JPH02289311A - Manufacture of stamper and board for information recording medium for which stamper is used - Google Patents

Manufacture of stamper and board for information recording medium for which stamper is used

Info

Publication number
JPH02289311A
JPH02289311A JP16887389A JP16887389A JPH02289311A JP H02289311 A JPH02289311 A JP H02289311A JP 16887389 A JP16887389 A JP 16887389A JP 16887389 A JP16887389 A JP 16887389A JP H02289311 A JPH02289311 A JP H02289311A
Authority
JP
Japan
Prior art keywords
stamper
substrate
light
curing
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16887389A
Other languages
Japanese (ja)
Inventor
Akinori Kurikawa
栗川 明典
Hisao Kawai
河合 久雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of JPH02289311A publication Critical patent/JPH02289311A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the fringe part of a disc board from generating flashes, by a method wherein prior to or posterior to peeling of the board in a state of a flat plate, to which an already-cured resin film, to which a form of a stamping surface of a stamper is transferred, is stuck, from the stamper, an uncured part of curing resin is removed. CONSTITUTION:A guide groove 9 is formed by curing an ultraviolet-curing resin film 2a by applying ultraviolet rays 8 of the outside of a treatment device 4 onto a disc board 1 for 30 seconds by transmitting through an upper plate 7 made of glass and further through the top part made of the glass of an inner chamber 5 under a state where the disc board 1 and a stamper 3 are pressure-contacted together. In addition, parts of an ultraviolet-curing resin film 2a corresponding to shading patterns 3c, 3d are not exposed and kept as it is uncured, in this curing treatment. With this curing treatment, an already-cured part of the ultraviolet-curing resin film 2a and a disc board 1 are stuck to each other. Then since an outer circumferential surface of the disc board 1 is covered with a part of the shading pattern 3c obtained by overhanging in a state of eaves, sticking of resin to its outer circumferential surface through curing of the resin can be prevented effectively.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、スタンパ−およびこのスタンパ−を用いる情
報記録媒体用基板の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a stamper and a method for manufacturing an information recording medium substrate using the stamper.

[従来の技術] (1)従来のスタンパ− 従来、案内溝付き情報記録媒体用基板を製造する際に用
いられるスタンパ−として、ニッケルスタンバ−が主と
して用いられていた。このニッケルスタンパ−は、以下
のように製造されていた。
[Prior Art] (1) Conventional Stamper Conventionally, a nickel stamper has been mainly used as a stamper used when manufacturing a substrate for an information recording medium with a guide groove. This nickel stamper was manufactured as follows.

すなわち、ガラス板上にフォトレジストを塗布して、レ
ジスト膜を形成した後、通常のフォトリソグラフィー法
により所定形状のレジストパターンを形成する。
That is, a photoresist is applied onto a glass plate to form a resist film, and then a resist pattern of a predetermined shape is formed by a normal photolithography method.

次に蒸着法等の手段によって、ガラス板上に、レジスト
パターンを覆うようにニッケル薄膜を形成した後、この
ニッケル薄膜を導電膜として、通常の電気メツキ法によ
って、ニッケルメッキ膜を形成する。
Next, a thin nickel film is formed on the glass plate by means such as vapor deposition so as to cover the resist pattern, and then a nickel plating film is formed using the thin nickel film as a conductive film by ordinary electroplating.

最後にレジストパターン付きガラス板を剥離することに
より、レジストパターンを反転したパターンを有するニ
ッケルスタンバ−を得る。
Finally, the resist patterned glass plate is peeled off to obtain a nickel stump bar having a pattern that is an inversion of the resist pattern.

(2)従来の情報記録媒体用基板の製造方法上記の如く
して得られたニッケルスタンパ−を用いる情報記録媒体
用基板の製造は、いわゆる2P法と呼ばれる、以下のよ
うな方法で行なわれていた。
(2) Conventional method for manufacturing substrates for information recording media The manufacturing of substrates for information recording media using the nickel stamper obtained as described above is carried out by the following method called the so-called 2P method. Ta.

すなわち、先ず前記スタンバ−と、情報記録媒体用基板
を製造するためのディスク基板との間に紫外線硬化型樹
脂を注入した後、空圧又は油圧機器等による押圧により
、樹脂をスタンバ−とディスク基板との間に伸展し、ス
タンバ−の凹凸形状面(スタンピング面)に樹脂を充填
させる。
That is, first, an ultraviolet curable resin is injected between the standbar and a disk substrate for manufacturing a substrate for information recording media, and then the resin is bonded between the standbar and the disk substrate by pressing with a pneumatic or hydraulic device. and fills the uneven surface (stamping surface) of the stamp bar with resin.

次にディスク基板の上から紫外線を照射して樹脂を硬化
させることにより、案内溝を形成するとともに、この案
内溝の形成された硬化樹脂をディスク基板上に固着させ
た後、ディスク基板をスタンバ−から剥離して、目的と
する情報記録媒体用基板を得る。
Next, guide grooves are formed by irradiating ultraviolet rays from above the disk substrate to harden the resin, and after fixing the cured resin with the guide grooves on the disk substrate, the disk substrate is placed in a stand bar. The substrate is peeled off from the substrate to obtain the intended information recording medium substrate.

[発明が解決しようとする課題] (1)従来のスタンバ−の問題点 前述の従来のニッケルスタンパ−は、以下のような問題
点があった。
[Problems to be Solved by the Invention] (1) Problems with conventional stampers The conventional nickel stamper described above has the following problems.

すなわち、ニッケルスタンパ−は、紫外線を透過しない
ため、2P法において紫外線硬化型樹脂を硬化させる場
合、ディスク基板側から紫外線を照射せざるを得ず、そ
の結果ディスク基板が、ガラスやプラスチック等の紫外
線を透過する基板の場合にのみ2P法の採用が可能であ
り、紫外線を透過しない基板や紫外線を透過しにくい基
板の場合、2P法を採用することができない。
In other words, since the nickel stamper does not transmit ultraviolet rays, when curing ultraviolet curable resin using the 2P method, ultraviolet rays must be irradiated from the disk substrate side, and as a result, the disk substrate may be exposed to ultraviolet rays such as glass or plastic. The 2P method can be adopted only in the case of a substrate that transmits ultraviolet rays, and cannot be adopted in the case of a substrate that does not transmit ultraviolet rays or a substrate that hardly transmits ultraviolet rays.

またニッケルスタンパ−を用いて2P法により情報記録
媒体用基板を製造すると、紫外線硬化型樹脂の硬化後に
ディスク基板の周縁部にパリが発生し、種々の問題を引
き起す。この点は、次の(2)従来の情報記録媒体用基
板の製造方法の問題点において詳細に説明する。
Furthermore, when a substrate for an information recording medium is manufactured by the 2P method using a nickel stamper, burrs occur at the peripheral edge of the disk substrate after the ultraviolet curable resin is cured, causing various problems. This point will be explained in detail in the following section (2) Problems of the conventional manufacturing method for information recording medium substrates.

(2)従来の情報記録媒体用基板の製造方法の問題点 前述の紫外線非透過性ニッケルスタンバ−を用いる従来
の情報記録媒体用基板の製造方法は、ディスク基板側か
ら紫外線を照射しなければならないという問題点の他に
、ディスク基板の周縁部にパリが発生するという致命的
な問題点があった。すなわち、2P法に使用される紫外
線硬化型樹脂は硬化前に流動性を有するため、押圧によ
る樹脂の伸展の際、ディスク基板の周縁部から樹脂がは
み出してしまい、このはみ出し部分が紫外線照射により
硬化すると、尖頭状の端部を有するパリが生じる。そし
てこのようなパリが生じると、基板がスタンバ−に強固
に接着されるため基板をスタンバ−から容易に剥離する
ことが困難となり、剥離に強い力を必要とする。また基
板をスタンバ−から剥離する際に、尖頭状の端部を有す
るパリは欠けてしまい、欠けたパリはゴミとして剥離帯
電で静電気が発生している基板表面に付着してしまうこ
とが多かった。また、パリを除去する際にも除去された
パリがゴミとなり基板表面に付着してしまう場合があっ
た。このようにしてゴミが付着された案内溝上に記録層
を積層すると、ゴミの部分は段差があるため積層した膜
によって完全にカバーできずにピンホールとなってしま
う。そしてこのピンホールから水分や酸素が侵入して記
録層が腐食し、記録特性が劣化する。
(2) Problems with the conventional method for manufacturing substrates for information recording media In the conventional method for manufacturing substrates for information recording media using the aforementioned ultraviolet opaque nickel stunbar, ultraviolet rays must be irradiated from the disk substrate side. In addition to this problem, there was a fatal problem in that burrs were generated at the peripheral edge of the disk substrate. In other words, since the ultraviolet curable resin used in the 2P method has fluidity before curing, when the resin is stretched by pressure, the resin protrudes from the periphery of the disk substrate, and this protruding portion is hardened by ultraviolet irradiation. This results in a paris with a pointed end. When such flaking occurs, the substrate is firmly adhered to the stand bar, making it difficult to easily separate the substrate from the stand bar, and a strong force is required for separation. Furthermore, when the substrate is peeled off from the stand bar, the chips with pointed edges are often chipped, and the chipped chips often become dust and adhere to the surface of the substrate where static electricity is generated due to the peeling charge. Ta. Further, even when removing paris, the removed paris may become dust and adhere to the surface of the substrate. When a recording layer is laminated on the guide groove to which dust has adhered in this manner, the dust portion cannot be completely covered by the laminated film because of the step difference, resulting in a pinhole. Moisture and oxygen enter through these pinholes, corrode the recording layer, and deteriorate recording characteristics.

本発明は、このような問題点を除去するためになされた
ものであり、その第1の目的は、従来のニッケルスタン
パ−の欠点を解消し、(1)スタンバ−側から紫外線や
電子線等を照射することができ、その結果紫外線や電子
線等を透過しない又は透過しにくい基板を用いた場合に
も2P法による情報記録媒体用基板の製造が可能である
、(if)2P法による情報記録媒体用基板の製造に用
いたときにパリの発生を防止することができる等の利点
を有するスタンパ−を提供することにあり、その第2の
目的は、ニッケルスタンバ−を用いる、従来の情報記録
媒体用基板の製造方法の欠点を解消し、(イ)紫外線や
電子線等を透過しない又は透過しにくい基板を用いた場
合にも2P法による情報記録媒体用基板の製造が可能で
ある、(ロ)基板の周縁部におけるパリの発生を防止す
ることができ、その結果基板をスタンパ−から容易に剥
離することができ、また欠けたパリの基板表面への付着
による諸問題を解消することができる等の利点を有する
情報記録媒体用基板の製造方法を提供することにある。
The present invention has been made to eliminate these problems, and its first purpose is to eliminate the drawbacks of conventional nickel stampers, and (1) to eliminate ultraviolet rays, electron beams, etc. from the stamper side. As a result, it is possible to manufacture substrates for information recording media by the 2P method even when using substrates that do not transmit or are difficult to transmit ultraviolet rays, electron beams, etc. (if) Information by the 2P method The purpose of the stamper is to provide a stamper that has advantages such as being able to prevent the occurrence of flash when used in the production of substrates for recording media.The second purpose is to provide a stamper that has advantages such as being able to prevent the occurrence of paris when used in the production of substrates for recording media. Eliminates the drawbacks of the method for manufacturing substrates for recording media, and (a) makes it possible to manufacture substrates for information recording media by the 2P method even when using a substrate that does not transmit ultraviolet rays, electron beams, etc. or is difficult to transmit; (b) It is possible to prevent the occurrence of flash at the peripheral edge of the substrate, and as a result, the substrate can be easily peeled off from the stamper, and various problems caused by the adhesion of chipped flash to the substrate surface can be solved. An object of the present invention is to provide a method for manufacturing a substrate for an information recording medium, which has advantages such as being able to perform the following steps.

[課題を解決するための手段] 本発明は上述の目的を達成するためになされたものであ
り、本発明のスタンパ−は、情報記録媒体用基板の案内
溝に対応する形状を有するスタンピング面をその一主表
面側に形成した透光性基板と、前記情報記録媒体用基板
の周縁部に対応する領域に形成された遮光パターンとを
有することを特徴とする。
[Means for Solving the Problems] The present invention has been made to achieve the above-mentioned object, and the stamper of the present invention has a stamping surface having a shape corresponding to the guide groove of the information recording medium substrate. It is characterized by having a light-transmitting substrate formed on one main surface side thereof, and a light-shielding pattern formed in a region corresponding to the peripheral portion of the information recording medium substrate.

また本発明の情報記録媒体用基板の製造方法は、上記の
遮光パターンを有するスタンパ−のスタンピング面と、
案内溝付き情報記録媒体用基板を製造するための平板状
基板の一主表面との間に硬化型樹脂を配置し、次いで前
記スタンパ−と前記平板状基板の少なくとも一方の側か
ら加圧し、その後、前記遮光パターンをマスクとし前記
硬化型樹脂を選択的に硬化させ、次いで前記スタンパ−
のスタンピング面の形状が転写された硬化済み樹脂膜が
固着された前記平板状基板を前記スタンパ−から剥離す
る前、あるいは剥離した後、硬化型樹脂の未硬化部分を
除去することを特徴とする。
Further, the method for manufacturing a substrate for an information recording medium of the present invention includes a stamping surface of a stamper having the above-mentioned light-shielding pattern;
A curable resin is placed between one main surface of a flat substrate for manufacturing an information recording medium substrate with guide grooves, and then pressure is applied from at least one side of the stamper and the flat substrate, and then , the curable resin is selectively cured using the light shielding pattern as a mask, and then the stamper
The uncured portion of the curable resin is removed before or after the flat substrate to which the cured resin film to which the shape of the stamping surface has been transferred is peeled off from the stamper is removed. .

[実施例] 以下、本発明の詳細な説明する。[Example] The present invention will be explained in detail below.

(1)スタンパ−の作製 第1図(b)および第2図に示すように、凸部3aと凹
部3bとを有し、さらに外周縁部および内周縁部に遮光
パターン3Cおよび遮光パターン3dをそれぞれ有する
スタンパ−を以下の方法で作製した。
(1) Preparation of stamper As shown in FIG. 1(b) and FIG. 2, it has a convex portion 3a and a concave portion 3b, and further has a light shielding pattern 3C and a light shielding pattern 3d on the outer peripheral edge and the inner peripheral edge. Each stamper was produced by the following method.

直径140mmの円盤状の石英ガラス板の一主表面に、
ポジ型フォトレジスト(ヘキスト社製AZ−1350)
をスピンコード法により塗布して膜厚3000人のレジ
スト膜を形成し、次にレーザーカッティング法(レーザ
ー光による露光法)により前記レジスト膜を選択的に露
光した。次いで、露光済のレジスト膜を所定の現像液(
AZ専用デイベロツバ)により現像して、前記石英ガラ
ス板の一主表面上にレジストパターンを形成し、その後
、反応ガスとしてCF4を用い、かつ、RF電力を10
0W、反応室内の圧力を0.1Paとしたりアクティブ
イオンエツチング法により、前記レジストパターンをマ
スクとし石英ガラス板を7分間エツチングして、該石英
ガラス板の表面に凹凸パターンを形成した。次いで、レ
ジストパターンをレジスト剥離液(熱濃硫酸)により剥
離した後、洗浄して、表面に案内溝に対応する凹凸パタ
ーンを形成した石英ガラス基板を得た。この凹凸パター
ンは、第1図(b)および第2図に示すように、凸部3
aと凹部3bとからなる。その後、凹凸パターンを形成
した石英ガラス板の表面に、スパッタリング法によりC
r膜を膜厚500人に成膜し、次に前記したと同様にし
てCr膜上に膜厚3000人のレジスト膜を形成した後
、所定の遮光パターンを備えたフォトマスクを通して前
記レジスト膜を選択的に露光した。なお、この露光工程
では、最終的に得られるスタンパ−3の遮光パターン3
c及び3dに対応する部分のレジスト膜は露光されない
。続いて、露光済のレジスト膜を現像してレジストパタ
ーンを形成した後、レジストパターンをマスクとし、所
定のエツチング液(硝酸第2セリウムアンモニウムと過
塩素酸との混合水溶液)を用いてエツチングしてCrパ
ターンからなる遮光パターン3c及び3dを形成し、そ
の後、レジストパターンを剥離して、第1図(b)およ
び第2図に示すように、凸部3a、凹部3b、遮光パタ
ーン3cおよび遮光パターン3dを有するスタンパ−3
を得た。得られたスタンパ−3において、凸部3aの幅
は0.6+〜0.8μm、凹部3bの幅は0.8〜1.
0μm1凹部3bの深さは約750人、遮光パターン3
Cの幅は7門、遮光パターン3dの直径は25mmであ
った。なお、遮光パターン3cおよび3dは、後述する
情報記録媒体用基板の製造においてディスク基板の案内
溝が形成されない外周縁部および内周縁部をマスクする
ものであるので、これらが存在しても案内溝の形成に支
障はない。
On one main surface of a disc-shaped quartz glass plate with a diameter of 140 mm,
Positive photoresist (AZ-1350 manufactured by Hoechst)
was coated by a spin code method to form a resist film with a thickness of 3000, and then the resist film was selectively exposed by a laser cutting method (exposure method using laser light). Next, the exposed resist film is treated with a prescribed developer (
A resist pattern is formed on one main surface of the quartz glass plate by developing it using a developer developed by AZ exclusive developer, and then using CF4 as a reaction gas and applying RF power of 10%.
Using the resist pattern as a mask, the quartz glass plate was etched for 7 minutes using active ion etching at 0 W and a pressure in the reaction chamber of 0.1 Pa to form a concavo-convex pattern on the surface of the quartz glass plate. Next, the resist pattern was removed using a resist removal solution (hot concentrated sulfuric acid), and then washed to obtain a quartz glass substrate on which a pattern of protrusions and recesses corresponding to the guide grooves was formed on the surface. As shown in FIG. 1(b) and FIG.
a and a recess 3b. Thereafter, C was applied to the surface of the quartz glass plate on which the uneven pattern was formed using a sputtering method.
After forming an R film to a thickness of 500 mm and then forming a resist film to a thickness of 3000 mm on the Cr film in the same manner as described above, the resist film was passed through a photomask with a predetermined light-shielding pattern. selectively exposed. In addition, in this exposure process, the light-shielding pattern 3 of the stamper 3 finally obtained
The portions of the resist film corresponding to c and 3d are not exposed. Next, the exposed resist film is developed to form a resist pattern, and then, using the resist pattern as a mask, etching is performed using a predetermined etching solution (mixed aqueous solution of ceric ammonium nitrate and perchloric acid). Light-shielding patterns 3c and 3d made of Cr patterns are formed, and then the resist pattern is peeled off to form convex portions 3a, recesses 3b, light-shielding patterns 3c, and light-shielding patterns, as shown in FIGS. 1(b) and 2. Stamper 3 with 3d
I got it. In the obtained stamper 3, the width of the convex portion 3a is 0.6+ to 0.8 μm, and the width of the concave portion 3b is 0.8 to 1.5 μm.
The depth of 0μm1 recess 3b is approximately 750 people, light shielding pattern 3
The width of C was 7 gates, and the diameter of the light shielding pattern 3d was 25 mm. Note that the light-shielding patterns 3c and 3d mask the outer and inner peripheral edges of the disk substrate where guide grooves are not formed in the manufacture of information recording medium substrates, which will be described later. There is no problem with the formation of

(2)情報記録媒体用基板の製造 ソーダライムガラスからなり、中心部に孔径15ffl
IIの貫通孔1aを有する、外径130mmのディスク
基板1上に、紫外線硬化型樹脂2(大日本インキ■製ダ
イキュアクリアS TM−401、粘度320センチボ
イズ)をデイスペンサーによりディスク基板1のほぼ半
径の中央部に円環状に塗布した(第1図(a)参照)。
(2) Manufacture of substrate for information recording media Made of soda lime glass, with a hole diameter of 15ffl in the center.
On a disk substrate 1 having an outer diameter of 130 mm and having a through-hole 1a, an ultraviolet curable resin 2 (Daicur Clear S TM-401 manufactured by Dainippon Ink ■, viscosity 320 centivoise) is applied with a dispenser to almost the entire surface of the disk substrate 1. It was applied in an annular shape at the center of the radius (see FIG. 1(a)).

次に、ディスク基板1上の紫外線硬化型樹脂2とスタン
パ−3の凹凸形状面(スタンピング面)が向い合うよう
にディスク基板1とスタンパ−3とを積層した(第1図
(b)参照)。
Next, the disk substrate 1 and the stamper 3 were laminated so that the ultraviolet curing resin 2 on the disk substrate 1 and the uneven surface (stamping surface) of the stamper 3 faced each other (see FIG. 1(b)). .

次に、積層されたディスク基板1とスタンパ−3とを処
理装置4内に入れた後、ディスク基板1とスタンパ−3
との間をITorrの減圧にすることにより紫外線硬化
型樹脂2中に残留する気泡を除去し、かつディスク基板
1とスタンパ−3との間を減圧にした状態で、ディスク
基板1とスタンパ−3の両側からそれぞれ圧力0゜5k
g/cJで加圧し、ディスク基板1とスタンパ−3との
間に、気泡がなく均一な紫外線硬化型樹脂膜2aを形成
させた(第1図(c)参照)。
Next, after putting the laminated disk substrate 1 and stamper 3 into the processing device 4, the disk substrate 1 and the stamper 3 are
The air bubbles remaining in the ultraviolet curable resin 2 are removed by reducing the pressure to ITorr between the disk substrate 1 and the stamper 3, and the disk substrate 1 and the stamper 3 are removed. Pressure 0°5k from both sides of
A pressure was applied at a pressure of g/cJ to form a bubble-free and uniform ultraviolet curable resin film 2a between the disk substrate 1 and the stamper 3 (see FIG. 1(c)).

この処理装置4内の減圧及び加圧操作を更に説明すると
、処理装置4中の内室5は、内室5の内壁に固着されて
いるOリング6によって、減圧される空間部分Aと加圧
される空間部分Bとが互いに隔離されており、ディスク
基板1とスタンパ−3との間の減圧化は、前記空間部分
Aに連絡して設けられた真空ポンプを作動することによ
り達成される。またディスク基板1とスタンパ−3の両
側からの加圧化は、N2ガス等の加圧用ガスを前記空間
部分Bに導入することにより達成される。
To further explain the depressurization and pressurization operations inside the processing device 4, an inner chamber 5 in the processing device 4 is connected to a space portion A to be depressurized and a pressurized portion by an O-ring 6 fixed to the inner wall of the inner chamber 5. The space portion B where the stamper is placed is isolated from each other, and the pressure reduction between the disk substrate 1 and the stamper 3 is achieved by operating a vacuum pump provided in communication with the space portion A. Further, pressurization from both sides of the disk substrate 1 and stamper 3 is achieved by introducing a pressurizing gas such as N2 gas into the space B.

次に、ディスク基板1とスタンパ−3とが圧着された状
態で、処理装置4の外部の紫外線8(紫外線ランプ使用
、出力300W)をガラス製の上板7、さらに内室5の
ガラス製の上面部を透過させてディスク基板1上に30
秒間照射して紫外線硬化型樹脂膜2a・を硬化させて案
内溝9を形成した(第1図(e)参照)。なお、この硬
化処理において、遮光パターン3c、  3dに対応す
る紫外線硬化型樹脂膜2aの部分は、露光されず、未硬
化のままであった。またこの硬化処理により、紫外線硬
化型樹脂膜2aの硬化済み部分とディスク基板1とが固
着された。
Next, with the disk substrate 1 and the stamper 3 pressed together, ultraviolet light 8 (using an ultraviolet lamp, output 300 W) from the outside of the processing device 4 is applied to the glass upper plate 7 and then to the glass inner chamber 5. 30 on the disk substrate 1 through the upper surface.
The guide groove 9 was formed by curing the ultraviolet curable resin film 2a by irradiating it for seconds (see FIG. 1(e)). In this curing process, the portions of the ultraviolet curable resin film 2a corresponding to the light-shielding patterns 3c and 3d were not exposed and remained uncured. Further, by this curing treatment, the cured portion of the ultraviolet curable resin film 2a and the disk substrate 1 were fixed.

また、ディスク基板1の外周面をひさし状に張り出した
遮光パターン3cの部分で覆っているので、その外周面
に樹脂が硬化して付着することを効果的に防止できた。
Furthermore, since the outer circumferential surface of the disk substrate 1 is covered with the light-shielding pattern 3c that extends like an eaves, it is possible to effectively prevent the resin from hardening and adhering to the outer circumferential surface.

次に、処理装置4から、積層されたディスク基板1とス
タンパ−3とを取り出した後、前者を後者から剥離した
。この剥離は極めて容易に行なうことができた。その後
、遮光パターン3c、3dの存在によって未硬化の紫外
線硬化型樹脂膜2aの部分をイソプロピルアルコール中
での超音波洗浄により溶解除去することにより、案内溝
9の形成された硬化済み樹脂膜2b付きディスク基板1
を得た(第1図(d)参照)。この樹脂の未硬化部分の
除去は、この樹脂を溶解するイソプロピルアルコールを
使用することにより極めて円滑に実施することができた
Next, after taking out the laminated disk substrate 1 and stamper 3 from the processing device 4, the former was peeled off from the latter. This peeling could be performed extremely easily. Thereafter, by dissolving and removing the uncured portion of the ultraviolet curable resin film 2a due to the presence of the light shielding patterns 3c and 3d by ultrasonic cleaning in isopropyl alcohol, the cured resin film 2b with the guide grooves 9 formed thereon is attached. Disk board 1
was obtained (see Figure 1(d)). The uncured portion of this resin could be removed very smoothly by using isopropyl alcohol which dissolves this resin.

本実施例においては、ディスク基板1の外周縁部および
内周縁部と対向する領域にそれぞれ遮光パターン3cお
よび遮光パターン3dを有するスタンパ−3を使用した
ので、ディスク基板1の外周縁部および内周縁部に存在
する紫外線硬化型樹脂の硬化が防止される。従って得ら
れた案内溝9付きディスク基板1にパリは生じず、パリ
発生に伴なって生じる欠損パリの案内溝表面への付着な
どの諸問題を解消することができた。
In this embodiment, since the stamper 3 having the light shielding pattern 3c and the light shielding pattern 3d in areas facing the outer peripheral edge and the inner peripheral edge of the disk substrate 1 is used, the outer peripheral edge and the inner peripheral edge of the disk substrate 1 are Curing of the ultraviolet curable resin present in the area is prevented. Therefore, no burrs were formed on the obtained disk substrate 1 with guide grooves 9, and various problems such as adhesion of missing burrs to the surface of the guide grooves caused by occurrence of burrs could be solved.

得られた案内溝9付きディスク基板1は、スタンパ−3
の凹凸パターンに忠実に対応する凹凸パターンを有する
ので、その上に記録層等を設けることにより得られた光
磁気ディスクは記録特性等にすぐれたものであった。
The obtained disc substrate 1 with guide grooves 9 is stamped with a stamper 3.
The magneto-optical disk obtained by providing a recording layer etc. thereon had excellent recording properties etc. because it had a concavo-convex pattern that faithfully corresponded to the concavo-convex pattern of .

以上、実施例により本発明を説明してきたが、本発明は
以下の変形例を含むものである。
Although the present invention has been described above with reference to Examples, the present invention includes the following modifications.

(A)スタンパ−の変形例 (1)実施例では、スタンパ−として、ディスク基板の
外周縁部および内周縁部に対応する領域に遮光パターン
を有するスタンパ−を用いたが、パリの発生は外周縁部
において顕著であるので、外周縁部に対応する領域にの
み遮光パターンを設けたスタンパ−でも本発明の目的を
達成し得る。また、第1図(b)に示すように、ディス
ク基板の外周縁部から張り出して遮光パターンを設ける
以外に、その外周縁部の上方に対応した領域のみに、遮
光パターンを設けても良い。
(A) Modified example of stamper (1) In the example, a stamper having a light-shielding pattern in areas corresponding to the outer peripheral edge and inner peripheral edge of the disk substrate was used as the stamper, but the generation of paris was avoided. Since the light-shielding pattern is noticeable at the peripheral edge, the object of the present invention can be achieved even with a stamper in which the light-shielding pattern is provided only in the region corresponding to the outer peripheral edge. Further, as shown in FIG. 1(b), instead of providing the light-shielding pattern protruding from the outer peripheral edge of the disk substrate, the light-shielding pattern may be provided only in an area corresponding to the upper part of the outer peripheral edge.

(2)実施例では、スタンパ−の材質として、石英ガラ
スを採用したが、透光性を有し、基板の周縁部に対応す
る領域に遮光パターンを形成し得るものであれば、ソー
ダライムガラス、アルミノシリケートガラス、アルミノ
ボロシリケートガラス、ボロシリケートガラス等のガラ
スや、セラミックスあるいはプラスチック等のガラス以
外の材質も採用し得る。
(2) In the example, quartz glass was used as the stamper material, but soda lime glass can be used as long as it has translucency and can form a light-shielding pattern in the area corresponding to the peripheral edge of the substrate. Glasses such as aluminosilicate glass, aluminoborosilicate glass, and borosilicate glass, and materials other than glass such as ceramics and plastics may also be used.

(3)また遮光パターンの材質としては、遮光性を有す
るものであれば実施例で用いたCr以外のもの、例えば
Ti、Ta、MoSi、Ni。
(3) As for the material of the light-shielding pattern, any material other than Cr used in the embodiments may be used as long as it has light-shielding properties, such as Ti, Ta, MoSi, and Ni.

Cr203.Fe203等の無機物や、顔料等を添加し
て遮光性を持たせた樹脂も採用し得る。
Cr203. Inorganic substances such as Fe203 or resins added with pigments or the like to have light-shielding properties may also be used.

また遮光パターンの膜厚は、遮光性を発現し得る厚さで
良く、実施例における500人に限定されない。また遮
光パターンの高さ(膜厚)はスタンパ−の凸部の高さよ
りも低くても高くても良く、また両者が同じであっても
良い。
Further, the thickness of the light-shielding pattern may be any thickness that can provide light-shielding properties, and is not limited to 500 people in the example. Further, the height (film thickness) of the light-shielding pattern may be lower or higher than the height of the convex portion of the stamper, or both may be the same.

(4)スタンパ−としては、実施例で製作され、使用さ
れたスタンパ−以外に、ガラス基板の一主表面上にCr
膜等の遮光性膜を形成した後、遮光性膜上にレジスト膜
を形成し、次にレジスト膜を選択的に露光し現像してレ
ジストパターンを形成し、続いて、レジストパターンを
マスクとして遮光性膜をエツチングした後、レジストパ
ターンを剥離して、ガラス基板の一主表面上に遮光性膜
からなる凸部3aと、遮光性膜からなる遮光パターン3
c及び3dとを形成して得られるものを用いることもで
きる。なお、この場合凸部3aも遮光性膜からなるが、
前述の如く凸部3aの幅は例えば0.6〜0. 8μm
の如く狭いので、凹部3bから入射した紫外線が廻り込
み凸部3aに対応する部分の樹脂を硬化するので、凸部
3aが遮光性膜であっても差し支えない。一方、遮光パ
ターン3c、3dは幅が7QII11125ffIIl
と広いので、紫外線の廻り込みの影響を無視することが
でき、遮光パターン3e、3dに対応する部分の樹脂は
硬化しない。
(4) As a stamper, in addition to the stamper manufactured and used in the example, a Cr
After forming a light-shielding film such as a film, a resist film is formed on the light-shielding film, then the resist film is selectively exposed and developed to form a resist pattern, and then the resist pattern is used as a mask to shield light. After etching the transparent film, the resist pattern is peeled off, and a convex portion 3a made of a light-shielding film and a light-shielding pattern 3 made of a light-shielding film are formed on one main surface of the glass substrate.
It is also possible to use one obtained by forming c and 3d. Note that in this case, the convex portion 3a is also made of a light-shielding film,
As mentioned above, the width of the convex portion 3a is, for example, 0.6 to 0.6 mm. 8μm
Since the convex portion 3a is narrow, the ultraviolet light incident from the concave portion 3b goes around and hardens the resin in the portion corresponding to the convex portion 3a, so there is no problem even if the convex portion 3a is a light-shielding film. On the other hand, the width of the light shielding patterns 3c and 3d is 7QII11125ffIIl.
Since the area is wide, the influence of UV radiation can be ignored, and the resin in the portions corresponding to the light-shielding patterns 3e and 3d is not cured.

(5)実施例では、スタンパ−として第2図に示すよう
にディスク状のものを用いたが、角形のものを用いても
良い。またディスク基板の中心部の貫通孔に対応して、
スタンパ−の中心部に貫通孔を形成したものであっても
よく、この場合にはスタンパ−の貫通孔の周縁部に遮光
パターンを形成する。なお、中心部に貫通孔を有するス
タンパ−は、ディスク基板からの剥離しやすさを増す点
で好ましい。また遮光パターンの寸法も実施例に記載の
ものに限定されるものではない。またディスク基板の表
面に形成する案内溝は、凹凸形状に限られず、ピットや
小穴、あるいは断続して連なる溝であってもよい。
(5) In the embodiment, a disk-shaped stamper was used as shown in FIG. 2, but a square-shaped stamper may also be used. Also, corresponding to the through hole in the center of the disk board,
A through hole may be formed in the center of the stamper, and in this case, a light shielding pattern is formed around the periphery of the through hole of the stamper. Note that a stamper having a through hole in the center is preferable because it increases the ease of peeling from the disk substrate. Furthermore, the dimensions of the light-shielding pattern are not limited to those described in the examples. Further, the guide grooves formed on the surface of the disk substrate are not limited to the uneven shape, but may be pits, small holes, or continuous grooves.

(6)スタンパ−としては、第3図に示すように、凹凸
形状を存する主表面と対向するもう一方の主表面上に、
遮光パターン3c及び3dを形成したスタンパ−3でも
良く、また第4図に示すように、ガラスやセラミックあ
るいはプラスチック等の透光性基板31の一主表面に5
i02膜を形成し、その後この5i02膜を選択的にエ
ツチングして凹凸形状面を有する5i02膜32を形成
し、次いで遮光パターン3c及び3dを形成して得られ
るスタンパ−3でもよい。
(6) As shown in FIG. 3, as a stamper, on the other main surface opposite to the main surface having an uneven shape,
A stamper 3 may be used in which light-shielding patterns 3c and 3d are formed, and as shown in FIG.
The stamper 3 may be obtained by forming an i02 film, then selectively etching this 5i02 film to form a 5i02 film 32 having an uneven surface, and then forming light shielding patterns 3c and 3d.

なお、透光性基板31の一主表面上への5LO2膜の形
成方法としては、5i02ターゲツトを用いるスパッタ
リング法、ケイ素のアルコキシドを含有する溶液を塗布
した後、加熱する工程を有するゾル−ゲル法等を採用し
得る。
The method for forming the 5LO2 film on one main surface of the transparent substrate 31 includes a sputtering method using a 5i02 target, and a sol-gel method that includes a step of applying a solution containing a silicon alkoxide and then heating it. etc. may be adopted.

また5i02膜に代えてAlt O3膜等でもよい。Further, an AltO3 film or the like may be used instead of the 5i02 film.

またスタンパ−としては、第5図に示すように、透光性
基板31の、ディスク基板の周縁部に対応する領域にス
クリーン印刷法等により黒色顔料等の遮光性顔料を含む
紫外線硬化型樹脂を塗布し、次いで紫外線硬化して遮光
パターン3c及び3dを形成した後、これら遮光パター
ン3c及び3dを覆うように5i02膜を形成し、その
後この5i02膜を選択的にエツチングして凹凸形状面
を有する5i02膜32を形成して得られるスタンパ−
3でも良い。
As shown in FIG. 5, as a stamper, an ultraviolet curable resin containing a light-shielding pigment such as a black pigment is applied to an area of the transparent substrate 31 corresponding to the peripheral edge of the disk substrate by screen printing or the like. After coating and then curing with ultraviolet light to form light-shielding patterns 3c and 3d, a 5i02 film is formed to cover these light-shielding patterns 3c and 3d, and then this 5i02 film is selectively etched to have an uneven surface. Stamper obtained by forming 5i02 film 32
3 is also fine.

さらにスタンパ−としては、第6図に示すように、透光
性基板31の、ディスク基板の周縁部に対応する領域に
スクリーン印刷法等により比較的に膜厚の大きい遮光性
顔料含有紫外線硬化型樹脂層を形成し、次いで紫外線硬
化して比較的に膜厚の大きい遮光パターン3C及び3d
を形成した後、遮光パターン3cと3dとの間隙に、遮
光パターン3c及び3dよりも膜厚の小さい5i02膜
を形成し、その後このSiO2膜を選択的にエツチング
して凹凸形状面を有する5i02膜32を形成して得ら
れるスタンパ−3でも良い。
Furthermore, as shown in FIG. 6, the stamper is an ultraviolet curing type stamper containing a light-shielding pigment, which is formed by screen printing or the like on a region of the light-transmitting substrate 31 corresponding to the peripheral edge of the disk substrate. A resin layer is formed and then cured with ultraviolet light to form relatively thick light-shielding patterns 3C and 3d.
After forming the SiO2 film, a 5i02 film having a thickness smaller than that of the light shielding patterns 3c and 3d is formed in the gap between the light shielding patterns 3c and 3d, and then this SiO2 film is selectively etched to form a 5i02 film having an uneven surface. A stamper 3 obtained by forming a stamper 32 may also be used.

(B)情報記録媒体用基板の製造方法の変形例(1)実
施例では、紫外線硬化型樹脂を用いたが、電子線硬化型
樹脂等を用いることもできる。
(B) Modification of method for manufacturing substrate for information recording medium (1) In the embodiment, an ultraviolet curable resin was used, but an electron beam curable resin or the like may also be used.

(2)実施例では、樹脂をディスク基板上に塗布したが
、スタンパ−上に塗布しても良い。また基板上およびス
タンパ−上に塗布しても良い。塗布方法として、実施例
で用いたデイスペンサーを用いる方法以外に、樹脂の性
状等に応じてスピンコード法やロールコート法等を用い
ることができる。
(2) In the embodiment, the resin was applied onto the disk substrate, but it may also be applied onto the stamper. It may also be applied onto the substrate and stamper. As a coating method, in addition to the method using a dispenser used in the examples, a spin cord method, a roll coating method, etc. can be used depending on the properties of the resin.

(3)実施例では、ディスク基板としてソーダライムガ
ラス製のものを用いたが、アルミノボロシリケートガラ
ス、ボロシリケートガラス、石英ガラス等のガラス基板
や、エポキシ樹脂、ポリカーボネート等のプラスチック
基板や、セラミックを用いても良い。
(3) In the example, a disk substrate made of soda lime glass was used, but glass substrates such as aluminoborosilicate glass, borosilicate glass, quartz glass, plastic substrates such as epoxy resin or polycarbonate, or ceramic substrates may also be used. May be used.

しかし本発明の方法は、特に基板がガラスのような硬脆
材料からなるときに有効である。なぜならば、プラスチ
ック基板のときは、案内溝の形成後、基板の周縁部を打
ち抜き加工具により打ち抜き、これによりパリも除去で
きるが、ガラスの場合にはこのような加工ができないか
らである。
However, the method of the present invention is particularly effective when the substrate is made of a hard and brittle material such as glass. This is because, in the case of a plastic substrate, after the guide grooves are formed, the peripheral edge of the substrate is punched out using a punching tool, thereby removing pars, but in the case of glass, such processing is not possible.

なお、実施例では透明ガラスからなる基板を用いたが、
本発明の方法はスタンパ−側から露光するものであるか
ら、基板は不透明のもの(例えばアルミニウム)であっ
ても良い。
In addition, although a substrate made of transparent glass was used in the example,
Since the method of the present invention exposes to light from the stamper side, the substrate may be opaque (for example, aluminum).

(4)実施例では、基板とスタンパ−とを積層した後の
加圧を基板とスタンパ−の両側から行なったが、基板又
はスタンパ−の一方を固定すれば、片側のみの加圧でも
良い。加圧手段は加圧用ガスを用いる方法以外に油圧機
器を用いる等の任意の方法を採用することができる。
(4) In the embodiment, after the substrate and stamper were laminated, pressure was applied from both sides of the substrate and stamper, but as long as either the substrate or the stamper is fixed, pressure may be applied only to one side. As the pressurizing means, any method other than the method using pressurizing gas, such as using hydraulic equipment, can be adopted.

(5)未硬化樹脂を除去するときに用いる溶液としては
、実施例で用いたイソプロピルアルコール以外にエチル
アルコール等のアルコールや、未硬化樹脂を溶解しうる
その他の溶液を適宜使用しうる。
(5) As the solution used to remove the uncured resin, in addition to the isopropyl alcohol used in the examples, alcohol such as ethyl alcohol or other solutions capable of dissolving the uncured resin can be used as appropriate.

また実施例では、基板をスタンパ−から剥離した後に未
硬化樹脂を除去したが、剥離前に未硬化樹脂を除去して
も良い。剥離前の未硬化樹脂の除去は、例えば、未硬化
樹脂を溶解しつる溶液中に基板とスタンパ−とを浸漬す
ることにより行なわれる。
Further, in the embodiment, the uncured resin was removed after peeling the substrate from the stamper, but the uncured resin may be removed before peeling. Removal of the uncured resin before peeling is performed, for example, by immersing the substrate and stamper in a solution that dissolves the uncured resin.

[発明の効果] 以上詳述したように、本発明によれば、従来のニッケル
スタンパ−と異なり、紫外線や電子線等を透過し得るス
タンパ−を用いることにより、スタンパ−側からの紫外
線や電子線等の照射が可能となり、紫外線や電子線等を
透過しない又は透過しにくい基板を用いた場合にも情報
記録媒体用基板の製造が可能となった。また本発明によ
れば、基板の周縁部に対応する領域に遮光パターンを備
えたスタンパ−を用いることにより、情報記録媒体用基
板の製造に際して、基板の周縁部に存在する硬化型樹脂
は硬化しないので、パリの発生が防止され、パリの発生
に伴なう諸問題、例えばスタンパ−からの基板の剥離の
困難さや、欠けたパリの基板表面への付着等の問題を解
消することができた。
[Effects of the Invention] As detailed above, according to the present invention, unlike conventional nickel stampers, by using a stamper that can transmit ultraviolet rays and electron beams, it is possible to prevent ultraviolet rays and electron beams from the stamper side. It has become possible to irradiate with radiation such as radiation, and it has become possible to manufacture substrates for information recording media even when using substrates that do not transmit or are difficult to transmit ultraviolet rays, electron beams, etc. Further, according to the present invention, by using a stamper having a light-shielding pattern in an area corresponding to the peripheral edge of the substrate, the curable resin present in the peripheral edge of the substrate is not cured when manufacturing a substrate for an information recording medium. Therefore, the generation of paris is prevented, and various problems associated with the generation of pars, such as difficulty in peeling the substrate from the stamper and adhesion of chipped pars to the substrate surface, can be solved. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の実施例を示す工程図、第2図は本発
明の実施例において用いられたスタンパ−の平面図、第
3図、第4図、第5図および第6図は、本発明の他の好
ましいスタンパ−の断面図である。 1・・・ディスク基板、1a・・・貫通孔、2・・・紫
外線硬化型樹脂、2a・・・紫外線硬化型樹脂膜、2b
・・・硬化済み樹脂膜、3・・・スタンパ−13a・・
・凸部、3b・・・凹部、3c、3d・・・遮光パター
ン、31・・・透光性基板、32・・・凹凸形状面を有
する5i02膜、4・・・処理装置、5・・・内室、6
・・・0リング、7・・・ガラス製上板、8・・・紫外
線、9・・・案内溝、A・・・減圧される空間部分、B
・・・加圧される空間部分。
FIG. 1 is a process diagram showing an embodiment of the present invention, FIG. 2 is a plan view of a stamper used in an embodiment of the present invention, and FIGS. 3, 4, 5, and 6 are FIG. 2 is a sectional view of another preferred stamper of the present invention. DESCRIPTION OF SYMBOLS 1... Disk substrate, 1a... Through hole, 2... Ultraviolet curable resin, 2a... Ultraviolet curable resin film, 2b
... Cured resin film, 3... Stamper 13a...
- Convex portion, 3b... Concave portion, 3c, 3d... Light shielding pattern, 31... Transparent substrate, 32... 5i02 film having an uneven surface, 4... Processing device, 5...・Inner room, 6
...0 ring, 7... Glass top plate, 8... Ultraviolet rays, 9... Guide groove, A... Space to be depressurized, B
...A space that is pressurized.

Claims (2)

【特許請求の範囲】[Claims] (1)情報記録媒体用基板の案内溝に対応する形状を有
するスタンピング面をその一主表面側に形成した透光性
基板と、前記情報記録媒体用基板の周縁部に対応する領
域に形成された遮光パターンとを有することを特徴とす
るスタンパー。
(1) A transparent substrate having a stamping surface having a shape corresponding to the guide groove of the information recording medium substrate formed on one main surface thereof, and a stamping surface formed in an area corresponding to the peripheral edge of the information recording medium substrate. A stamper characterized by having a light-shielding pattern.
(2)請求項(1)に記載の、遮光パターンを有するス
タンパーのスタンピング面と、案内溝付き情報記録媒体
用基板を製造するための平板状基板の一主表面との間に
硬化型樹脂を配置し、次いで前記スタンパーと前記平板
状基板の少なくとも一方の側から加圧し、その後、前記
遮光パターンをマスクとし前記硬化型樹脂を選択的に硬
化させ、次いで前記スタンパーのスタンピング面の形状
が転写された硬化済み樹脂膜が固着された前記平板状基
板をスタンパーから剥離する前、あるいは剥離した後、
前記硬化型樹脂の未硬化部分を除去することを特徴とす
る情報記録媒体用基板の製造方法。
(2) A curable resin is provided between the stamping surface of the stamper having a light-shielding pattern and one main surface of a flat substrate for producing a substrate for an information recording medium with a guide groove according to claim (1). Then, pressure is applied from at least one side of the stamper and the flat substrate, and then the curable resin is selectively cured using the light shielding pattern as a mask, and then the shape of the stamping surface of the stamper is transferred. Before or after peeling off the flat substrate to which the cured resin film is fixed from the stamper,
A method for manufacturing a substrate for an information recording medium, comprising removing an uncured portion of the curable resin.
JP16887389A 1989-01-25 1989-06-30 Manufacture of stamper and board for information recording medium for which stamper is used Pending JPH02289311A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1565389 1989-01-25
JP1-15653 1989-01-25

Publications (1)

Publication Number Publication Date
JPH02289311A true JPH02289311A (en) 1990-11-29

Family

ID=11894679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16887389A Pending JPH02289311A (en) 1989-01-25 1989-06-30 Manufacture of stamper and board for information recording medium for which stamper is used

Country Status (1)

Country Link
JP (1) JPH02289311A (en)

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