JPS59127833A - 励起気相析出法による薄膜の製造装置 - Google Patents

励起気相析出法による薄膜の製造装置

Info

Publication number
JPS59127833A
JPS59127833A JP58003264A JP326483A JPS59127833A JP S59127833 A JPS59127833 A JP S59127833A JP 58003264 A JP58003264 A JP 58003264A JP 326483 A JP326483 A JP 326483A JP S59127833 A JPS59127833 A JP S59127833A
Authority
JP
Japan
Prior art keywords
thin film
gas
reaction tank
reaction
reaction gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58003264A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0419702B2 (cg-RX-API-DMAC10.html
Inventor
Yutaka Hayashi
豊 林
Mitsuyuki Yamanaka
光之 山中
Atsuo Ito
厚雄 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP58003264A priority Critical patent/JPS59127833A/ja
Publication of JPS59127833A publication Critical patent/JPS59127833A/ja
Publication of JPH0419702B2 publication Critical patent/JPH0419702B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/3411—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • H10P14/24—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP58003264A 1983-01-12 1983-01-12 励起気相析出法による薄膜の製造装置 Granted JPS59127833A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58003264A JPS59127833A (ja) 1983-01-12 1983-01-12 励起気相析出法による薄膜の製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58003264A JPS59127833A (ja) 1983-01-12 1983-01-12 励起気相析出法による薄膜の製造装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP15487989A Division JPH0637705B2 (ja) 1989-06-16 1989-06-16 直接励起気相析出法による薄膜の製造装置

Publications (2)

Publication Number Publication Date
JPS59127833A true JPS59127833A (ja) 1984-07-23
JPH0419702B2 JPH0419702B2 (cg-RX-API-DMAC10.html) 1992-03-31

Family

ID=11552601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58003264A Granted JPS59127833A (ja) 1983-01-12 1983-01-12 励起気相析出法による薄膜の製造装置

Country Status (1)

Country Link
JP (1) JPS59127833A (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59218721A (ja) * 1983-05-27 1984-12-10 Ushio Inc 被膜形成方法
US5007374A (en) * 1988-03-22 1991-04-16 Semiconductor Energy Laboratory Co., Ltd. Apparatus for forming thin films in quantity

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50130369A (cg-RX-API-DMAC10.html) * 1974-04-01 1975-10-15
JPS56124229A (en) * 1980-03-05 1981-09-29 Matsushita Electric Ind Co Ltd Manufacture of thin film
JPS57202740A (en) * 1981-06-05 1982-12-11 Mitsubishi Electric Corp Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50130369A (cg-RX-API-DMAC10.html) * 1974-04-01 1975-10-15
JPS56124229A (en) * 1980-03-05 1981-09-29 Matsushita Electric Ind Co Ltd Manufacture of thin film
JPS57202740A (en) * 1981-06-05 1982-12-11 Mitsubishi Electric Corp Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59218721A (ja) * 1983-05-27 1984-12-10 Ushio Inc 被膜形成方法
US5007374A (en) * 1988-03-22 1991-04-16 Semiconductor Energy Laboratory Co., Ltd. Apparatus for forming thin films in quantity

Also Published As

Publication number Publication date
JPH0419702B2 (cg-RX-API-DMAC10.html) 1992-03-31

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