JPH034620B2 - - Google Patents

Info

Publication number
JPH034620B2
JPH034620B2 JP56099659A JP9965981A JPH034620B2 JP H034620 B2 JPH034620 B2 JP H034620B2 JP 56099659 A JP56099659 A JP 56099659A JP 9965981 A JP9965981 A JP 9965981A JP H034620 B2 JPH034620 B2 JP H034620B2
Authority
JP
Japan
Prior art keywords
magnetic pole
target
pole body
plasma generation
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56099659A
Other languages
English (en)
Japanese (ja)
Other versions
JPS583975A (ja
Inventor
Hide Kobayashi
Katsuo Abe
Tsuneaki Kamei
Hideki Tateishi
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9965981A priority Critical patent/JPS583975A/ja
Priority to US06/343,858 priority patent/US4401539A/en
Publication of JPS583975A publication Critical patent/JPS583975A/ja
Publication of JPH034620B2 publication Critical patent/JPH034620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3458—Electromagnets in particular for cathodic sputtering apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
JP9965981A 1981-01-30 1981-06-29 スパツタリングによる成膜方法及びその装置 Granted JPS583975A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9965981A JPS583975A (ja) 1981-06-29 1981-06-29 スパツタリングによる成膜方法及びその装置
US06/343,858 US4401539A (en) 1981-01-30 1982-01-29 Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9965981A JPS583975A (ja) 1981-06-29 1981-06-29 スパツタリングによる成膜方法及びその装置

Publications (2)

Publication Number Publication Date
JPS583975A JPS583975A (ja) 1983-01-10
JPH034620B2 true JPH034620B2 (enrdf_load_stackoverflow) 1991-01-23

Family

ID=14253168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9965981A Granted JPS583975A (ja) 1981-01-30 1981-06-29 スパツタリングによる成膜方法及びその装置

Country Status (1)

Country Link
JP (1) JPS583975A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8402012A (nl) * 1983-07-19 1985-02-18 Varian Associates Magnetron spetter deklaag opbrengbron voor zowel magnetische als niet-magnetische trefplaatmaterialen.
JPS61201773A (ja) * 1985-03-04 1986-09-06 Showa Denko Kk スパツタリング方法及びその装置
JPH0726202B2 (ja) * 1985-12-17 1995-03-22 ローム株式会社 マグネトロンスパッタにおける膜厚調整方法
JPS63140078A (ja) * 1986-11-29 1988-06-11 Tokyo Electron Ltd スパツタリングによる成膜方法
JP7262886B2 (ja) 2017-07-21 2023-04-24 朝日インテック株式会社 超小型高感度磁気センサ
KR102420329B1 (ko) * 2018-02-13 2022-07-14 한국알박(주) 마그네트론 스퍼터링 장치의 자석 집합체
CN111394707B (zh) * 2020-03-31 2023-05-09 北京大学深圳研究生院 一种等离子体源及其用于镀膜的装置、系统和方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849956B2 (ja) * 1979-07-10 1983-11-08 日本電信電話株式会社 Ｍｉｓ電界効果トランジスタを用いたマトリクス記憶回路

Also Published As

Publication number Publication date
JPS583975A (ja) 1983-01-10

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