JPS5893048A - ポジ型放射線レジスト - Google Patents

ポジ型放射線レジスト

Info

Publication number
JPS5893048A
JPS5893048A JP56191490A JP19149081A JPS5893048A JP S5893048 A JPS5893048 A JP S5893048A JP 56191490 A JP56191490 A JP 56191490A JP 19149081 A JP19149081 A JP 19149081A JP S5893048 A JPS5893048 A JP S5893048A
Authority
JP
Japan
Prior art keywords
copolymer
resist
methacrylate
sensitivity
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56191490A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349213B2 (cs
Inventor
Makoto Tanaka
誠 田中
Masahiro Kadooka
正弘 角岡
Bunya Konishi
小西　文弥
Kenichi Takeyama
竹山　健一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56191490A priority Critical patent/JPS5893048A/ja
Publication of JPS5893048A publication Critical patent/JPS5893048A/ja
Publication of JPS6349213B2 publication Critical patent/JPS6349213B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP56191490A 1981-11-27 1981-11-27 ポジ型放射線レジスト Granted JPS5893048A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56191490A JPS5893048A (ja) 1981-11-27 1981-11-27 ポジ型放射線レジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56191490A JPS5893048A (ja) 1981-11-27 1981-11-27 ポジ型放射線レジスト

Publications (2)

Publication Number Publication Date
JPS5893048A true JPS5893048A (ja) 1983-06-02
JPS6349213B2 JPS6349213B2 (cs) 1988-10-04

Family

ID=16275506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56191490A Granted JPS5893048A (ja) 1981-11-27 1981-11-27 ポジ型放射線レジスト

Country Status (1)

Country Link
JP (1) JPS5893048A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5514762A (en) * 1993-03-22 1996-05-07 Basf Aktiengesellschaft Copolymerizable oxime ethers and copolymers containing them
US6376154B2 (en) 1996-02-26 2002-04-23 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method
KR20110041415A (ko) * 2009-10-15 2011-04-21 스미또모 가가꾸 가부시키가이샤 포토레지스트 조성물

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5514762A (en) * 1993-03-22 1996-05-07 Basf Aktiengesellschaft Copolymerizable oxime ethers and copolymers containing them
US6376154B2 (en) 1996-02-26 2002-04-23 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method
US6387592B2 (en) 1996-02-26 2002-05-14 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method
US6387598B2 (en) 1996-02-26 2002-05-14 Matsushita Electric Industrial Co., Ltd. Pattern forming material and pattern forming method
KR20110041415A (ko) * 2009-10-15 2011-04-21 스미또모 가가꾸 가부시키가이샤 포토레지스트 조성물

Also Published As

Publication number Publication date
JPS6349213B2 (cs) 1988-10-04

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