JPS5865364U - Sputter electrode with concentric double seal structure - Google Patents
Sputter electrode with concentric double seal structureInfo
- Publication number
- JPS5865364U JPS5865364U JP15962981U JP15962981U JPS5865364U JP S5865364 U JPS5865364 U JP S5865364U JP 15962981 U JP15962981 U JP 15962981U JP 15962981 U JP15962981 U JP 15962981U JP S5865364 U JPS5865364 U JP S5865364U
- Authority
- JP
- Japan
- Prior art keywords
- target
- seal structure
- double seal
- concentric double
- sputter electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来のプレーナ型スパッタ電極の断面図、第２
図は第１図に示すプレーナ型スパッタ電極に本考案を適
用した一例を示す断面図である。 １・・・・・・
ケーシング、２・・・・・・カソードボディ、３・・・
・・・磁石、４・・・・・・バッキングプレート、５・
・・・・・ターゲット、６・・・・・・スパッタ防止リ
ング、７・・・・・・アノード、８・・・・・・冷却水
シール、９・・・・・・真空シール、１０・・・・・・
絶縁碍子、１１．１２・・・・・・冷却水パイプ。Figure 1 is a cross-sectional view of a conventional planar sputter electrode;
This figure is a cross-sectional view showing an example of applying the present invention to the planar sputter electrode shown in FIG. 1. 1...
Casing, 2...Cathode body, 3...
... Magnet, 4... Backing plate, 5.
... Target, 6 ... Spatter prevention ring, 7 ... Anode, 8 ... Cooling water seal, 9 ... Vacuum seal, 10.・・・・・・
Insulator, 11.12... Cooling water pipe.
Claims (1)
スパッタされる面の背面に近接して位置し、ターゲツト
面上の空間にトンネル状の磁界を形成する手段と、該タ
ーゲットに近接して位置するアノードを備え、かつ該タ
ーゲットを冷却する手段からなるスパッタ電極において
、冷却水をシールする水シールガスケットと真空シール
用ガスケットとをそれぞれ同心円状に配置したことを特
徴とする同心状２重シール構造のスパッタ電極。A target made of a material to be sputtered, a means for forming a tunnel-like magnetic field in a space above the target surface, the means being located close to the back side of the surface of the target to be sputtered, and an anode located close to the target. A sputtering electrode having a concentric double seal structure, characterized in that a water sealing gasket for sealing cooling water and a vacuum sealing gasket are respectively arranged concentrically in a sputtering electrode comprising means for cooling the target. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15962981U JPS5865364U (en) | 1981-10-28 | 1981-10-28 | Sputter electrode with concentric double seal structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15962981U JPS5865364U (en) | 1981-10-28 | 1981-10-28 | Sputter electrode with concentric double seal structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5865364U true JPS5865364U (en) | 1983-05-02 |
Family
ID=29952078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15962981U Pending JPS5865364U (en) | 1981-10-28 | 1981-10-28 | Sputter electrode with concentric double seal structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5865364U (en) |
-
1981
- 1981-10-28 JP JP15962981U patent/JPS5865364U/en active Pending
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