JPH0256239B2 - - Google Patents

Info

Publication number
JPH0256239B2
JPH0256239B2 JP57122352A JP12235282A JPH0256239B2 JP H0256239 B2 JPH0256239 B2 JP H0256239B2 JP 57122352 A JP57122352 A JP 57122352A JP 12235282 A JP12235282 A JP 12235282A JP H0256239 B2 JPH0256239 B2 JP H0256239B2
Authority
JP
Japan
Prior art keywords
coating film
shadow mask
pattern
relief
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57122352A
Other languages
Japanese (ja)
Other versions
JPS5912900A (en
Inventor
Kazunori Yanagisawa
Kazuhiko Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP12235282A priority Critical patent/JPS5912900A/en
Publication of JPS5912900A publication Critical patent/JPS5912900A/en
Publication of JPH0256239B2 publication Critical patent/JPH0256239B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Description

【発明の詳細な説明】 この発明は、被処理体の表面に紫外線もしくは
電子線硬化性樹脂で文字、記号あるいは図形等の
浮彫を一体に形成する方法に係り、浮彫形成の容
易化並びに浮彫文字、記号、図形の多種多様化を
図ることを目的とする。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for integrally forming reliefs such as letters, symbols, or figures on the surface of an object to be treated using ultraviolet rays or electron beam curable resin. , symbols, and shapes.

以下、この発明の実施例を図面に基づき説明す
る。
Embodiments of the present invention will be described below based on the drawings.

第1図および第4図において、まず、被処理体
1の表面に紫外線もしくは電子線硬化性樹脂を塗
布して塗膜2を形成し、次いで該塗膜2が未硬化
状態の下で該塗膜2の表面にシヤドウマスク3を
重ね合わす。第3図に示すようにシヤドウマスク
3は柴外線もしくは電子線を透過する透明薄板か
らなり、その内面に透明な浮彫文字、記号あるい
は図形のパターン4を表わすべく該パターン4以
外の箇所5を着色して不透明にしてある。このシ
ヤドウマスク3を未硬化な塗膜2の表面に重ね合
わせてから柴外線もしくは電子線を照射する。す
ると、塗膜2はシヤドウマスク3の紫外線もしく
は電子線が透過するパターン4と一致する部分4
aのみが硬化し、その他の着色不透明な箇所5と
一致する部分5aが未硬化な状態のまま残る。し
かる後、シヤドウマスク3を剥がし、溶剤で塗膜
2の未硬化部分5aを洗浄除去すれば、第2図に
示すごとく被処理体1の表面に目的の文字、記号
あるいは図形等の浮彫6が一体に形成される。
1 and 4, first, an ultraviolet or electron beam curable resin is applied to the surface of an object to be treated 1 to form a coating film 2, and then the coating film 2 is left in an uncured state. A shadow mask 3 is superimposed on the surface of the membrane 2. As shown in FIG. 3, the shadow mask 3 is made of a transparent thin plate that transmits the rays or electron beams, and the areas 5 other than the pattern 4 are colored to represent a pattern 4 of transparent embossed characters, symbols, or figures on its inner surface. It is made opaque. This shadow mask 3 is superimposed on the surface of the uncured coating film 2, and then irradiated with a cylindrical beam or an electron beam. Then, the coating film 2 has a portion 4 that matches the pattern 4 of the shadow mask 3 through which ultraviolet rays or electron beams are transmitted.
Only portion a is cured, and portion 5a corresponding to the other colored and opaque portion 5 remains uncured. Thereafter, by peeling off the shadow mask 3 and washing off the uncured portion 5a of the coating film 2 with a solvent, the desired relief 6 of characters, symbols, figures, etc. is integrally formed on the surface of the object 1 to be treated, as shown in FIG. is formed.

被処理体1の具体例としては、例えば、第6図
に示すように電気かみそり製品が挙げられ、この
製品のケース表面はABS樹脂で形成される。こ
の表面に、例えばアクリロイル基を分子中に持つ
アクリル系オリゴマーを主体とする光重合性樹脂
などの紫外線硬化性樹脂による英文字「ABC」
や「PUSH」の浮彫6が上記した方法で一体形成
される。
A specific example of the object to be processed 1 is, for example, an electric shaver product as shown in FIG. 6, and the case surface of this product is made of ABS resin. On this surface, the English letters "ABC" are made of UV-curable resin such as photopolymerizable resin mainly composed of acrylic oligomers with acryloyl groups in the molecule.
and the relief 6 of "PUSH" are integrally formed by the method described above.

シヤドウマスク3に所望の浮彫文字、記号ある
いは図形のパターン4を形成する方法としては、
上記方法に代えて、第8図に示す如く不透明板か
らなるシヤドウマスク3にパターン4を切抜き形
成する方法があるが、これでは図示する「H」な
どのような文字を表わす場合においては何ら問題
が生じないが、第9図に示す「A」や「B」の文
字は切抜き形成した場合、図中斜線部分7が欠除
された書体となりこれでは用をなさない。この
点、本発明方法によれば「A」や「B」以外にも
種々様々な文字、あるいは記号、図形等をも表わ
すことができる。
The method for forming the desired pattern 4 of embossed characters, symbols or figures on the shadow mask 3 is as follows:
As an alternative to the above method, there is a method of cutting out and forming a pattern 4 on a shadow mask 3 made of an opaque plate as shown in FIG. Although this does not occur, if the letters "A" and "B" shown in FIG. 9 are cut out and formed, the font will have the shaded area 7 in the figure removed, which is of no use. In this regard, according to the method of the present invention, it is possible to represent various characters, symbols, figures, etc. in addition to "A" and "B".

シヤドウマスク3はパターン4の形成された側
の面3aが塗膜2に接する重合状態で該塗膜2を
マスキングすることが浮彫文字、記号あるいは図
形の輪郭線を鮮明に出すうえにおいて好ましい。
すなわち、第7図に示すようにシヤドウマスク3
がパターン4の形成された側の面3aと反対側の
面3bが塗膜2の面に接するように重ね合わせて
マスキングすると、透明なパターン4部分からシ
ヤドウマスク3に入射した紫外線もしくは電子線
Lが着色不透明箇所5の下層部Aに屈折し、この
屈折光線により塗膜2中のパターンと一致する部
分4a以外の外郭部分も硬化することになり、輪
郭線が不鮮明な浮彫6ができやすいからである。
しかるに、前述のようにシヤドウマスク3のパタ
ーン形成側の面3aが塗膜2に接する重合状態と
した場合はかかる不具合はなく、浮彫6はパター
ン4の輪郭線に沿つて硬化し、緻密性に優れた形
象のものが得られる。
It is preferable for the shadow mask 3 to mask the coating film 2 in a polymerized state in which the side surface 3a on which the pattern 4 is formed is in contact with the coating film 2, in order to clearly show the outline of the embossed characters, symbols, or figures.
That is, as shown in FIG.
When masking is done so that the surface 3a on the side where the pattern 4 is formed and the surface 3b on the opposite side are in contact with the surface of the coating film 2, the ultraviolet rays or electron beams L incident on the shadow mask 3 from the transparent pattern 4 part are This is because the refracted light beam is refracted into the lower layer A of the colored opaque area 5, and the outer part of the coating film 2 other than the part 4a that matches the pattern is also hardened, which tends to create an embossment 6 with an unclear outline. be.
However, when the surface 3a on the pattern formation side of the shadow mask 3 is in a polymerized state in contact with the coating film 2 as described above, this problem does not occur, and the relief 6 hardens along the outline of the pattern 4 and has excellent density. You can get a similar image.

以上説明したように、この発明の浮彫形成方法
は、被処理体1の表面に紫外線もしくは電子線硬
化性樹脂を塗布して塗膜2を形成し、未硬化状態
下で該塗膜2の表面にシヤドウマスク3を重ねて
シヤドウマスク3のパターン4と一致する部分4
aのみを紫外線あるいは電子線照射で硬化し、未
硬化部分5aは溶剤で除去して浮彫6を形成する
ようにしたので、被処理体1の表面に文字、記号
あるいは図形等の浮彫6を容易に一体形成するこ
とができ、また紫外線・電子線硬化性樹脂は極め
て短時間に硬化し生産性を向上できる。また浮彫
の表面硬度を上げることができ耐摩耗性にも優
れ、浮彫の硬化に熱を必要としないため、加熱を
不適当とする被処理体1にも浮彫6を良好に形成
できる。
As explained above, in the relief forming method of the present invention, a coating film 2 is formed by applying an ultraviolet ray or electron beam curable resin to the surface of an object to be treated 1, and the surface of the coating film 2 is left in an uncured state. Overlay shadow mask 3 on the area 4 that matches pattern 4 of shadow mask 3.
Since the relief 6 is formed by hardening only the portion a by ultraviolet rays or electron beam irradiation and removing the unhardened portion 5a with a solvent, it is easy to form the relief 6 such as letters, symbols, or figures on the surface of the object 1 to be treated. The ultraviolet ray/electron beam curable resin cures in an extremely short time, improving productivity. In addition, the surface hardness of the relief can be increased, the abrasion resistance is excellent, and no heat is required to harden the relief, so the relief 6 can be formed satisfactorily even on the object 1 to be treated for which heating is inappropriate.

とくに、本発明方法で使用するシヤドウマスク
3は透明薄板で構成し、これに形成される透明な
浮彫文字、記号あるいは図形等のパターン4はこ
のパターン4以外の箇所5を着色不透明にするこ
とによつて得るようにしたものであるから、不透
明なシヤドウマスクにパターンを切抜き形成する
ものに比較して種々様々なパターンを得ることが
でき、浮彫の多種多様化を図り得る。また本発明
方法によれば装置が小型型化でき、比較的簡単で
設備の占有面積が僅かで済み、設備費も安価で済
む等の利点を有する。
In particular, the shadow mask 3 used in the method of the present invention is composed of a transparent thin plate, and the pattern 4 of transparent embossed characters, symbols, figures, etc. formed on this plate is made by coloring areas 5 other than the pattern 4 to make them opaque. Since the method is made to obtain a pattern by cutting out a pattern on an opaque shadow mask, a wide variety of patterns can be obtained, and a wide variety of reliefs can be produced, compared to a method in which patterns are cut out and formed on an opaque shadow mask. Furthermore, the method of the present invention has the advantage that the device can be made smaller, is relatively simple, requires only a small area of equipment, and has low equipment costs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第6図はこの発明の実施例を示す
もので、第1図は被処理体の表面に形成された塗
膜にシヤドウマスクを重ねた状態を示す斜視図、
第2図は被処理体の表面に浮彫が形成された状態
を示す斜視図、第3図はシヤドウマスクの一部斜
視図、第4図は紫外線照射状態を示す断面図、第
5図は浮彫形成状態を示す被処理体の断面図、第
6図は浮彫の施された電気かみそりの斜視図であ
る。第7図はシヤドウマスクの他の使用状態例を
示す断面図である。第8図は好ましくないシヤド
ウマスクを示す斜視図、第9図はその場合の浮彫
文字を例示する平面図である。 1……被処理体、2……塗膜、3……シヤドウ
マスク、4……パターン、5……着色不透明箇
所、6……浮彫。
1 to 6 show examples of the present invention, and FIG. 1 is a perspective view showing a state in which a shadow mask is overlaid on a coating film formed on the surface of an object to be treated;
Figure 2 is a perspective view showing the state in which relief is formed on the surface of the object to be processed, Figure 3 is a partial perspective view of the shadow mask, Figure 4 is a cross-sectional view showing the state of ultraviolet irradiation, and Figure 5 is the formation of relief. FIG. 6 is a cross-sectional view of the object to be treated showing the state, and is a perspective view of the electric shaver with relief. FIG. 7 is a sectional view showing another example of the usage state of the shadow mask. FIG. 8 is a perspective view showing an undesirable shadow mask, and FIG. 9 is a plan view illustrating embossed characters in that case. 1...Object to be treated, 2...Coating film, 3...Shadow mask, 4...Pattern, 5...Colored opaque area, 6...Relief.

Claims (1)

【特許請求の範囲】 1 被処理体1の表面に紫外線もしくは電子線硬
化性樹脂を塗布して塗膜2を形成する工程と、未
硬化状態下で該塗膜2の表面に、透明薄板にパタ
ーン4の部分のみを透明にすべく該パターン4以
外の箇所5を着色不透明にしてなるシヤドウマス
ク3を重ねる工程と、このシヤドウマスク3の表
面に紫外線あるいは電子線を照射して塗膜2のパ
ターン4と一致する部分4aのみを硬化させる工
程と、塗膜2の硬化後にシヤドウマスク3を剥が
してから塗膜2のシヤドウマスク3の着色不透明
箇所5と一致する未硬化部分5aを溶剤で洗浄除
去する工程とからなることを特徴とする浮彫形成
方法。 2 シヤドウマスク3は、パターン4の形成され
た側の面3aが塗膜2に接する状態で重ね合わさ
れることを特徴とする特許請求の範囲第1項記載
の浮彫形成方法。
[Claims] 1. A step of applying an ultraviolet or electron beam curable resin to the surface of the object to be treated 1 to form a coating film 2, and applying a transparent thin plate to the surface of the coating film 2 in an uncured state. A process of overlapping a shadow mask 3 in which parts 5 other than the pattern 4 are colored and made opaque so that only the pattern 4 is transparent, and the pattern 4 of the coating film 2 is irradiated with ultraviolet rays or electron beams on the surface of this shadow mask 3. and a step of removing the shadow mask 3 after the coating film 2 is cured and cleaning and removing the uncured portion 5a of the coating film 2 that matches the colored opaque area 5 of the shadow mask 3 with a solvent. A relief forming method characterized by: 2. The relief forming method according to claim 1, wherein the shadow masks 3 are overlapped with each other so that the surface 3a on which the pattern 4 is formed is in contact with the coating film 2.
JP12235282A 1982-07-13 1982-07-13 Method of forming relief Granted JPS5912900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12235282A JPS5912900A (en) 1982-07-13 1982-07-13 Method of forming relief

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12235282A JPS5912900A (en) 1982-07-13 1982-07-13 Method of forming relief

Publications (2)

Publication Number Publication Date
JPS5912900A JPS5912900A (en) 1984-01-23
JPH0256239B2 true JPH0256239B2 (en) 1990-11-29

Family

ID=14833794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12235282A Granted JPS5912900A (en) 1982-07-13 1982-07-13 Method of forming relief

Country Status (1)

Country Link
JP (1) JPS5912900A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57167899U (en) * 1981-04-17 1982-10-22

Also Published As

Publication number Publication date
JPS5912900A (en) 1984-01-23

Similar Documents

Publication Publication Date Title
US2854336A (en) Method of forming a two-level photoengraved embossing plate or mold
ATE185430T1 (en) METHOD FOR PRODUCING PATTERNS
ATE41250T1 (en) METHOD AND DEVICE FOR PRODUCING A MACROSCOPIC SURFACE PATTERN WITH A MICROSCOPIC STRUCTURE, IN PARTICULAR A STRUCTURE WITH AN OPTICAL DIFFRACTION EFFECT.
JPH02289311A (en) Manufacture of stamper and board for information recording medium for which stamper is used
EP0526867A1 (en) Process for making a cylindrical embossing tool
US3779779A (en) Radiation etchable plate
JPH0256239B2 (en)
JPH0519973B2 (en)
CA2183926A1 (en) Method of Manufacturing Reflector
JPH0456675B2 (en)
US4966832A (en) Method of treating inner mold surface
JPH0213493A (en) Manufacture of shear plate for dry type shaver
JPS59186212A (en) Method of producing key top
JPH0327896B2 (en)
JPS60208834A (en) Formation of pattern
JPS5829615A (en) Method of forming projection
JPS6157400A (en) Printed decorative material with irregular section tuning with transfer printing section and manufacture thereof
JP3495748B2 (en) Contact rubber with key top and its manufacturing method
JPS5655943A (en) Pattern forming method
JPS61127330A (en) Emboss forming method of card component
JPH0389349A (en) Rugged image forming method
JPS6318024Y2 (en)
JPS59171416A (en) Method of producing key top
JPS59173914A (en) Method of producing key top
JPS6363897B2 (en)