JPS587636A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS587636A
JPS587636A JP56106470A JP10647081A JPS587636A JP S587636 A JPS587636 A JP S587636A JP 56106470 A JP56106470 A JP 56106470A JP 10647081 A JP10647081 A JP 10647081A JP S587636 A JPS587636 A JP S587636A
Authority
JP
Japan
Prior art keywords
exposure
photosensitive material
plate
section
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56106470A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0246936B2 (enrdf_load_stackoverflow
Inventor
Nobuo Matsumoto
伸雄 松本
Hiromi Yazawa
矢沢 宏巳
Masaru Imai
勝 今井
Shunji Kubono
窪野 俊二
Shinichi Ichikawa
市川 信一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP56106470A priority Critical patent/JPS587636A/ja
Publication of JPS587636A publication Critical patent/JPS587636A/ja
Publication of JPH0246936B2 publication Critical patent/JPH0246936B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56106470A 1981-07-08 1981-07-08 露光装置 Granted JPS587636A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56106470A JPS587636A (ja) 1981-07-08 1981-07-08 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56106470A JPS587636A (ja) 1981-07-08 1981-07-08 露光装置

Publications (2)

Publication Number Publication Date
JPS587636A true JPS587636A (ja) 1983-01-17
JPH0246936B2 JPH0246936B2 (enrdf_load_stackoverflow) 1990-10-17

Family

ID=14434414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56106470A Granted JPS587636A (ja) 1981-07-08 1981-07-08 露光装置

Country Status (1)

Country Link
JP (1) JPS587636A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616861U (ja) * 1984-06-18 1986-01-16 三菱製紙株式会社 明室型製版機

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616861U (ja) * 1984-06-18 1986-01-16 三菱製紙株式会社 明室型製版機

Also Published As

Publication number Publication date
JPH0246936B2 (enrdf_load_stackoverflow) 1990-10-17

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