JPS589890A - Metallization of silicon carbide formed body - Google Patents
Metallization of silicon carbide formed bodyInfo
- Publication number
- JPS589890A JPS589890A JP10116781A JP10116781A JPS589890A JP S589890 A JPS589890 A JP S589890A JP 10116781 A JP10116781 A JP 10116781A JP 10116781 A JP10116781 A JP 10116781A JP S589890 A JPS589890 A JP S589890A
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- molded body
- carbide molded
- metallizing
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Ceramic Products (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は炭化珪素成形体のメタライズ法に係シ、特に炭
化珪素成形体に対する接着強度のすぐれたメタライズ方
法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of metallizing a silicon carbide molded body, and more particularly to a metallizing method that provides excellent adhesive strength to a silicon carbide molded body.
従来よシ、アルミナ等の酸化物系セラミックスのメタラ
イズに関しては、高融点金属法、金属酸化法などの方法
がある。最近焼結技術が進歩し、耐熱材料としてのター
ビンブレードや高熱伝導性材料としてのモジュール基板
などに、高密度の炭化珪素成形体を応用することが見直
されてきた。Conventionally, there are methods for metallizing oxide ceramics such as alumina, such as a high melting point metal method and a metal oxidation method. Recently, sintering technology has advanced, and the application of high-density silicon carbide molded bodies to turbine blades as a heat-resistant material and module substrates as a highly thermally conductive material has been reconsidered.
しかし炭化珪素成形体のメタライズ法が確立していない
ため、炭化珪素成形体の応用のネックになっていた。However, the metallization method for silicon carbide molded bodies has not been established, which has been a bottleneck in the application of silicon carbide molded bodies.
本発明の目的は、接着強度のすぐれた炭化珪素成形体の
メタライズ方法を提供することにある。An object of the present invention is to provide a method for metallizing a silicon carbide molded body with excellent adhesive strength.
本発明は、炭化珪素成形体に金属粉と塗布し焼付けるメ
タライズ方法において、前記炭化水素成形体にMO80
〜99.5重量%と、W2O−0,5重量%とを含有す
る金属粉を有機ビヒクルに分散させたペーストを塗布し
不活性雰囲気中で焼付けることを特徴とする。The present invention provides a metallizing method in which a silicon carbide molded body is coated with metal powder and baked, and the hydrocarbon molded body is coated with MO80.
It is characterized by applying a paste in which metal powder containing ~99.5% by weight and 0.5% by weight of W2O is dispersed in an organic vehicle and baking it in an inert atmosphere.
本発明においてはMo粉とW粉の混合粉又はMo−W合
金粉を使用するのが必須の要件であシ、これらの金属粉
中Wの含有量が015重量%未満或は20重量%を越す
といずれも接着強度が劣シ゛又焼付温度が上昇するので
、金属粉中、Wが20〜0、5重量%、Mo粉が80〜
90.5重量%の範囲で含有されていることが必要であ
る。In the present invention, it is essential to use a mixed powder of Mo powder and W powder or a Mo-W alloy powder, and the content of W in these metal powders is less than 0.15% by weight or less than 20% by weight. If the temperature exceeds 20 to 0.5% by weight, the adhesive strength will be poor and the baking temperature will increase.
It is necessary that the content be in the range of 90.5% by weight.
なおこの金属粉は純金属に限定するものでなくMO合金
およびW合金の金属粉を使用することができる。Note that this metal powder is not limited to pure metal, and metal powders of MO alloy and W alloy can be used.
炭化珪素成形体の用途によってはメタライズされた表面
よシ金属のめつき面が要求されることがあシ、本発明の
Mo−W粉メタライズ後の表面にAg、Au、Niおよ
びCu等の金属層をめっきすることができる。そのめっ
き層の厚さが0.5μm未満では効果が少く、又300
μmを越すと不経済であシかつ接着強度も低下するので
、めっき厚さは0.5〜300μmの範囲が望ましい。Depending on the use of the silicon carbide molded product, a metal plating surface may be required on the metallized surface. layers can be plated. If the thickness of the plating layer is less than 0.5 μm, the effect will be small;
If the thickness exceeds .mu.m, it is uneconomical and the adhesive strength also decreases, so the plating thickness is preferably in the range of 0.5 to 300 .mu.m.
メタライズは任意の形状に加工が可能であって加工のた
めの形状の制約はない。Metallization can be processed into any shape, and there are no restrictions on the shape for processing.
焼付温度は1200 ”c未満ではメタライズ層が多孔
質となり、接着強度が低く、又1400″Cを超えると
接着強度が低下するので1250〜1400 ’cの範
囲が好ましい。特に1700 ’cを超えると、メタラ
イズ材の蒸発量が大きくなシ、メタライズ層が薄くなっ
て接着強度が低下する。If the baking temperature is less than 1200''C, the metallized layer will become porous and the adhesive strength will be low, and if it exceeds 1400''C, the adhesive strength will decrease, so a range of 1250 to 1400''C is preferred. In particular, when it exceeds 1700'c, the amount of evaporation of the metallizing material becomes large, the metallizing layer becomes thin, and the adhesive strength decreases.
メタライズの接着機構は酸化物系セラミックスと同様に
中間層の生成が考えられ、実際にメタライズしたものの
断面をX線マイクロアナライザーで分析すると硅化物や
炭化物の生成が認められる。The adhesion mechanism of metallized metallization is thought to be the formation of an intermediate layer, similar to that of oxide-based ceramics, and when a cross section of an actual metallized material is analyzed with an X-ray microanalyzer, the formation of silicides and carbides is observed.
実施例 1
炭化珪素粉と焼結助剤として2重量部のHeOを混合し
2050 ’cにおいて30分間真空ホットプレス成形
した炭化珪素成形体にMo粉およびW粉を第1表に示す
組成で7チエチルセルa−ズ/カルピトールアセテート
中に分散した粘度約10万センチポアズのペーストを塗
布し1200 ’c〜1700 ’cの温度範囲で焼付
け、ついでそのメタライズ層に膜厚5μmの電気Niめ
っきを施し、その接着強度を第1表および第2表に示し
た。第1表および第2表よシ明らかな如く本発明のメタ
ライズ層の接着強度は強くすぐれている。Example 1 Silicon carbide powder was mixed with 2 parts by weight of HeO as a sintering aid, and vacuum hot press molded at 2050'c for 30 minutes. Mo powder and W powder were added to a silicon carbide molded body with the composition shown in Table 1. A paste with a viscosity of approximately 100,000 centipoise dispersed in thiethyl cell a/calpitol acetate was applied and baked at a temperature range of 1200'C to 1700'C, and then the metallized layer was electroplated with Ni to a thickness of 5 μm, The adhesive strengths are shown in Tables 1 and 2. As is clear from Tables 1 and 2, the adhesive strength of the metallized layer of the present invention is strong and excellent.
第1表
第1表
第2表
第2表
実施例 2
炭化珪素粉と焼結助剤として2重量部のBeOを混合し
、2o5o′Cにお−て3o分間真空ポットプレス成形
した炭化珪素成形体に第3表に示す混合粉を7%エチル
セルローズ/カルピトールアセテート中に分散したペー
スト(粘度、約10万センチポイズ)を塗布し1400
’cで30分間焼付けた。ついでそのメタライズ層に
眠気Niめっき(膜厚5μm)L、その接着強度を第3
表に示しだ。Table 1 Table 1 Table 2 Table 2 Example 2 Silicon carbide molded by mixing silicon carbide powder and 2 parts by weight of BeO as a sintering aid and vacuum pot press molding at 2o5o'C for 30 minutes. A paste (viscosity, approximately 100,000 centipoise) of the mixed powder shown in Table 3 dispersed in 7% ethyl cellulose/carpitol acetate was applied to the body.
Bake for 30 minutes at 'c. Next, the metallized layer was plated with drowsy Ni (film thickness: 5 μm) L, and the adhesive strength was
It is shown in the table.
実施例 3
炭化珪素粉と焼結助剤として2重量部のBeOを混合し
、2050′cで30分間真空ホットプレス成形した炭
化珪素成形体に、Mo粉90重量部、W粉10重量部の
混合粉を7%エチルアセテート/カルピトールアセテー
ト中に分散したペーストを塗布し、1300 ’cで焼
付けた。次いでメタライズ層に第4表に示す金属をめっ
きし、接着強度を測定した。Example 3 Silicon carbide powder was mixed with 2 parts by weight of BeO as a sintering aid, and 90 parts by weight of Mo powder and 10 parts by weight of W powder were added to a silicon carbide molded body which was vacuum hot press molded at 2050'c for 30 minutes. A paste of mixed powder dispersed in 7% ethyl acetate/carpitol acetate was applied and baked at 1300'c. Next, the metallized layer was plated with the metal shown in Table 4, and the adhesive strength was measured.
第4表Table 4
Claims (1)
ズ方法において、前記炭化珪素−成形体にMO80〜9
9.5重量%と、W20〜0.5重量%とを含有する金
属粉を有機ビヒクルに分散させたペーストを塗布し不活
性雰囲気中で焼付けることを特徴とする炭化珪素成形体
のメタライズ方法。 2、 前記不活性雰囲気中の焼付は工程における温度が
1250℃〜1400でであることを特徴とする特許請
求の範囲第1項記載の炭化珪素成形体のメタライズ方法
。 3、 前記炭化珪素成形体のメタライズ層上に、更に金
属層を設けることを特徴とする特許請求の範囲第1項又
は第2項rlc躬載の炭化珪素成形体のメタライズ方法
。[Claims] 1. In a metallizing method in which a silicon carbide molded body is coated with metal powder and baked, the silicon carbide molded body is coated with MO80-9.
A method for metallizing a silicon carbide molded body, characterized by applying a paste in which metal powder containing 9.5% by weight and 20 to 0.5% by weight of W is dispersed in an organic vehicle and baking it in an inert atmosphere. . 2. The method for metallizing a silicon carbide molded body according to claim 1, wherein the baking in the inert atmosphere is performed at a temperature of 1250° C. to 1400° C. 3. A method for metallizing a silicon carbide molded body as described in claim 1 or 2, characterized in that a metal layer is further provided on the metallized layer of the silicon carbide molded body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10116781A JPS589890A (en) | 1981-07-01 | 1981-07-01 | Metallization of silicon carbide formed body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10116781A JPS589890A (en) | 1981-07-01 | 1981-07-01 | Metallization of silicon carbide formed body |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS589890A true JPS589890A (en) | 1983-01-20 |
JPS6110424B2 JPS6110424B2 (en) | 1986-03-29 |
Family
ID=14293465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10116781A Granted JPS589890A (en) | 1981-07-01 | 1981-07-01 | Metallization of silicon carbide formed body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS589890A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59164687A (en) * | 1983-03-11 | 1984-09-17 | 日立化成工業株式会社 | Metallizing composition for non-oxide ceramics |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63144517U (en) * | 1987-03-13 | 1988-09-22 |
-
1981
- 1981-07-01 JP JP10116781A patent/JPS589890A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59164687A (en) * | 1983-03-11 | 1984-09-17 | 日立化成工業株式会社 | Metallizing composition for non-oxide ceramics |
Also Published As
Publication number | Publication date |
---|---|
JPS6110424B2 (en) | 1986-03-29 |
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