JPS59126776A - スパツタ方法 - Google Patents

スパツタ方法

Info

Publication number
JPS59126776A
JPS59126776A JP23062482A JP23062482A JPS59126776A JP S59126776 A JPS59126776 A JP S59126776A JP 23062482 A JP23062482 A JP 23062482A JP 23062482 A JP23062482 A JP 23062482A JP S59126776 A JPS59126776 A JP S59126776A
Authority
JP
Japan
Prior art keywords
sputtering
film
magnetic field
target
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23062482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS625229B2 (enrdf_load_stackoverflow
Inventor
Kazuhiko Amemori
和彦 雨森
Yoshio Takahashi
高橋　良雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP23062482A priority Critical patent/JPS59126776A/ja
Publication of JPS59126776A publication Critical patent/JPS59126776A/ja
Publication of JPS625229B2 publication Critical patent/JPS625229B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Physical Vapour Deposition (AREA)
JP23062482A 1982-12-28 1982-12-28 スパツタ方法 Granted JPS59126776A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23062482A JPS59126776A (ja) 1982-12-28 1982-12-28 スパツタ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23062482A JPS59126776A (ja) 1982-12-28 1982-12-28 スパツタ方法

Publications (2)

Publication Number Publication Date
JPS59126776A true JPS59126776A (ja) 1984-07-21
JPS625229B2 JPS625229B2 (enrdf_load_stackoverflow) 1987-02-03

Family

ID=16910687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23062482A Granted JPS59126776A (ja) 1982-12-28 1982-12-28 スパツタ方法

Country Status (1)

Country Link
JP (1) JPS59126776A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62128109A (ja) * 1985-11-29 1987-06-10 Akai Electric Co Ltd 高透磁率積層膜の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5778123A (en) * 1980-11-04 1982-05-15 Hitachi Ltd Manufacture of anisotropic thin magnetic film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5778123A (en) * 1980-11-04 1982-05-15 Hitachi Ltd Manufacture of anisotropic thin magnetic film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62128109A (ja) * 1985-11-29 1987-06-10 Akai Electric Co Ltd 高透磁率積層膜の製造方法

Also Published As

Publication number Publication date
JPS625229B2 (enrdf_load_stackoverflow) 1987-02-03

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