JPS5883153U - Wafer inspection equipment - Google Patents

Wafer inspection equipment

Info

Publication number
JPS5883153U
JPS5883153U JP17973281U JP17973281U JPS5883153U JP S5883153 U JPS5883153 U JP S5883153U JP 17973281 U JP17973281 U JP 17973281U JP 17973281 U JP17973281 U JP 17973281U JP S5883153 U JPS5883153 U JP S5883153U
Authority
JP
Japan
Prior art keywords
wafer
wafer inspection
inspection equipment
stage
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17973281U
Other languages
Japanese (ja)
Inventor
浪花 秀明
Original Assignee
日本電気ホームエレクトロニクス株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気ホームエレクトロニクス株式会社 filed Critical 日本電気ホームエレクトロニクス株式会社
Priority to JP17973281U priority Critical patent/JPS5883153U/en
Publication of JPS5883153U publication Critical patent/JPS5883153U/en
Pending legal-status Critical Current

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Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来のウェーハ検査装置のウェーハ真空吸着
ステージの要部断面図、第2図はその要部斜視図、第3
図はこの考案の一実施例を示すウェーハ検査装置のウェ
ーハ真空吸着ステージの平面図、第4図は、半導体素子
形成済みのウェーハの平面図、第5図は一実施例を示し
たウェーハ真空吸着ステージの要部拡大断面図、第6図
はウェーハ検査状態を示すウェーハを断面視した模式図
゛である。 8・・・・・・ウェーハ、9・・・・・・ステージ、1
0・・・・・・多分割された小弁、14・・・・・・通
電検査用触子(平行ピン)、18・・・・・・無接点切
換素子、23・・・・・・電圧検出用検針、24.26
・・・・・・電流駆動用検針。 第3図
Figure 1 is a sectional view of the main part of a wafer vacuum suction stage of a conventional wafer inspection system, Figure 2 is a perspective view of the main part, and Figure 3 is a perspective view of the main part.
The figure is a plan view of a wafer vacuum suction stage of a wafer inspection system showing an embodiment of this invention, FIG. 4 is a plan view of a wafer on which semiconductor elements have been formed, and FIG. FIG. 6, which is an enlarged cross-sectional view of the main part of the stage, is a schematic cross-sectional view of the wafer showing the wafer inspection state. 8...Wafer, 9...Stage, 1
0...Multi-divided small valve, 14...Contactor for current testing (parallel pin), 18...Non-contact switching element, 23... Meter reading for voltage detection, 24.26
・・・・・・Meter reading for current drive. Figure 3

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体素子形成済みのウェーハを、ステージ上に真空吸
着して固定し、ウェーハへ検針を接触させて通電し特性
検査を行う装置において、前記ステージを多分割形成す
るとともに、夫々を別個の通電検査用触子として接点切
換を行い検針と共働させることを特徴とするウェーハ検
査装置。
In an apparatus in which a wafer on which semiconductor elements have been formed is fixed by vacuum suction on a stage, and a probe is brought into contact with the wafer to conduct a characteristic test, the stage is formed into multiple parts, and each part is used for a separate energization test. A wafer inspection device characterized by switching contacts as a probe and cooperating with needle detection.
JP17973281U 1981-11-30 1981-11-30 Wafer inspection equipment Pending JPS5883153U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17973281U JPS5883153U (en) 1981-11-30 1981-11-30 Wafer inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17973281U JPS5883153U (en) 1981-11-30 1981-11-30 Wafer inspection equipment

Publications (1)

Publication Number Publication Date
JPS5883153U true JPS5883153U (en) 1983-06-06

Family

ID=29975690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17973281U Pending JPS5883153U (en) 1981-11-30 1981-11-30 Wafer inspection equipment

Country Status (1)

Country Link
JP (1) JPS5883153U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018021801A (en) * 2016-08-02 2018-02-08 株式会社デンソー Semiconductor element inspection device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54146581A (en) * 1978-05-09 1979-11-15 Mitsubishi Electric Corp Electric chracteristic measuring device for semiconductor chip
JPS5599734A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Pattern-sheet for characteristic test of semiconductor element
JPS5545247B2 (en) * 1971-09-30 1980-11-17

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5545247B2 (en) * 1971-09-30 1980-11-17
JPS54146581A (en) * 1978-05-09 1979-11-15 Mitsubishi Electric Corp Electric chracteristic measuring device for semiconductor chip
JPS5599734A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Pattern-sheet for characteristic test of semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018021801A (en) * 2016-08-02 2018-02-08 株式会社デンソー Semiconductor element inspection device

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