JPS5896729A - Glow discharge device - Google Patents

Abstract

PURPOSE:To equally maintain gas density and to obtain uniform films by a method wherein partition plates are inserted perpendicular to two flat plate electrodes and placed between the two flat plate electrodes positioned in parallel with each other. CONSTITUTION:A gas flowed from an electrode 1 is dissolved by glow discharge to form films on substrates 5 on an electrode heated by a heater 3. In such a glow discharge device, gas flow control plates 7 are placed perpendicular to the electrodes 1, 2. In this way, the dissolved gas does not directly advance to an exhaust port 4 but advances to a substrate 4 for once. Therefore, film growth speed and the uniformity of the films are remarkably improved.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a claw discharge device in which the two electrodes are parallel to each other and flat.

Conventionally, the mainstream method has been to create AMO/L phase φ silicon tC by decomposing gas in plasma generated by a glow discharge method.

Glow discharge methods can be broadly classified into ('1) direct Mf glow discharge method, C) capacitance-coupled high-frequency glow discharge method, and (2) inductively coupled high-frequency glow discharge method. In addition, the glow discharge method
■We are still trying to understand the plasma state sufficiently.■
The structure of the equipment used in each institution should be uniformly regulated for any reason. The gas supply method, which is one of the creation conditions, also requires 4 tr.
If this is the case, the uniformity of the produced film cannot be maintained because of the static ttC type and maintaining the scum density at a high level. If, as shown in FIG. 1, < tW tFi i the outflowing gas automatically enters the exhaust port 4 and decomposes. At this time, it is desirable that the gas density be uniform between electrode 1 and electrode 2, but conventional devices are insufficient in this respect. The decomposed ζ ripple gas due to the high frequency glow discharge is ejected toward the discharge port 4 before reaching the end plate 5, and the scum density becomes non-uniform, and at the same time, the growth rate of l^ is slowed down.

The present invention has obviated such drawbacks, and its objectives 171
A glow discharge device in which two electrodes are parallel to each other and are flat plates is used to uniformly remove scum and form a uniform film.

The present invention will be explained in detail below based on an example.

FIG. 2 shows a capacitively coupled cavity frequency glow discharge device including a gas control plate according to the present invention.
The electrode 2.3 is a heater, 4 gas outlet, 5 board,
61L+reaction chamber, 7 gas flow control plates. The gas flowing out from the electrode 1 is decomposed by glow discharge, and a film is formed on the wrinkled substrate 5 heated by the heater. Even though the uniformity of the film is due to the soil condition, it is desirable that the growth rate of the film is not slow. The gas flow control board was not placed in order to satisfy the above conditions, and the material was made of quartz glass, stainless steel, etc. to receive the plasma influence. A material that can be used to create a warm bite is suitable. If the shape 2 is such that the control plate covers the outer periphery of the seven electrodes, for example, if a circular plate is used in the electric connection LE, it is appropriate that the control plate be cylindrical. Furthermore, by drilling holes for gas flow in the control board, a roughly fine gas flow side N is possible. By inserting the gas flow control plate 7, the decomposed gas can be directed directly to the outlet 4 (or to the motherboard 5).

1-1 The film growth rate lv and film uniformity are significantly improved.Also, by adding a slope to the high filter of the gas flow control plate and making the i+discharge port 4 side high, good results were also obtained. In.

[Brief explanation of the drawing]

Figure 1 shows a conventional capacitively coupled high frequency glow discharge setup;
The figure shows a device according to the invention. 1... Electrode 1 (Gas port outlet) 2... Electrode 2 (Substrate support plate) 3... Heater 4... Gas outlet 5... ...Substrate 6...Glow discharge deposition chamber and above Applicant Suwa Seikosha Co., Ltd. Furijin Patent attorney Tsutomu Tsutomu 4- Figure 1 Figure 2

Claims (1)

[Claims] A glow discharge device in which two electrodes are parallel to each other and are flat plates, and a glow discharge device is characterized in that a stub is placed perpendicularly to the flat plate between the electrode 1 and the electrode 2.