JPS5871372A - スパッタリングによる成膜方法及びその装置 - Google Patents

スパッタリングによる成膜方法及びその装置

Info

Publication number
JPS5871372A
JPS5871372A JP16867181A JP16867181A JPS5871372A JP S5871372 A JPS5871372 A JP S5871372A JP 16867181 A JP16867181 A JP 16867181A JP 16867181 A JP16867181 A JP 16867181A JP S5871372 A JPS5871372 A JP S5871372A
Authority
JP
Japan
Prior art keywords
target
sputtering
magnetic
current
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16867181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH049864B2 (enrdf_load_stackoverflow
Inventor
Hide Kobayashi
秀 小林
Katsuo Abe
勝男 阿部
Tsuneaki Kamei
亀井　常彰
Kazuyuki Fujimoto
藤本　一之
Tamotsu Shimizu
保 清水
Hideki Tateishi
秀樹 立石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16867181A priority Critical patent/JPS5871372A/ja
Publication of JPS5871372A publication Critical patent/JPS5871372A/ja
Publication of JPH049864B2 publication Critical patent/JPH049864B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP16867181A 1981-10-23 1981-10-23 スパッタリングによる成膜方法及びその装置 Granted JPS5871372A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16867181A JPS5871372A (ja) 1981-10-23 1981-10-23 スパッタリングによる成膜方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16867181A JPS5871372A (ja) 1981-10-23 1981-10-23 スパッタリングによる成膜方法及びその装置

Publications (2)

Publication Number Publication Date
JPS5871372A true JPS5871372A (ja) 1983-04-28
JPH049864B2 JPH049864B2 (enrdf_load_stackoverflow) 1992-02-21

Family

ID=15872329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16867181A Granted JPS5871372A (ja) 1981-10-23 1981-10-23 スパッタリングによる成膜方法及びその装置

Country Status (1)

Country Link
JP (1) JPS5871372A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039160A (ja) * 1983-07-19 1985-02-28 バリアン・アソシエイツ・インコーポレイテツド 磁性及び非磁性双方のターゲツト物質のためのマグネトロンスパツタコーテイング源
JPS63140078A (ja) * 1986-11-29 1988-06-11 Tokyo Electron Ltd スパツタリングによる成膜方法
JPH0617242A (ja) * 1992-03-11 1994-01-25 Fuji Xerox Co Ltd 薄膜形成方法及び薄膜形成装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039160A (ja) * 1983-07-19 1985-02-28 バリアン・アソシエイツ・インコーポレイテツド 磁性及び非磁性双方のターゲツト物質のためのマグネトロンスパツタコーテイング源
JPS63140078A (ja) * 1986-11-29 1988-06-11 Tokyo Electron Ltd スパツタリングによる成膜方法
JPH0617242A (ja) * 1992-03-11 1994-01-25 Fuji Xerox Co Ltd 薄膜形成方法及び薄膜形成装置

Also Published As

Publication number Publication date
JPH049864B2 (enrdf_load_stackoverflow) 1992-02-21

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