JPS5881998A - 陽極反応処理装置 - Google Patents
陽極反応処理装置Info
- Publication number
- JPS5881998A JPS5881998A JP17971081A JP17971081A JPS5881998A JP S5881998 A JPS5881998 A JP S5881998A JP 17971081 A JP17971081 A JP 17971081A JP 17971081 A JP17971081 A JP 17971081A JP S5881998 A JPS5881998 A JP S5881998A
- Authority
- JP
- Japan
- Prior art keywords
- electrolyte
- substrate
- reaction treatment
- treatment apparatus
- porous silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 18
- 238000011282 treatment Methods 0.000 title claims abstract description 16
- 239000003792 electrolyte Substances 0.000 claims abstract description 71
- 239000007788 liquid Substances 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims description 55
- 229910021426 porous silicon Inorganic materials 0.000 abstract description 20
- 230000015572 biosynthetic process Effects 0.000 abstract description 7
- 230000003134 recirculating effect Effects 0.000 abstract 1
- 239000008151 electrolyte solution Substances 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000002048 anodisation reaction Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Electrochemical Coating By Surface Reaction (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17971081A JPS5881998A (ja) | 1981-11-11 | 1981-11-11 | 陽極反応処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17971081A JPS5881998A (ja) | 1981-11-11 | 1981-11-11 | 陽極反応処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5881998A true JPS5881998A (ja) | 1983-05-17 |
| JPS6127475B2 JPS6127475B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-06-25 |
Family
ID=16070514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17971081A Granted JPS5881998A (ja) | 1981-11-11 | 1981-11-11 | 陽極反応処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5881998A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1981
- 1981-11-11 JP JP17971081A patent/JPS5881998A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6127475B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-06-25 |
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