JPS5887743A - 二次イオン質量分析計 - Google Patents

二次イオン質量分析計

Info

Publication number
JPS5887743A
JPS5887743A JP56185907A JP18590781A JPS5887743A JP S5887743 A JPS5887743 A JP S5887743A JP 56185907 A JP56185907 A JP 56185907A JP 18590781 A JP18590781 A JP 18590781A JP S5887743 A JPS5887743 A JP S5887743A
Authority
JP
Japan
Prior art keywords
ion
sample
ions
ion beam
gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56185907A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0359545B2 (enExample
Inventor
Toshizo Fujiwara
藤原　稔三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP56185907A priority Critical patent/JPS5887743A/ja
Publication of JPS5887743A publication Critical patent/JPS5887743A/ja
Publication of JPH0359545B2 publication Critical patent/JPH0359545B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
JP56185907A 1981-11-17 1981-11-17 二次イオン質量分析計 Granted JPS5887743A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56185907A JPS5887743A (ja) 1981-11-17 1981-11-17 二次イオン質量分析計

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56185907A JPS5887743A (ja) 1981-11-17 1981-11-17 二次イオン質量分析計

Publications (2)

Publication Number Publication Date
JPS5887743A true JPS5887743A (ja) 1983-05-25
JPH0359545B2 JPH0359545B2 (enExample) 1991-09-10

Family

ID=16178965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56185907A Granted JPS5887743A (ja) 1981-11-17 1981-11-17 二次イオン質量分析計

Country Status (1)

Country Link
JP (1) JPS5887743A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02199761A (ja) * 1989-01-30 1990-08-08 Nippon Telegr & Teleph Corp <Ntt> 二次イオン質量分析装置
JP2013242302A (ja) * 2012-04-24 2013-12-05 Semiconductor Energy Lab Co Ltd 分析装置及び分析方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS517991A (enExample) * 1974-07-10 1976-01-22 Hitachi Ltd

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS517991A (enExample) * 1974-07-10 1976-01-22 Hitachi Ltd

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02199761A (ja) * 1989-01-30 1990-08-08 Nippon Telegr & Teleph Corp <Ntt> 二次イオン質量分析装置
JP2013242302A (ja) * 2012-04-24 2013-12-05 Semiconductor Energy Lab Co Ltd 分析装置及び分析方法

Also Published As

Publication number Publication date
JPH0359545B2 (enExample) 1991-09-10

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