JPS5877295A - Heat sink board - Google Patents

Heat sink board

Info

Publication number
JPS5877295A
JPS5877295A JP17614781A JP17614781A JPS5877295A JP S5877295 A JPS5877295 A JP S5877295A JP 17614781 A JP17614781 A JP 17614781A JP 17614781 A JP17614781 A JP 17614781A JP S5877295 A JPS5877295 A JP S5877295A
Authority
JP
Japan
Prior art keywords
film
heat dissipation
board
heat
aluminum plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17614781A
Other languages
Japanese (ja)
Inventor
準市 岡元
田 和之
石田 富雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP17614781A priority Critical patent/JPS5877295A/en
Publication of JPS5877295A publication Critical patent/JPS5877295A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、大電力を消費して発熱の大きい回路素子を組
み込まなければならない大電力回路用の放熱基板に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a heat dissipation board for a high power circuit in which circuit elements that consume a large amount of power and generate a large amount of heat must be incorporated.

従来の大電力回路は、セラミック板あるいはガラス板な
どの絶縁基板上に、導電体をスクリーン印刷法あるいは
蒸着法で形成し、抵抗器、コンデンサ等の受動回路素子
やトランジスタ等の能動回路素子を適宜付着して形成さ
れていた。
Conventional high-power circuits are made by forming conductors on an insulating substrate such as a ceramic plate or glass plate by screen printing or vapor deposition, and then adding passive circuit elements such as resistors and capacitors and active circuit elements such as transistors as appropriate. It was formed by adhesion.

しかし上記構成においては、基板がセラミックガラス等
の絶縁物であるため熱放散が悪く、大電力用として設計
された抵抗器やトランジスタを組み込んだ場合、抵抗器
、トランジスタの発熱が非常に多いため、その熱によっ
てコンデンサなどの周辺部品のみならず抵抗器やトラン
ジスタそのものも破壊してしまう危険性がある。また破
壊に到らないまでも電気的特性を大きく変化させてしま
うととが多い。その対策と、信頼性を上げるため、導電
体と回路素゛子の間に大きなアルミニウム放熱板を別に
加工し取シ付け、回路素子の温度上昇を防いでいるケー
スがしばしばみられた。
However, in the above configuration, since the substrate is an insulating material such as ceramic glass, heat dissipation is poor, and when resistors and transistors designed for high power are incorporated, the resistors and transistors generate a large amount of heat. There is a risk that the heat may destroy not only peripheral components such as capacitors, but also resistors and transistors themselves. Moreover, even if it does not result in destruction, it often causes a significant change in the electrical characteristics. To counter this and improve reliability, it was often the case that a large aluminum heat sink was separately fabricated and installed between the conductor and the circuit element to prevent the temperature of the circuit element from rising.

あるいは、熱放散を効果的にするためアルミニウムの金
属板を用いアルミニウム板の全面に陽極酸化処理を行な
い酸化アルミニウム皮膜を形成させ絶縁基板として用い
られたものもある。しかしこの場合酸化アルミニウム皮
膜が熱に対して非常に弱く120℃で皮膜割れを起こし
、110℃の温度差においても皮膜割れが生ずる。その
ため電気絶縁性が大きな問題と々る。この電気絶縁性対
策として酸化アルミニウム皮膜上に樹脂をコーテインク
したものもあるが樹脂層によって熱放散が悪化する。ま
たアルミニウム板の一生面に直接樹脂層を設けた絶縁基
板も用いられているが樹脂層のビンホー′ルの問題と電
気絶縁性から、おのずとその樹脂層は厚くなシ熱放散が
非常に悪くなる。
Alternatively, in order to effectively dissipate heat, an aluminum metal plate is used, and the entire surface of the aluminum plate is anodized to form an aluminum oxide film, which is used as an insulating substrate. However, in this case, the aluminum oxide film is very sensitive to heat and cracks at 120°C, and cracks also occur at a temperature difference of 110°C. Therefore, electrical insulation becomes a big problem. As a measure against electrical insulation, some have coated a resin on the aluminum oxide film, but the resin layer deteriorates heat dissipation. Insulating substrates are also used in which a resin layer is provided directly on the entire surface of an aluminum plate, but due to the problem of the resin layer's bin holes and its electrical insulation properties, the resin layer is naturally thick and has very poor heat dissipation. .

また従来における絶縁皮膜上の導電体は、導電体材料を
スクリーン印刷法にて塗布し硬化するか、あるいは、蒸
着法にてマスク蒸着するか、無電解メッキ法にて形成す
るか、または銅箔を接着剤を介してはシ付けたのちにパ
ターン状にエツチングするかであり、工数が増え煩雑の
面がある。
In addition, conventional conductors on insulating films are formed by coating and curing a conductor material using a screen printing method, by mask deposition using a vapor deposition method, by electroless plating, or by forming a conductor material using a copper foil. The method is to attach it with adhesive and then etch it into a pattern, which increases the number of man-hours and is complicated.

このように従来の放熱基板は大電力を消費して発熱の大
きい回路素子を組み込まなければならない大電力回路用
の放熱基板としては不適であり欠点が多い。
As described above, the conventional heat dissipation board is unsuitable as a heat dissipation board for a high power circuit in which a circuit element that consumes a large amount of power and generates a large amount of heat must be incorporated, and has many drawbacks.

本発明は上述した欠点に対して抵抗器やトランジスタか
ら発生する熱を効果的に放熱し、電気絶縁性の良好な、
かつ構造が簡単で量産性のある放熱基板を提供するもの
で、以下図面と共に本発明の詳細な説明する。
The present invention solves the above-mentioned drawbacks by effectively dissipating the heat generated from resistors and transistors, and providing excellent electrical insulation.
The present invention is intended to provide a heat dissipation board that has a simple structure and can be mass-produced.The present invention will be described in detail below with reference to the drawings.

本発明の放熱基板の構成は、第1図、第2図に示すよう
にシリコン樹脂と溶剤からなるワニスに酸化けい素を安
定に分散させた処理剤をアルミニウム板1の少なくとも
一生面に塗布硬化せしめ(いわゆるダウコーニング社方
式のベスタ処理剤におけるペスタ処理)絶縁皮膜2を形
成し、該皮膜2上に/?ターン形成した可とぅ性プリン
ト配線JL壌3を付着形成してなるものである。
The structure of the heat dissipation board of the present invention is as shown in FIGS. 1 and 2. A treatment agent in which silicon oxide is stably dispersed in a varnish made of silicone resin and a solvent is applied and hardened on at least one surface of an aluminum plate 1. An insulating film 2 is formed (so-called Pesta treatment using the Vesta treatment agent of the Dow Corning Company method), and on the film 2 /? It is formed by adhering and forming a flexible printed wiring JL layer 3 formed into turns.

このように構成した本発明の放熱基板は、アルミニウム
の表面にシリコン樹脂と溶剤からなるワニスに酸化けい
素を安定に分散させたペスタ処理剤 を塗布形成させて
いるため耐熱性が非常に良好で、従来用いられている酸
化アルミニウム皮膜のみのものが、約120℃の加熱に
よって皮膜割れを生じるのに対し、350Cで1o分間
加熱しても皮膜割れの発生がない。耐熱衝撃性も極めて
大きく酸化アルミニウム皮膜のみの場合では約110℃
の温度差で皮膜割れを生じるが、300℃で10分間加
熱した後、ただちに20℃の水に浸漬しても皮膜割れの
発生がない。また塗布方法は、ディップ法、スプレー法
、静電塗装法などいずれの方法も用いることが可能でピ
ンi=−ルもtlとんど認められず、極めて大きな耐食
性を示すOまた沸騰水中に約500時間浸漬しても黒変
イヒ等の発生がなく優れた耐熱水性を示す。
The heat dissipation board of the present invention constructed in this way has very good heat resistance because it is coated with a PESTA treatment agent in which silicon oxide is stably dispersed in a varnish made of silicone resin and a solvent. Whereas the conventionally used aluminum oxide film only cracks when heated to about 120°C, no cracking occurs even after heating at 350°C for 10 minutes. Thermal shock resistance is also extremely high, approximately 110°C in the case of aluminum oxide film only.
The film cracks due to a temperature difference of 20°C, but even if the film is heated at 300°C for 10 minutes and then immediately immersed in water at 20°C, no film cracking occurs. In addition, any coating method such as dip method, spray method, or electrostatic coating method can be used. Even after 500 hours of immersion, no blackening occurs and it shows excellent hot water resistance.

ペスタ架理による皮膜はディップ法で頭布した場合、1
回の処理で4〜6μmの皮膜厚を得ることができる。こ
のように皮膜厚を薄く得られることから抵抗器やトラン
ジスタを組み・込んだ場合、抵抗器、トランジスタから
の発熱はすみや力1にアルミニウム板に伝わ、り外気に
放散すること力;できるOまた、上記絶縁皮膜2上に直
かに・ぐターン形成した可とう性プリント配線基板を付
着形成しているため、容易に導電体5を得ること力;で
き、ノやターン形成のだめのプリント基板のエツチング
工程が省略でき、エツチング液によってアルミニウム板
が腐蝕されない利点がある(この場合の腐蝕部分は絶縁
皮膜を形成していないアルミニウム面をいう )。
When the Pesta-based film is coated using the dip method, 1
A film thickness of 4 to 6 μm can be obtained in one treatment. Since the film thickness can be reduced in this way, when resistors and transistors are incorporated, the heat generated from the resistors and transistors is transmitted to the aluminum plate and dissipated into the outside air. Since the flexible printed wiring board with the turns formed thereon is directly adhered onto the insulating film 2, the conductor 5 can be easily obtained; It has the advantage that the etching process can be omitted and the aluminum plate is not corroded by the etching solution (the corroded part in this case refers to the aluminum surface on which no insulating film is formed).

コを通常のエツチング液にて前もって処理しロール状に
保存しておくことができる利点もある。またパターン形
成した可とう性プリント配線基板はロール状に曲げて付
着形成できるため量産性にも優れたものである。
Another advantage is that it can be pre-treated with a conventional etching solution and stored in roll form. In addition, the patterned flexible printed wiring board can be bent into a roll shape and adhered to the board, so it is excellent in mass production.

またアルミニウム板1、ペスタ処理による皮膜2、可と
う性プリント配線板3の構成によシ絶縁皮膜層も二重に
なっているため、大電力用に要求される基板の耐圧性も
十分であり電気絶縁性に優れたものとなっている。更に
、ペスタ処理による皮膜が極めて薄く形成できるため、
抵抗器やトランジスタ等の発熱する回路素子を組み込ん
だ場合でもすぐさまアルミニウム板に熱を伝え外気に放
散することができる。
In addition, because the structure of the aluminum plate 1, the film 2 formed by PESTA treatment, and the flexible printed wiring board 3 has double insulation film layers, the board has sufficient voltage resistance required for high power applications. It has excellent electrical insulation. Furthermore, since the film formed by PESTA treatment can be formed extremely thinly,
Even when heat generating circuit elements such as resistors and transistors are incorporated, the heat can be immediately transferred to the aluminum plate and dissipated to the outside air.

このように本発明の放熱基板はアルミニウム板の一生面
にペスタ処理を行ない絶縁皮膜を得た後、絶縁皮膜上に
/IPターン形成した可とう性プリント配線基板を付着
形成したものであシ、この構造は極めて簡単であシ、し
かも均一な厚みで容易に、形成することができる。また
電気絶縁性に優れ、放熱効果の大なるもので、大電力を
消費して発熱の大きい回路素子を組み込まなければ々ら
ない大電力回路用の放熱基板として使用することができ
る。
As described above, the heat dissipation board of the present invention is obtained by performing PESTA treatment on the entire surface of an aluminum plate to obtain an insulating film, and then adhering a flexible printed wiring board with /IP turns formed on the insulating film. This structure is extremely simple and can be easily formed with a uniform thickness. Furthermore, it has excellent electrical insulation properties and has a large heat dissipation effect, so it can be used as a heat dissipation board for high power circuits that require incorporating circuit elements that consume large amounts of power and generate large amounts of heat.

以下本発明の実施例を述べる。Examples of the present invention will be described below.

実施例1 第1図にて説明するアルミニウム板1は厚さ2、0 m
 、長さ20 cm幅10―の大きさのものを用いた。
Example 1 The aluminum plate 1 explained in FIG. 1 has a thickness of 2.0 m.
, 20 cm long and 10 cm wide was used.

アルミニウム板1をアセトンで脱脂した後10チ水酸化
ナトリウム溶液中に3分間浸漬した。
After degreasing the aluminum plate 1 with acetone, it was immersed in a 10% sodium hydroxide solution for 3 minutes.

これを純水で水洗し、濃硝酸中に1分間浸漬した後、純
水中で十分水洗し、乾燥させアルミニウム素材を得る。
This is washed with pure water, immersed in concentrated nitric acid for 1 minute, thoroughly washed with pure water, and dried to obtain an aluminum material.

次いでダウコーニング社のペスタ処理剤を用いディツノ
法にて塗布し、150℃30分間で硬化させ、ペスタ処
理による皮膜(厚さ約5μm) 2を形成した。
Next, a Pesta treatment agent from Dow Corning was applied by the Ditsuno method and cured at 150° C. for 30 minutes to form a Pesta treatment film (about 5 μm thick) 2.

また、あらかじめ可とぅ性プリント配線基板(25μ厚
ポリイミドフイルム、片面銅張シ、大きさ20c+ys
X10crn)3は準備しておく。ます銅箔面上にエツ
チングレジストインキをパターン状にスクリーン印刷法
にて印刷し、90tl:10分間で硬化させた。エツチ
ングレジストインキはアルカリ可溶エツチングレノスト
インキ(メッシュ工業株式会社市販(D NAZ−DA
R226BLACK )を使用したO 次に公知のエツチング液(株式会社吉谷商会市販の塩化
第2鉄塩酸溶液)に1o分間浸漬してエツチングレジス
トインキの印刷されていない銅箔部をエツチング除去し
た。
In addition, a flexible printed wiring board (25μ thick polyimide film, copper-clad on one side, size 20c+ys) was prepared in advance.
Prepare X10crn)3. Etching resist ink was printed in a pattern on the surface of the copper foil using a screen printing method, and was cured at 90 tl for 10 minutes. The etching resist ink is an alkali-soluble etching resist ink (commercially available from Mesh Kogyo Co., Ltd. (DNAZ-DA).
Next, the copper foil portions on which the etching resist ink was not printed were etched away by immersion in a known etching solution (ferric chloride hydrochloric acid solution commercially available from Yoshitani Shokai Co., Ltd.) for 10 minutes.

さらに水酸化ナトリウム3チ水溶液に浸漬して、エツチ
ングレジストインキを溶解除去し、水洗し乾燥した。こ
のようにして可とぅ性プリント配線基板3を得た。
Furthermore, the etching resist ink was dissolved and removed by immersion in a 3-triple sodium hydroxide aqueous solution, followed by washing with water and drying. In this way, a flexible printed wiring board 3 was obtained.

その後、アルミニウム板1のベスタ処理による皮膜2上
に、エポキシ系接着剤4を薄くコーティングしく厚さ約
10〜20μ)、可とぅ性ノリント配線基板をラミネー
トし、エポキシ系接着剤を160℃15分間で硬化させ
て本発明の放熱基板を得ることができた。
After that, a thin layer of epoxy adhesive 4 (approximately 10 to 20 μm in thickness) was applied to the film 2 formed by Vesta treatment on the aluminum plate 1, and a flexible Norint wiring board was laminated thereon, and the epoxy adhesive was applied to the film 2 at 160° C. The heat dissipating substrate of the present invention could be obtained by curing within minutes.

実施例2 第2図によシ説明する。Example 2 This will be explained with reference to FIG.

実施例1と同方法にてアルミニウム素材を得る◎次ニ、
ダウコーニング社のペスタ処理剤を用い、アルミニウム
板1に、ディツノ法にて塗布する(塗布厚的5μm)。
Obtain an aluminum material by the same method as in Example 1 ◎Next,
Using Dow Corning's PESTA treatment agent, it is applied to the aluminum plate 1 by the Ditsuno method (coating thickness: 5 μm).

次いで硬化させる前に、実施例1と同方法にて得た可と
う性ノリント配線板3を、塗布されたペスタ処理剤上に
ラミネートする・その後、150℃で30分間硬化さし
て本発明の放熱基板を得ることができた。しかしこの場
合は、ディJ7″法にてペスタ処理剤を塗布したため、
アルミニウム板10両面ともに未硬化の皮膜が形成され
る。そのため可とう性プリント配線板をラミネートする
反対側の面には離型フィルムをあてて行なった。
Next, before curing, the flexible Norint wiring board 3 obtained by the same method as in Example 1 is laminated onto the applied PESTA treatment agent.Then, it is cured at 150°C for 30 minutes to obtain the heat dissipation board of the present invention. I was able to get However, in this case, because the Pesta treatment agent was applied using the Di J7'' method,
An uncured film is formed on both surfaces of the aluminum plate 10. Therefore, a release film was applied to the opposite side to which the flexible printed wiring board was to be laminated.

このように実施例1.実施例2で得た放熱基板に抵抗器
、トランジスタ、およびコンデンサ等の周辺部品を取シ
付け、大電力用の回路板を組み立゛て、放熱特性を調べ
た。その結果を第3図に示すOAは紙フエノール板、B
はガラスエポキシ板、Cはセラミック板、Dは従来のア
ルミニウム板、Eは本発明の放熱基板である。
In this way, Example 1. Peripheral parts such as resistors, transistors, and capacitors were attached to the heat dissipation board obtained in Example 2, a high power circuit board was assembled, and its heat dissipation characteristics were investigated. The results are shown in Figure 3. OA is a paper phenol board, B
is a glass epoxy plate, C is a ceramic plate, D is a conventional aluminum plate, and E is a heat dissipation board of the present invention.

以上のように本発明の放熱基板は抵抗器やトランジスタ
から発生する熱を効果的に放熱し、電気絶縁性の良好な
、かつ構造が簡単で、量産性にも優れ実用的価値のある
ものである。
As described above, the heat dissipation board of the present invention effectively dissipates the heat generated from resistors and transistors, has good electrical insulation, has a simple structure, is suitable for mass production, and has practical value. be.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例1の構成を示す断面図、第2図は
本発明実施例2の構成を示す断面図、第3図は、各種基
板の放熱特性を示す図である。 1・・・アルミニウム板、2・・・ベスタ処理による絶
縁皮膜、3・・・可とう性プリント配線基板、4・・・
接着剤、5・・・導電体。 第1図 第2図 第3図
FIG. 1 is a cross-sectional view showing the structure of Example 1 of the present invention, FIG. 2 is a cross-sectional view showing the structure of Example 2 of the present invention, and FIG. 3 is a diagram showing the heat dissipation characteristics of various substrates. DESCRIPTION OF SYMBOLS 1... Aluminum plate, 2... Insulating film by Vesta treatment, 3... Flexible printed wiring board, 4...
Adhesive, 5... conductor. Figure 1 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] シリコン樹脂と溶剤からなるワニスに酸化けい素を安定
に分散させた処理剤をアルミニウム板の少なくとも一主
面に塗布硬化させて絶縁皮膜を形成し、該皮膜上に・セ
ターン形成した可とう性プ1)ント配線基板を付着形成
したことを特徴とする放熱基板。
A treatment agent in which silicon oxide is stably dispersed in a varnish consisting of a silicone resin and a solvent is applied to at least one main surface of an aluminum plate and cured to form an insulating film, and a setane is formed on the film. 1) A heat dissipation board characterized by having a component wiring board adhered thereto.
JP17614781A 1981-11-02 1981-11-02 Heat sink board Pending JPS5877295A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17614781A JPS5877295A (en) 1981-11-02 1981-11-02 Heat sink board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17614781A JPS5877295A (en) 1981-11-02 1981-11-02 Heat sink board

Publications (1)

Publication Number Publication Date
JPS5877295A true JPS5877295A (en) 1983-05-10

Family

ID=16008477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17614781A Pending JPS5877295A (en) 1981-11-02 1981-11-02 Heat sink board

Country Status (1)

Country Link
JP (1) JPS5877295A (en)

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