Kyushu Hitachi Maxell Ltd
Priority to JP12235282A priority Critical patent/JPS5912900A/en
Publication of JPS5912900A publication Critical patent/JPS5912900A/en
Publication of JPH0256239B2 publication Critical patent/JPH0256239B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 この発明は、被処理体の表面に紫外線もしくは電子線硬
化性樹脂で文字、記号あるいは図形等の浮彫を一体に形
成する方法に係り、浮彫形成の容易化並びに浮彫文字、
記号1図形の多種多様化を図ることを目的とする。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for integrally forming reliefs such as letters, symbols, or figures on the surface of an object to be treated using ultraviolet rays or electron beam curable resin. ,
The purpose is to diversify the symbol 1 figure.

以下、この発明の実施例を図面に基づき説明する。Embodiments of the present invention will be described below with reference to the drawings.

第1図および第4図において、まず、被処理体1の表面
に紫外線もしくは電子線硬化性樹脂を塗布して塗膜2を
形成し1次いで該塗膜2が未硬化状態の下で該塗膜2の
表面にシャドウマスク3を重ね合わす。第3図に示すよ
うにシャドウマスク3は紫外線もしくは電子線を透過す
る透明薄板からなり、その内面に透明な浮彫文字、記号
あるいは図形のパターン4を表わすべく該パターン4以
外の箇所5を着色して不透明にしである。このシャドウ
マスク3を未硬化な塗膜20表面に重ね合わせてから紫
外線もしくは電子線を照射する。すると、塗1III2
はシャドウマスク3の紫外線もしくは電子線が透過する
パターン4と一致する部分4aのみが硬化し、その他の
着色不透明な箇所5と一致する部分5aが未硬化な状態
のまま残る。しかる後、シャドウマスク3を剥がし、溶
剤で塗膜2の未硬化部分5aを洗浄除去すれば、第2図
に示すごとく被処理体1の表面に目的の文字、記号ある
いは図形等の浮彫6が一体に形成される。
1 and 4, first, a coating film 2 is formed by applying an ultraviolet ray or electron beam curable resin to the surface of an object to be treated 1, and then the coating film 2 is left in an uncured state. A shadow mask 3 is superimposed on the surface of the film 2. As shown in FIG. 3, the shadow mask 3 is made of a transparent thin plate that transmits ultraviolet rays or electron beams, and the inner surface of the shadow mask 3 is colored in areas 5 other than the pattern 4 to represent a pattern 4 of transparent embossed characters, symbols, or figures. It is opaque. This shadow mask 3 is superimposed on the surface of the uncured coating film 20, and then ultraviolet rays or electron beams are irradiated. Then, coating 1III2
Only the portion 4a of the shadow mask 3 that corresponds to the pattern 4 through which ultraviolet rays or electron beams are transmitted is cured, and the other portion 5a that corresponds to the colored opaque portion 5 remains uncured. Thereafter, by peeling off the shadow mask 3 and washing off the uncured portion 5a of the coating film 2 with a solvent, a relief 6 of desired characters, symbols, figures, etc. is created on the surface of the object 1 as shown in FIG. Formed in one piece.

被処理体1の具体例としては1例えば、第6図に示すよ
うに電気かみそり製品が挙げられ、この製品のケース表
面はABS樹脂で形成される。この表面に9例えばアク
リロイル基を分子中に持つアクリル系オリゴマーを主体
とする光重合性樹脂などの紫外線硬化性樹脂による英文
字rABcJやrPUSHJの浮彫6が上記した方法で
一体形成される。
A specific example of the object to be processed 1 is an electric shaver product as shown in FIG. 6, and the surface of the case of this product is made of ABS resin. On this surface, an embossment 6 of the English letters rABcJ and rPUSHJ made of an ultraviolet curable resin such as a photopolymerizable resin mainly composed of an acrylic oligomer having an acryloyl group in the molecule is integrally formed on this surface by the method described above.

シャドウマスク3に所望の浮彫文字、゛記号あるいは図
形のパターン4を形成する方法としては。
A method of forming a pattern 4 of a desired embossed character, symbol, or figure on a shadow mask 3 is as follows.

上記方法に代えて、第8図に示す如く不透明板からなる
シャドウマスク3にパターン4を切抜き形成する方法が
あるが、これでは図示するr II Jなどのような文
字を表わす場合においては何ら問題が生じないが、第9
図に示ずrAJやrBJの文字は切抜き形成した場合9
図中釧線面分7が欠除された書体となりこれでは用をな
さない。この点。
As an alternative to the above method, there is a method of cutting out and forming a pattern 4 on a shadow mask 3 made of an opaque plate as shown in FIG. does not occur, but the ninth
Not shown in the figure, the letters rAJ and rBJ are cut out 9
In the figure, the font 7 is omitted, which is of no use. This point.

本発明方法によればrAJやrBJ以外にも種々様々な
文字、あるいは記号1図形等をも表わすことができる。
According to the method of the present invention, in addition to rAJ and rBJ, various characters, symbols, figures, etc. can be represented.

シャドウマスク3はパターン4め形成された側の面3a
が塗膜2に接する重合状態で該塗膜2をマスキングする
ことが浮彫文字、記号あるいは図形の輪郭線を鮮明に出
すうえにおいて好ましい。
The shadow mask 3 has a surface 3a on the side where the fourth pattern is formed.
It is preferable to mask the coating film 2 in a polymerized state in which it is in contact with the coating film 2, in order to clearly show the contour lines of embossed characters, symbols, or figures.

すなわち、第7図に示すようにシャドウマスク3カハタ
ーゾ4の形成された側の面3aと反対側の面3bが塗膜
2の面に接するように重ね合わせてマスキングすると、
透明なパターン4部分からシャドウマスク3に入射した
紫外線もしくは電子線りが着色不透明箇所5の下層部A
に屈折し、この屈折光線により塗膜2中のパターンと一
致する部分4a以外の外郭部分も硬化することになり9
輪郭線が不鮮明な浮彫6ができやすいからである。
That is, as shown in FIG. 7, when masking is performed by overlapping the shadow mask 3 so that the surface 3a on which the shadow mask 3 is formed and the surface 3b on the opposite side are in contact with the surface of the coating film 2,
The lower layer A of the opaque area 5 is colored by ultraviolet rays or electron beams incident on the shadow mask 3 from the transparent pattern 4 part.
This refracted light ray causes the outer part of the coating film 2 other than the part 4a that matches the pattern to also be cured 9
This is because the relief 6 with unclear contour lines is likely to be formed.

しかるに1前述のようにシャドウマスク3のパターン形
成側の面3aが塗膜2に接する重合状態とした場合はか
かる不具合はなく1浮彫6はパターン4の輪郭線に沿っ
て硬化し、緻密性に優れた形象のものが得られる。
However, if the surface 3a on the pattern formation side of the shadow mask 3 is in a polymerized state in contact with the coating film 2 as described above, this problem will not occur and the relief 6 will harden along the outline of the pattern 4, resulting in poor density. An excellent shape can be obtained.

以上説明したように、この発明の浮彫形成方法は、被処
理体1の表面に紫外線もしくは電子線硬化性樹脂を塗布
して塗膜2を形成し、未硬化状態下で該塗11!f!2
の表面にシャドウマスク3を重ねてシャドウマスク3の
パターン4と一致する部分4aのみを紫外線あるいは電
子線照射で硬化し、未硬化部分5aは溶剤で除去して浮
彫6を形成するようにしたので、被処理体1の表面に文
字、記号あるいは図形等の浮彫6を容易に一体形成する
ことができ、また紫外線・電子線硬化性樹脂は極めて短
時間に硬化し生産性を向上できる。また浮彫の表面硬度
を上げることができ耐摩耗性にも優れ。
As explained above, in the relief forming method of the present invention, the coating film 2 is formed by coating the surface of the object 1 with an ultraviolet ray or electron beam curable resin, and the coating 11! f! 2
The shadow mask 3 is superimposed on the surface of the shadow mask 3, and only the portion 4a corresponding to the pattern 4 of the shadow mask 3 is cured by ultraviolet rays or electron beam irradiation, and the uncured portion 5a is removed with a solvent to form the relief 6. The relief 6, such as letters, symbols, or figures, can be easily integrally formed on the surface of the object 1 to be processed, and the ultraviolet/electron beam curable resin can be cured in an extremely short time, thereby improving productivity. It can also increase the surface hardness of the relief and has excellent wear resistance.

浮彫の硬化に熱を必要としないため、加熱を不適当とす
る被処理体1にも浮彫6を良好に形成できる。
Since no heat is required to harden the relief, the relief 6 can be satisfactorily formed even on the object 1 to be treated for which heating is inappropriate.

と(に、本発明方法で使用するシャドウマスク3は透明
薄板で構成し、これに形成される透明な浮彫文字、記号
あるいは図形専のパターン4はこのパターン、4以外の
箇所5を着色不透明にすることによって得るようにした
ものであるから、不透明なシャドウマスクにパターンを
切抜き形成するものに比較して種々様々なパターンを得
ることができ、浮彫の多種多様化を図る得る。また本発
明方法によれば装置が小型化でき、比較的簡単で設備の
占有面積が僅かで済み、設備費も安価で済む等の利点を
有する。
(In addition, the shadow mask 3 used in the method of the present invention is composed of a transparent thin plate, and the pattern 4 dedicated to transparent embossed characters, symbols, or figures formed on this plate is formed by coloring the parts 5 other than 4 to make them opaque. Compared to the method in which patterns are cut out and formed on an opaque shadow mask, a wide variety of patterns can be obtained and a wide variety of reliefs can be produced.Furthermore, the method of the present invention According to this method, the device can be miniaturized, it is relatively simple, the area occupied by the equipment is small, and the equipment cost is low.

【図面の簡単な説明】[Brief explanation of drawings]

第1図ないし第6図はこの発明の実施例を示すもので、
第1図は被処理体の表面に形成された塗膜にシャドウマ
スクを重ねた状態を示す斜視図。 第2図は被処理体の表面に浮彫が形成さ“れな状態を示
”ジ斜視図、第3図はシャドウマスクの一部斜視図、第
4図は紫外線照射状態を示す断面図、第5図は浮彫形成
状態を示す被処理体の断面図、第6図は浮彫の施された
電気かみそりの斜視図である。 第7図はシャドウマスクの他の使用状態例を示す断面図
である。 第8図は好ましくないシャドウマスクを示す参考斜視図
、第9図はその場合の浮彫文字を例示する参考図である
。 l・・・・被処理体。 2・・・・塗膜。 3・・・・シャドウマスク。 4・・・ ・パターン。 5・・・・着色不透明箇所。 6・・・・浮彫。 第6図 第7図 第8図 第9図 手続?i■正書(方式) %式% ■、事件の表示 昭和57年特許願第122352号 2、発明の名称 浮彫形成方法 3、補正をする者 事件との関係  特許出願人 住所  福岡県田川郡方城町大字伊方4680番地名称
  九州日立マクセル株式会社 4、代理人   ◎530  意(06) 312−4
738住所   大阪市北区末広町3番21号昭和57
年10月26日発送 6、補正の対象 7、補正の内容 +1+  明細書第7頁第5行目の「第8図は・・・」
から同第7頁第7行目の「・・・参考図である。」まで
の記載を次の通り補正する。 記 「 第8図は好ましくないンヤトウマスクを示す斜視図
1 to 6 show embodiments of this invention,
FIG. 1 is a perspective view showing a state in which a shadow mask is superimposed on a coating film formed on the surface of an object to be processed. Fig. 2 is a perspective view showing a state in which relief is formed on the surface of the object to be processed, Fig. 3 is a partial perspective view of the shadow mask, Fig. 4 is a sectional view showing the state of ultraviolet irradiation, FIG. 5 is a cross-sectional view of the object to be processed showing a state in which the relief is formed, and FIG. 6 is a perspective view of the electric shaver on which the relief has been applied. FIG. 7 is a sectional view showing another example of how the shadow mask is used. FIG. 8 is a reference perspective view showing an undesirable shadow mask, and FIG. 9 is a reference view illustrating embossed characters in that case. l...Object to be processed. 2... Paint film. 3...Shadow mask. 4... ・Pattern. 5...Colored opaque areas. 6. Relief. Figure 6 Figure 7 Figure 8 Figure 9 Procedure? i ■ Formal writing (method) % formula % ■, Indication of the case Patent Application No. 122352 of 1982 2, Method for forming the name relief of the invention 3, Person making the amendment Relationship with the case Patent applicant address Tagawa District, Fukuoka Prefecture 4680 Ikata, Shiromachi Oaza Name: Kyushu Hitachi Maxell Co., Ltd. 4, Agent: ◎530 (06) 312-4
738 Address 3-21 Suehiro-cho, Kita-ku, Osaka 1982
Dispatched on October 26, 2017 6, Subject of amendment 7, Contents of amendment +1+ "Figure 8 is..." on page 7, line 5 of the specification
The statement from "...This is a reference figure." on page 7, line 7 of the same document is amended as follows. ``Figure 8 is a perspective view showing an undesirable mask.

Claims (1)

【特許請求の範囲】 (11被処理体1の表面に紫外線もしくむよ電子線硬化
性樹脂を塗布して塗膜2を形成する工程と、未硬化状態
下で該塗膜20表面に、透明薄板Gこツマターン40部
分のみを透明にすべく該)<ターン4以外の箇所5を着
色不透明にしてなるシャドウマスク3を重ねる工程と、
このシャドウマスク3の表面に紫外線あるいは電子線を
照射して塗膜2の)<ターン4と一致する部分4aのみ
を硬化さ一体る工程と、塗膜2の硬化後にシャドウマス
ク3をill力くしてから塗膜2のシャドウマスク30
着色不透明箇所5と一致する未硬化部分5aを溶剤で洗
浄除去する工程とからなることを特徴とする浮彫形成方
法。 (2)  シャドウマスク3は、ツマターン4の形成さ
れた側の面3aが塗膜2に接する状態で重ね合わされる
ことを特徴とする特許請求の範囲第1項記載の浮彫形成
方法。
Scope of Claims (11) A step of coating the surface of the object 1 with an electron beam curable resin to form a coating film 2 in an uncured state; A step of overlaying a shadow mask 3 in which only the thin plate G-shaped turn 40 portion is made transparent by coloring and making the portion 5 other than the turn 4 transparent;
The surface of the shadow mask 3 is irradiated with ultraviolet rays or electron beams to harden only the portion 4a of the coating film 2 that corresponds to the turn 4, and after the coating film 2 is cured, the shadow mask 3 is After that, paint film 2 shadow mask 30
A relief forming method comprising the step of cleaning and removing uncured portions 5a corresponding to colored opaque portions 5 with a solvent. (2) The relief forming method according to claim 1, wherein the shadow masks 3 are overlapped with each other in such a manner that the surface 3a on the side where the shading pattern 4 is formed is in contact with the coating film 2.
JP12235282A 1982-07-13 1982-07-13 Method of forming relief Granted JPS5912900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12235282A JPS5912900A (en) 1982-07-13 1982-07-13 Method of forming relief

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12235282A JPS5912900A (en) 1982-07-13 1982-07-13 Method of forming relief

Publications (2)

Publication Number Publication Date
JPS5912900A true JPS5912900A (en) 1984-01-23
JPH0256239B2 JPH0256239B2 (en) 1990-11-29

Family

ID=14833794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12235282A Granted JPS5912900A (en) 1982-07-13 1982-07-13 Method of forming relief

Country Status (1)

Country Link
JP (1) JPS5912900A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167899U (en) * 1981-04-17 1982-10-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167899U (en) * 1981-04-17 1982-10-22

Also Published As

Publication number Publication date
JPH0256239B2 (en) 1990-11-29

Similar Documents

Publication Publication Date Title
US2051603A (en) Process for the production of the explanatory titles for the pictures on cinematographic films
DE2653428A1 (en) COLOR FOIL TO CREATE A TEMPLATE FOR ADVERTISING PURPOSES
US2382806A (en) Synthetic plastic article and method of making the same
JPS5912900A (en) Method of forming relief
US3352728A (en) Material and method for making stencil masters
JPH0456675B2 (en)
JP4351017B2 (en) Screen printed matter having metal pseudo surface and method of forming metal pseudo surface by screen printing
JPH0350719B2 (en)
DE3608746A1 (en) Forgery-proof badge, official stamp, or licence or inspection plate
JPS6285926A (en) Manufacture of panel sheet
GB1485097A (en) Coatings on a transparent substrate
US3507652A (en) Direct thin emulsion stencil screen method and article
JPS6280283A (en) Production of display parts
JPS602956A (en) Manufacture of photomask
US4139386A (en) Method for obtaining engravers template
JP3495748B2 (en) Contact rubber with key top and its manufacturing method
JP3168091B2 (en) Three-dimensional circuit formation method
JPS6140200B2 (en)
JPH02227480A (en) Film for marking and production thereof
JPS6363897B2 (en)
JP2022037378A (en) Manufacturing method of information display medium
JPS63126997A (en) Production of light pervious paper
JPS5829615A (en) Method of forming projection
JPH02144989A (en) Method of treating printed circuit board
JPS601000A (en) Transfer sheet