JPS5879793A - Hybrid integrated circuit board - Google Patents

Hybrid integrated circuit board

Info

Publication number
JPS5879793A
JPS5879793A JP17781081A JP17781081A JPS5879793A JP S5879793 A JPS5879793 A JP S5879793A JP 17781081 A JP17781081 A JP 17781081A JP 17781081 A JP17781081 A JP 17781081A JP S5879793 A JPS5879793 A JP S5879793A
Authority
JP
Japan
Prior art keywords
hybrid integrated
integrated circuit
circuit board
film
aluminum plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17781081A
Other languages
Japanese (ja)
Inventor
準市 岡元
和之 嶋田
石田 富雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP17781081A priority Critical patent/JPS5879793A/en
Publication of JPS5879793A publication Critical patent/JPS5879793A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は混成集積回路、特に放熱効果を必要とする混成
集積回路板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to hybrid integrated circuits, and particularly to hybrid integrated circuit boards that require heat dissipation effects.

従来の混成集積回路はセラミック板あるいはガラス板な
どの絶縁基板上に、抵抗器、コンデンサー等の受動回路
素子やトランジスター等の能動回路素子を適宜付着して
形成されていた。
Conventional hybrid integrated circuits are formed by appropriately attaching passive circuit elements such as resistors and capacitors and active circuit elements such as transistors to an insulating substrate such as a ceramic plate or a glass plate.

しかし上記構成においては、基板がセラミック。However, in the above configuration, the substrate is ceramic.

ガラス等の絶縁物であるため熱放散が悪く、特に大電力
用として設計された抵抗器やトランジスターを組み込ん
だ場合、これらの抵抗、トランジスターの発熱が著るし
いため、その熱によってコンデンサーなどの周辺部品の
みならず前記の抵抗器やトランクスター自体も破壊され
てしまう危険性があり、また破壊に至らないまでもそれ
らの電気的特性を大きく変化させてしまうことが多い。
Because it is an insulating material such as glass, it has poor heat dissipation, and when resistors and transistors designed for high power are installed, the heat generated by these resistors and transistors is significant, causing damage to surrounding areas such as capacitors. There is a risk that not only the components but also the resistors and trunk stars themselves will be destroyed, and even if they are not destroyed, their electrical characteristics will often change significantly.

また、熱放散を効果的にするため、アルミニウムの金属
板を用い、アルミニウム板の全面に陽極酸化処理を施し
、酸化アルミニウム皮膜を形成させ、絶縁基板として用
いられたものもある。しかしこの場合、酸化アルミニウ
ム皮膜が熱に対して非常に弱く120℃程度で皮膜割れ
を起こし、110℃の温度差においても皮膜割れが生ず
るために、その電気絶縁性の如何が大きな問題となる。
In addition, in order to effectively dissipate heat, an aluminum metal plate is used, and the entire surface of the aluminum plate is anodized to form an aluminum oxide film, which is used as an insulating substrate. However, in this case, the aluminum oxide film is very sensitive to heat and cracks at about 120°C, and cracks occur even at a temperature difference of 110°C, so the electrical insulation properties are a major problem.

この電気絶縁性を向上させる対策として、酸化アルミニ
ウム皮膜上に樹脂をコーティングしたものもあるが、樹
脂層により−て熱放散が悪化するという欠点がある。ま
たアルミニウム板の一生面に直接的に樹脂層を設けた絶
縁基板も用いられているが樹脂層のピンホールの問題と
電気絶縁性の問題とから、その樹脂層は厚くなり熱放散
が非常に悪くなる結果となっている。このように、大電
力を消費して発熱の大きい回路素子を組み込ま々ければ
ならない混成集積回路の回路板としては不適当でアク欠
点が多いものである。
As a measure to improve this electrical insulation, some have coated the aluminum oxide film with a resin, but this has the disadvantage that the resin layer deteriorates heat dissipation. Insulating substrates are also used in which a resin layer is directly provided on the surface of an aluminum plate, but due to problems with pinholes in the resin layer and electrical insulation, the resin layer becomes thick and has very poor heat dissipation. The result is getting worse. As described above, it is unsuitable for use as a circuit board for a hybrid integrated circuit in which circuit elements that consume large amounts of power and generate a large amount of heat must be frequently incorporated, and have many disadvantages.

本発明は上述した欠点に対して抵抗器やトランジスター
から発生する熱を効果的に放熱し、電気絶縁性の良好な
、力tつ構造が簡単で量産性のある混成集積回路板を提
供するものである。
The present invention solves the above-mentioned drawbacks by providing a hybrid integrated circuit board that effectively radiates heat generated from resistors and transistors, has good electrical insulation, has a simple structure, and can be mass-produced. It is.

本発明の混成集積回路板の構成は、シリコン樹脂と溶剤
からなるフェノに酸化けい素を安定に分散させた処理剤
をアルミニウム板1の少なくとも一生面に塗布硬化せし
め(いわゆるダウコーニング社方式のベスタ処理剤にお
けるベスタ処理)絶縁皮膜2を形成し、該皮膜上2に導
電体物質を選択的に付着形成して導電体3,4および抵
抗器5゜6などの回路素子を複数個形成してなるもので
あるO このように構成した本発明の混成集積回路板はアルミニ
ウムの表面にシリコン樹脂と溶剤からなるフェノに酸化
けい素を安定に分散させたペスタ処理剤を塗布形成させ
ているため耐熱性が非′常に良好で、従来用いられてい
る酸化アルミニウム皮膜のみのものが、約120℃の加
熱によって皮膜割れを生じるのに対し、350℃で10
分間加熱しても皮膜割れの発生がない。耐熱衝撃性も極
めて大きく、従来の酸化アルミニウム皮膜のみの場合で
は約110℃の温度差で皮膜割れを生じるが、300℃
で1.0分間加熱した後、ただちに20℃の水に浸漬し
ても皮膜割れの発生がない。また、その塗布方法は、デ
ィップ法、スプレー法、静電塗装法などいずれの方法も
用いることが可能でピンホールもほとんど認められず、
極めて大きな耐食性を示す。また沸騰水中に約500時
間浸漬しても黒変化等の発生がなく優れた耐熱水性を示
す。
The structure of the hybrid integrated circuit board of the present invention is such that a treatment agent in which silicon oxide is stably dispersed in a phenol made of silicone resin and a solvent is applied and hardened on at least the entire surface of the aluminum plate 1 (so-called Dow Corning's best method). Vesta treatment using a processing agent) An insulating film 2 is formed, and a conductive material is selectively deposited on the film 2 to form a plurality of circuit elements such as conductors 3 and 4 and resistors 5 and 6. The hybrid integrated circuit board of the present invention constructed in this way is heat resistant because it is coated with a PESTA treatment agent in which silicon oxide is stably dispersed in a phenol made of silicone resin and a solvent. It has very good properties, and while the conventionally used aluminum oxide film only cracks when heated to about 120°C, it only cracks when heated to 350°C.
No film cracking occurs even after heating for several minutes. Thermal shock resistance is also extremely high; with conventional aluminum oxide film alone, film cracking occurs at a temperature difference of approximately 110°C, but at 300°C.
Even if the film is heated for 1.0 minutes and then immediately immersed in water at 20°C, no film cracking occurs. In addition, it can be applied using any method such as dip method, spray method, or electrostatic coating method, and almost no pinholes are observed.
Shows extremely high corrosion resistance. Furthermore, even when immersed in boiling water for about 500 hours, no blackening occurs, and it exhibits excellent hot water resistance.

ベスタ処理による皮膜はディップ法で塗布した場合、1
回の処理で4〜6μmの皮膜厚を得ることができ、また
、重ね塗りも可能である。このようにピンホールの発生
もなく、皮膜厚を薄く得られることから抵抗器やトラン
ジスター自体がらの発熱は、皮膜を介してすみやかにア
ルミニウム板に伝わり、外気に放散することができる。
When applied by the dip method, the film produced by Vesta treatment is 1
A film thickness of 4 to 6 μm can be obtained in one treatment, and multiple coatings are also possible. In this way, there are no pinholes and the film is thin, so the heat generated by the resistor or transistor itself is quickly transmitted to the aluminum plate through the film and dissipated into the outside air.

このように本発明の混成集積回路板はアルミニウム板の
一生面にベスタ処理を行ない絶縁皮膜を得た後、絶縁皮
膜上に回路素子を付着形成したものであシ、この構造は
極めて簡単であり、しかも均一々厚みで容易に、かつ薄
く形成することができる。また皮膜にピンホールの発生
がなく、血ね塗装も可能なため電気絶縁性も非常に良好
となり、重ね塗りした皮膜厚みも約10μmと薄いため
抵抗器、トランジスターからの発熱は、迅速にアルミニ
ウム板に伝わり、アルミニウム板から外気に放散するこ
とができ、大電力用として設計された混成集積回路の回
路板として有利に使用することができる。
In this way, the hybrid integrated circuit board of the present invention is made by performing Besta treatment on the entire surface of an aluminum plate to obtain an insulating film, and then forming circuit elements on the insulating film, and this structure is extremely simple. Moreover, it can be easily and thinly formed with a uniform thickness. In addition, there are no pinholes in the film, and it can be painted with blood, so it has very good electrical insulation properties.The thickness of the layered film is only about 10 μm, so heat from resistors and transistors can be quickly dissipated from the aluminum plate. It can be transmitted to the outside air from the aluminum plate and can be advantageously used as a circuit board of a hybrid integrated circuit designed for high power.

以下本発明の実施例について説明する。Examples of the present invention will be described below.

(実施例) アルミニウム板1は厚さ2.0mm1長さ6.0cm、
幅4.0ノの大きさのものを用いた。アルミニウム板1
をアセトンで脱脂した後10%水酸化ナトリウム溶液中
に3分間浸漬した。これを純水で水洗し、濃硝酸中に1
分間浸漬した後純水中で十分水洗し、乾燥させた。次い
でダウコーニング社のベスタ処、理剤を用い、ディップ
法にて塗布し、150℃、30分間で硬化させ、ペスタ
処理による皮膜(犀さ約5μm)2を形成した。その後
導電体3゜4f:所定の・母ターンに蒸着法で形成(導
電体重1料はニッケル系を使用)シ、導電体のトランジ
スター固着部に銅ヒートシンク7を固着させ、トランジ
スターを取り付け、またコンデンサーや抵抗器5.6等
の周辺部品を取シ付けて混成集積回路板を得ることがで
きた。
(Example) The aluminum plate 1 has a thickness of 2.0 mm and a length of 6.0 cm.
A piece with a width of 4.0 mm was used. Aluminum plate 1
After degreasing with acetone, it was immersed in a 10% sodium hydroxide solution for 3 minutes. Wash this with pure water, and then add it to concentrated nitric acid.
After being immersed for a minute, it was thoroughly washed with pure water and dried. Next, it was applied by a dipping method using Dow Corning's Vesta treatment agent, and cured at 150° C. for 30 minutes to form a Pesta treatment film (diameter: approximately 5 μm). After that, the conductor 3゜4f: is formed on the predetermined mother turn by a vapor deposition method (the conductor weight 1 material is nickel-based), the copper heat sink 7 is fixed to the transistor fixing part of the conductor, the transistor is attached, and the capacitor is A hybrid integrated circuit board could be obtained by attaching peripheral parts such as a resistor and resistors 5 and 6.

なお、導電体形成方法としてペスタ処理剤を塗布し硬化
させる前に、銅箔等をラミネートしてから硬化させ、次
いで銅箔を所定のパターンにエツチングし、そしてニッ
ケルメッキ処理等、を施しても本発明の混成集積回路板
は得られるものである。
In addition, as a conductor formation method, before applying and curing the PESTA treatment agent, it is also possible to laminate copper foil, etc., cure it, then etch the copper foil into a predetermined pattern, and then perform nickel plating, etc. A hybrid integrated circuit board of the present invention is obtained.

第3図に、本発明による混成集積回路板の放熱特性を示
した。
FIG. 3 shows the heat dissipation characteristics of the hybrid integrated circuit board according to the present invention.

Aは紙フエノール板、Bはガラスエポキシ板、Cはセラ
ミック板、Dは従来のアルミニウム板、Eは本発明の混
成集積回路板である。
A is a paper phenol board, B is a glass epoxy board, C is a ceramic board, D is a conventional aluminum board, and E is a hybrid integrated circuit board of the present invention.

は、抵抗器やトランジスターから発生する熱を効果的に
放熱し、電気絶縁性の良好な、かつ構造が簡単で、量産
性にも優れ、実用的価値のあるものである。
It effectively dissipates the heat generated from resistors and transistors, has good electrical insulation, has a simple structure, is suitable for mass production, and has practical value.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は本発明実施例に用いた混成集積回路板
全示した図であり第1図は平面図、第2図は断面図であ
る。第3図は各種基板の放熱特性を示した図である。 1・・・アルミニウム板、2・・・ペスタ処理による絶
縁皮膜、3,4・・・導電体、5,6・・・抵抗器、7
・・ヒートシンク。 第1図 第2図
1 and 2 are diagrams showing the entire hybrid integrated circuit board used in an embodiment of the present invention, with FIG. 1 being a plan view and FIG. 2 being a sectional view. FIG. 3 is a diagram showing the heat dissipation characteristics of various substrates. DESCRIPTION OF SYMBOLS 1... Aluminum plate, 2... Insulating film by PESTA treatment, 3, 4... Conductor, 5, 6... Resistor, 7
··heat sink. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] シリコン樹脂と溶剤からなるワニスに酸化けい素を安定
に分散させた処理剤をアルミニウム板の少なくとも一生
面に塗布し、硬化せしめて絶縁皮膜を形成し、該皮膜上
に導電体物質を選択的に付着形成したのち複数個の回路
素子を実装させることを特徴とする混成集積回路板。
A treatment agent in which silicon oxide is stably dispersed in a varnish made of silicone resin and a solvent is applied to at least the entire surface of the aluminum plate and cured to form an insulating film, and a conductive material is selectively applied on the film. A hybrid integrated circuit board characterized in that a plurality of circuit elements are mounted after being adhered.
JP17781081A 1981-11-07 1981-11-07 Hybrid integrated circuit board Pending JPS5879793A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17781081A JPS5879793A (en) 1981-11-07 1981-11-07 Hybrid integrated circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17781081A JPS5879793A (en) 1981-11-07 1981-11-07 Hybrid integrated circuit board

Publications (1)

Publication Number Publication Date
JPS5879793A true JPS5879793A (en) 1983-05-13

Family

ID=16037479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17781081A Pending JPS5879793A (en) 1981-11-07 1981-11-07 Hybrid integrated circuit board

Country Status (1)

Country Link
JP (1) JPS5879793A (en)

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