JPS5877296A - Heat sink board - Google Patents

Heat sink board

Info

Publication number
JPS5877296A
JPS5877296A JP17614881A JP17614881A JPS5877296A JP S5877296 A JPS5877296 A JP S5877296A JP 17614881 A JP17614881 A JP 17614881A JP 17614881 A JP17614881 A JP 17614881A JP S5877296 A JPS5877296 A JP S5877296A
Authority
JP
Japan
Prior art keywords
heat dissipation
board
film
heat
aluminum plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17614881A
Other languages
Japanese (ja)
Inventor
準市 岡元
和之 嶋田
石田 富雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP17614881A priority Critical patent/JPS5877296A/en
Publication of JPS5877296A publication Critical patent/JPS5877296A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、大電力を消費して発熱の大きい回路素子を組
み込まなければならない大電力回路用の放熱基板に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a heat dissipation board for a high power circuit in which circuit elements that consume a large amount of power and generate a large amount of heat must be incorporated.

従来の大電力回路は、セラミック板あるいは、ガラス板
などの絶縁基板上に、導電体をスクリーン印刷法あるい
は蒸着法で形成し、抵抗器、コンデンサ等の受動回路素
子やトランジスタ等の能動回路素子を組み込んで形成さ
れていた。
Conventional high-power circuits are made by forming conductors on insulating substrates such as ceramic plates or glass plates using screen printing or vapor deposition methods, and passive circuit elements such as resistors and capacitors, and active circuit elements such as transistors. It was formed by incorporating it.

しかし上記構成においては、基板がセラミツ久ガラス等
の絶縁物であるため熱放散が門<、大電力用として設計
された抵抗器やトランジスタを組み込んだ場合、抵抗器
、トランジスタの発熱が非常に多いため、その熱によっ
てコンデンサなどの周辺部品のみならず抵抗器や°トラ
ンジスタそのものも破壊してしまう危険性がある。また
破壊に到らないまでも電気的特性を大きく変化させてし
まうことが多い。その対策と信頼性を上げるため導電体
と回路素子の間に大きなアルミニウム放熱板を別に加工
し取シ付け、回路素子の温度上昇を防いでいるケースが
しばしばみられた。
However, in the above configuration, since the substrate is an insulating material such as ceramic glass, heat dissipation is a problem.When resistors and transistors designed for high power are incorporated, the resistors and transistors generate a lot of heat. Therefore, there is a risk that the heat may destroy not only peripheral components such as capacitors, but also resistors and transistors themselves. Furthermore, even if the damage does not result in destruction, the electrical characteristics often change significantly. In order to counter this and improve reliability, it is often the case that a large aluminum heat sink is separately fabricated and installed between the conductor and the circuit element to prevent the temperature of the circuit element from rising.

あるいは、熱放散を効果的にするためアルミニウムの金
属板を用いアルミニウム板の全面に陽極酸化処理を行な
い酸化アルミニウム皮膜を形成させ絶縁基板として用い
られたものもある。しかしこの場合酸化アルミニウム皮
膜が熱に対して非常に弱く120℃で皮膜割れを起こし
、110℃の゛温度差においても皮膜割れが生ずる。そ
のため電気絶縁性が大きな問題となる。この電気絶縁性
対策として酸化アルミニウム皮膜上に樹脂をコーティン
グしたものもあるが樹脂層によって熱放散が悪化する。
Alternatively, in order to effectively dissipate heat, an aluminum metal plate is used, and the entire surface of the aluminum plate is anodized to form an aluminum oxide film, which is used as an insulating substrate. However, in this case, the aluminum oxide film is very sensitive to heat and cracks at 120°C, and cracks occur even at a temperature difference of 110°C. Therefore, electrical insulation becomes a big problem. As a measure against electrical insulation, some aluminum oxide films are coated with a resin, but the resin layer deteriorates heat dissipation.

またアルミニウム板の一生面に直かに樹脂層な設けた絶
縁基板も用いられているが樹脂層のピンホールの問題と
電気絶縁性から、おのずとその樹脂層は厚くなり熱放散
が非常に悪くなる0また従来における絶縁皮膜上の導電
体は、導電体材料をスクリーン印刷法にて塗布し硬化す
るか、ちるいは、蒸着法にてマスク蒸着するか、無電解
メッキ法にて形成するかであり、工数が増え煩雑の面が
ある。
Insulating substrates with a resin layer directly on the surface of an aluminum plate are also used, but due to the problem of pinholes in the resin layer and its electrical insulation, the resin layer naturally becomes thicker and has very poor heat dissipation. 0 In addition, conventional conductors on insulating films can be formed by applying a conductor material using a screen printing method and curing it, by depositing a film using a mask using a vapor deposition method, or by using an electroless plating method. However, it requires more man-hours and is complicated.

このように従来の放熱基板は、大電力を消費して発熱の
大きい回路素子を組み込まなければならない大電力回路
用の放熱基板としては不適であり欠点が多い。
As described above, conventional heat dissipation boards are unsuitable as heat dissipation boards for high-power circuits in which circuit elements that consume large amounts of power and generate large amounts of heat must be incorporated, and have many drawbacks.

本発明は上述した欠点に対して抵抗器やトランジスタか
ら発生する熱を効果的に放熱し、電気絶縁性の良好な、
かつ構造が簡単で量産性のある放熱基板を提供するもの
で以下図面と共に本発明の詳細な説明する。
The present invention solves the above-mentioned drawbacks by effectively dissipating the heat generated from resistors and transistors, and providing excellent electrical insulation.
The present invention provides a heat dissipation board that has a simple structure and can be mass-produced.The present invention will be described in detail below with reference to the drawings.

本発明の放熱基板の構成は、第1図、第2図に示すよう
にシリコン樹脂と溶剤からなるワニスに酸化けい素を安
定に分散させた処理剤をアルミニウム板1の少なくとも
一生面に塗布硬化せしめ(いわゆるダウコーニング社方
式のベスタ処理剤におけるベスタ処理)絶縁皮膜2を形
成し、該皮膜2上に金属張ジノリント基板3を付着形成
してなるものである。
The structure of the heat dissipation board of the present invention is as shown in FIGS. 1 and 2. A treatment agent in which silicon oxide is stably dispersed in a varnish made of silicone resin and a solvent is applied and hardened on at least one surface of an aluminum plate 1. This is achieved by forming an insulating film 2 (so-called Vesta treatment using the Vesta treatment agent of the Dow Corning Company method) and depositing a metal-clad dinolint substrate 3 on the film 2.

このように構成した本発明の放熱基板は、アルミニウム
の表面にシリコン樹脂と溶剤がら々るワニスに酸化けい
素を安定に分散させたペスタ処理剤を塗布形成させてい
るため耐熱性が非常に良好で、従来用いられている酸化
アルミニウム皮膜のみのものが、約120℃の加熱によ
って皮膜割れを生じるのに対し、350℃で1o分間加
熱しても皮膜割れの発生がない。耐熱衝撃性も極めて大
きく酸化アルミニウム皮膜のみの場合では約110℃の
温度差で皮膜割れを生じるが、3oo℃で10分間加熱
した後、ただちに20℃の水に浸漬しても皮膜割れの発
生がない。また塗布方法は、ディップ法、スプレー法、
静電塗装法などいずれの方法も用いることが可能でピン
ホールもほとんど認められず、極めて大きな耐食性を示
す。また沸騰水中に約500時間浸漬しても黒変化等の
発生がなく優れた耐熱水性を示す。
The heat dissipation board of the present invention constructed in this way has very good heat resistance because it is coated with a PESTA treatment agent in which silicon oxide is stably dispersed in a varnish containing silicone resin and solvent on the aluminum surface. In contrast to conventionally used aluminum oxide films that crack when heated to about 120°C, no cracking occurs even when heated at 350°C for 10 minutes. Thermal shock resistance is also extremely high, and in the case of aluminum oxide film only, a temperature difference of about 110°C will cause the film to crack, but even after heating at 30°C for 10 minutes, immediately immersing it in water at 20°C will not cause film cracking. do not have. Application methods include dip method, spray method,
Any method such as electrostatic painting can be used, and almost no pinholes are observed, showing extremely high corrosion resistance. Further, even when immersed in boiling water for about 500 hours, no blackening occurs, and it exhibits excellent hot water resistance.

ベスタ処理による皮膜はディップ法で塗布した場合、1
回の処理で4〜6μmの皮膜厚を得ることができる。こ
のように皮膜厚を薄く得られることから抵抗器やトラン
ジスタを組み込んだ場合抵抗器、トランジスタからの発
熱はすみやかにアルミニウム板に伝わり外気に放散する
ことができる。
When applied by the dip method, the film produced by Vesta treatment is 1
A film thickness of 4 to 6 μm can be obtained in one treatment. Since the film can be made thin in this way, when a resistor or transistor is incorporated, the heat generated from the resistor or transistor can be quickly transmitted to the aluminum plate and dissipated into the outside air.

また上記絶縁皮膜2上に直かに金属張りプリント基板3
を付着形成しているため、従来の導電材料をスクリーン
印刷法にて塗布し硬化する。あるいは蒸着法にて導を体
材料を全面蒸着後、電解メッキし、のちにパターン状に
エツチングする。または蒸着法にてマスク蒸着し電解メ
ッキするなどの煩雑な面がなく、容易に金属張りプリン
ト基板3のA?ターンエツチングにて導電体5を得るこ
とができる。
In addition, a metal-clad printed circuit board 3 is placed directly on the insulating film 2.
Since it is formed by adhesion, a conventional conductive material is applied and cured using a screen printing method. Alternatively, a conductor material is deposited on the entire surface using a vapor deposition method, electrolytically plated, and then etched into a pattern. Alternatively, A? The conductor 5 can be obtained by turn etching.

またアルミニウム板1、ペスタ処理による皮膜2、金属
張りプリント基板3の構成により絶縁皮膜層も二重にな
っているため、大電力用に要求される基板の耐圧性も十
分であシ、電気絶縁性に寝れたものとなっている。がっ
ベスタ処理による皮膜が極めて薄く形成できるため、抵
抗器やトランジスタ等の発熱する回路素子を組み込んだ
場合でもすぐさまアルミニウム板に熱を伝え外気に放散
することができる。
In addition, due to the structure of the aluminum plate 1, the film 2 formed by PESTA treatment, and the metal-clad printed circuit board 3, the insulation film layer is doubled, so the board has sufficient pressure resistance required for high power applications, and is electrically insulated. It has become a sexual thing. Because the film produced by the Gavesta treatment can be formed extremely thin, even when heat-generating circuit elements such as resistors and transistors are incorporated, heat can be immediately transferred to the aluminum plate and dissipated to the outside air.

このように本発明の放熱基板はアルミニウム板の一生面
にペスタ処理を行ない絶縁基板を得た後絶縁皮膜上に金
属張りプリント基板を付着形成したものであり、この構
造は極めて簡単であシ、シかも均一な厚みで容易に、形
成することができる。
As described above, the heat dissipation board of the present invention is obtained by applying PESTA treatment to the entire surface of an aluminum plate to obtain an insulating board, and then forming a metal-clad printed circuit board on the insulating film, and this structure is extremely simple. It can be easily formed with a uniform thickness.

また電気絶縁性に優れ、放熱効果の大なるもので、大電
力を消費して発熱の大きい回路素子を組み込まなければ
ならない大電力回路用の放熱基板として使用することが
できる。
Furthermore, it has excellent electrical insulation properties and has a large heat dissipation effect, so it can be used as a heat dissipation board for high power circuits in which circuit elements that consume large amounts of power and generate large amounts of heat must be incorporated.

以下本発明の実施例を述べる。Examples of the present invention will be described below.

実施例1 第1図にて説明する。Example 1 This will be explained with reference to FIG.

アルミニウム板1は厚さ2.0 、、 、長さ2oα、
□幅10crnの大きさのものを用いた。アルミニウム
板1をアセトンで脱脂した後10チ水酸化ナト1ノウム
溶液中に3分間浸漬した。これを純水で水洗し、濃硝酸
中に1分間浸漬した後、純水中で十分水洗し、乾燥させ
アルミニウム素材を得る。次いでダウコーニング社のベ
スタ処理剤を用いディップ法にて塗布し、150℃30
分間で硬化させ、ベスタ処理による皮膜(厚さ約5μm
)2を形成したO その後、アルミニウム板1のペスタ処理による皮膜2上
に、エポキシ系接着剤4を薄くコーティングしく厚さ約
10〜20μ)、片面銅張シ紙フェノール基板(基材厚
1.0II11銅箔35μ)3をラミネートし、エポキ
シ系接着剤を160℃15分間で硬化させることによっ
て本発明の放熱基板を得ることができた。
The aluminum plate 1 has a thickness of 2.0, a length of 2oα,
□ A piece with a width of 10 crn was used. After degreasing the aluminum plate 1 with acetone, it was immersed in a solution of 10% sodium hydroxide and 1% sodium hydroxide for 3 minutes. This is washed with pure water, immersed in concentrated nitric acid for 1 minute, thoroughly washed with pure water, and dried to obtain an aluminum material. Next, it was coated using Dow Corning's Vesta treatment agent by a dip method and heated at 150°C at 30°C.
Cured in minutes, then coated with Vesta treatment (thickness approx. 5 μm)
) 2 was formed on the film 2 of the aluminum plate 1. Then, the epoxy adhesive 4 was thinly coated on the coating 2 formed by the PESTA process on the aluminum plate 1 (to a thickness of approximately 10 to 20 μm), and the single-sided copper-clad paper phenolic substrate (base material thickness 1.5 μm) was applied. A heat dissipation board of the present invention could be obtained by laminating 0II11 copper foil (35 μm) 3 and curing the epoxy adhesive at 160° C. for 15 minutes.

実施例2 第2図により説明する。Example 2 This will be explained with reference to FIG.

実施例1と同方法にてアルミニウム素材を得る。An aluminum material was obtained in the same manner as in Example 1.

次に、ダウコーニング社のペスタ処理剤 を用い、アル
ミニウム板1に、ディップ法にて塗布する(塗布厚約5
μm)。次いで硬化させる前に、片面銅張り紙フェノー
ル基板(基材厚0.5 mu、銅箔35μ)3を、塗布
されたペスタ処理剤上にラミネートする。その後、15
0℃で30分間硬化させることによって本発明の放熱基
板を得ることができた。しかしこの場合は、ディップ法
にてベスタ処理剤を塗布したため、アルミニウム板10
両面ともに未硬化の皮膜が形成される。そのため片面銅
張シ紙フェノール基板をラミネートする反対側の面には
離型フィルムをあてて行なった。
Next, using Dow Corning's PESTA treatment agent, apply it to the aluminum plate 1 by dipping (approximately 5 cm thick).
μm). A single-sided copper-clad paper phenolic substrate (substrate thickness 0.5 mu, copper foil 35 mu) 3 is then laminated onto the applied PESTA treatment before curing. After that, 15
By curing at 0° C. for 30 minutes, a heat dissipating substrate of the present invention could be obtained. However, in this case, since the Vesta treatment agent was applied using the dip method, the aluminum plate 10
Uncured films are formed on both sides. Therefore, a release film was applied to the opposite side to which the one-sided copper-clad paper phenol substrate was laminated.

このように実施例1、実施例2で得た放熱基板に、回路
形成を行ない抵抗器、トランジスタ およびコンデンサ
等の周辺部品を取シ付け、大電力用の回路板を組み立て
、放熱特性を調べた。その結果を第3図に示す。
A circuit was formed on the heat dissipation boards obtained in Example 1 and Example 2, and peripheral components such as resistors, transistors, and capacitors were attached to the heat dissipation boards, and a high power circuit board was assembled and the heat dissipation characteristics were investigated. . The results are shown in FIG.

Aは紙フエノール板、Bはガラスエポキシ板、Cはセラ
ミック板、Dは従来のアルミニウム板、Eは本発明の実
施例1の放熱基板。Fは本発明実施例2の放熱基板であ
る。
A is a paper phenol board, B is a glass epoxy board, C is a ceramic board, D is a conventional aluminum board, and E is a heat dissipation board of Example 1 of the present invention. F is a heat dissipation substrate of Example 2 of the present invention.

以上のように本発明の放熱基板は抵抗器やトランジスタ
から発生する熱を効果的に放熱し、電気絶縁性の良好な
、かつ構造が簡単で、量産性にも優れ実用的価値のある
ものである。
As described above, the heat dissipation board of the present invention effectively dissipates the heat generated from resistors and transistors, has good electrical insulation, has a simple structure, is suitable for mass production, and has practical value. be.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例1の構成を示す断面図、第2図は
本発明実施例2の構成を示す断面図、第3図は各種基板
の放熱特性を示す図である。 1・・・アルミニウム板、2・・・ベスタ処理による絶
縁皮膜、3・・・金属張りプリント基板(片面鋼張9紙
フェノール基板)、4・・・接着剤、5・・・導電体。 第1図
FIG. 1 is a cross-sectional view showing the structure of Example 1 of the present invention, FIG. 2 is a cross-sectional view showing the structure of Example 2 of the present invention, and FIG. 3 is a diagram showing the heat dissipation characteristics of various substrates. DESCRIPTION OF SYMBOLS 1... Aluminum plate, 2... Insulating film by Vesta treatment, 3... Metal-clad printed circuit board (single-sided steel-clad 9 paper phenol board), 4... Adhesive, 5... Electric conductor. Figure 1

Claims (1)

【特許請求の範囲】[Claims] シリコン樹脂と溶剤からなるワニスに酸化けい素を安定
に分散させた処理剤をアルミニウム板の少なくとも一生
面に塗布硬化させて絶縁皮膜を形成し、該皮膜上に金属
張ジグリント基板を付着形成したことを特徴とする放熱
基板。
A treatment agent in which silicon oxide is stably dispersed in a varnish made of silicone resin and a solvent is applied to at least the entire surface of an aluminum plate and cured to form an insulating film, and a metal-clad ziglint substrate is adhered and formed on the film. A heat dissipation board featuring:
JP17614881A 1981-11-02 1981-11-02 Heat sink board Pending JPS5877296A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17614881A JPS5877296A (en) 1981-11-02 1981-11-02 Heat sink board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17614881A JPS5877296A (en) 1981-11-02 1981-11-02 Heat sink board

Publications (1)

Publication Number Publication Date
JPS5877296A true JPS5877296A (en) 1983-05-10

Family

ID=16008494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17614881A Pending JPS5877296A (en) 1981-11-02 1981-11-02 Heat sink board

Country Status (1)

Country Link
JP (1) JPS5877296A (en)

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