JPS5898935A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS5898935A JPS5898935A JP56197851A JP19785181A JPS5898935A JP S5898935 A JPS5898935 A JP S5898935A JP 56197851 A JP56197851 A JP 56197851A JP 19785181 A JP19785181 A JP 19785181A JP S5898935 A JPS5898935 A JP S5898935A
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon
- silicon oxide
- semiconductor device
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W10/014—
-
- H10W10/17—
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56197851A JPS5898935A (ja) | 1981-12-09 | 1981-12-09 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56197851A JPS5898935A (ja) | 1981-12-09 | 1981-12-09 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5898935A true JPS5898935A (ja) | 1983-06-13 |
| JPH0427692B2 JPH0427692B2 (enExample) | 1992-05-12 |
Family
ID=16381387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56197851A Granted JPS5898935A (ja) | 1981-12-09 | 1981-12-09 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5898935A (enExample) |
-
1981
- 1981-12-09 JP JP56197851A patent/JPS5898935A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0427692B2 (enExample) | 1992-05-12 |
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