JPS5853326B2 - 過剰拡開機能を備える焼付装置用縁取りマスク装置 - Google Patents

過剰拡開機能を備える焼付装置用縁取りマスク装置

Info

Publication number
JPS5853326B2
JPS5853326B2 JP54032086A JP3208679A JPS5853326B2 JP S5853326 B2 JPS5853326 B2 JP S5853326B2 JP 54032086 A JP54032086 A JP 54032086A JP 3208679 A JP3208679 A JP 3208679A JP S5853326 B2 JPS5853326 B2 JP S5853326B2
Authority
JP
Japan
Prior art keywords
mask
photosensitive material
overexpansion
function
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54032086A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55124137A (en
Inventor
健次郎 田部
良和 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP54032086A priority Critical patent/JPS5853326B2/ja
Priority to GB8007624A priority patent/GB2047915B/en
Priority to US06/128,035 priority patent/US4325630A/en
Priority to DE19803008956 priority patent/DE3008956A1/de
Priority to FR8006119A priority patent/FR2452128A1/fr
Publication of JPS55124137A publication Critical patent/JPS55124137A/ja
Publication of JPS5853326B2 publication Critical patent/JPS5853326B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G03B27/582—Baseboards, easels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holders For Sensitive Materials And Originals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP54032086A 1979-03-19 1979-03-19 過剰拡開機能を備える焼付装置用縁取りマスク装置 Expired JPS5853326B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP54032086A JPS5853326B2 (ja) 1979-03-19 1979-03-19 過剰拡開機能を備える焼付装置用縁取りマスク装置
GB8007624A GB2047915B (en) 1979-03-19 1980-03-06 Automatic masking device including an aperture extension means
US06/128,035 US4325630A (en) 1979-03-19 1980-03-07 Automatic masking device including an aperture extension means
DE19803008956 DE3008956A1 (de) 1979-03-19 1980-03-08 Automatische abdeckvorrichtung zum herstellen von druckplatten
FR8006119A FR2452128A1 (fr) 1979-03-19 1980-03-19 Dispositif de masquage automatique comprenant un moyen d'agrandissement de l'ouverture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54032086A JPS5853326B2 (ja) 1979-03-19 1979-03-19 過剰拡開機能を備える焼付装置用縁取りマスク装置

Publications (2)

Publication Number Publication Date
JPS55124137A JPS55124137A (en) 1980-09-25
JPS5853326B2 true JPS5853326B2 (ja) 1983-11-29

Family

ID=12349061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54032086A Expired JPS5853326B2 (ja) 1979-03-19 1979-03-19 過剰拡開機能を備える焼付装置用縁取りマスク装置

Country Status (5)

Country Link
US (1) US4325630A (enExample)
JP (1) JPS5853326B2 (enExample)
DE (1) DE3008956A1 (enExample)
FR (1) FR2452128A1 (enExample)
GB (1) GB2047915B (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2092762B (en) * 1980-12-22 1985-06-12 Durst Uk Ltd Improvements in and relating to photographic exposure masks
JPS59182429A (ja) * 1983-04-01 1984-10-17 Fuji Photo Film Co Ltd 分割写真撮影装置
DE3430535C2 (de) * 1984-08-18 1986-08-21 Krause Biagosch GmbH, 4800 Bielefeld Vorrichtung zur Bildung einer Maske
DE3774315D1 (de) * 1986-03-31 1991-12-12 Mita Industrial Co Ltd Kopiermaschine mit einem zwischeneinsatz.
US4823472A (en) * 1986-05-12 1989-04-25 Gauer Glenn G Framer
US4827620A (en) * 1986-05-12 1989-05-09 Gauer Glenn G Framer
US4704796A (en) * 1986-05-12 1987-11-10 Gauer Glenn G Framer
JPH0648507Y2 (ja) * 1986-08-30 1994-12-12 ノーリツ鋼機株式会社 写真焼付におけるペーパーマスク装置
US4846569A (en) * 1986-12-19 1989-07-11 Minolta Camera Kabushiki Kaisha Image projecting system
JPS63279240A (ja) * 1987-05-11 1988-11-16 Fuji Photo Film Co Ltd 写真焼付用マスク装置
JP2597651B2 (ja) * 1988-05-19 1997-04-09 株式会社 平河工業社 製版用カメラ
US4775918A (en) * 1987-09-24 1988-10-04 Eastman Kodak Company Mask system for radiograph light box
DE367234T1 (de) * 1988-11-01 1990-09-06 Hirakawa Kogyosha Co., Ltd., Tokio/Tokyo Repro-kamera.
DE3916105A1 (de) * 1989-05-18 1990-11-22 Broemmelstroet Henk Te Dipl In Vorrichtung zur herstellung von druckformen der reproduktionstechnik
US8721123B2 (en) * 2008-01-18 2014-05-13 Syncrolite, Llc Pattern generator for a light fixture
US20060268558A1 (en) * 2005-05-24 2006-11-30 Synchrolite, L.P. Method and apparatus for controlling diffusion and color of a light beam
US8596824B2 (en) 2005-05-24 2013-12-03 Syncrolite, L.P. Method and apparatus for a scrollable modifier for a light fixture
US20090196044A1 (en) * 2008-01-23 2009-08-06 Omnicolor, L.P. Method and apparatus for bidirectional control of the color and diffusion of a light beam

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB897005A (en) * 1957-07-26 1962-05-23 Siemens Reiniger Werke Ag Improvements in or relating to x-ray apparatus
US3947116A (en) * 1970-07-10 1976-03-30 Lamson Paragon Limited Photocomposing machines
US3737227A (en) * 1971-09-20 1973-06-05 Eastman Kodak Co Print border control apparatus

Also Published As

Publication number Publication date
FR2452128B1 (enExample) 1984-12-14
GB2047915A (en) 1980-12-03
US4325630A (en) 1982-04-20
GB2047915B (en) 1983-04-20
JPS55124137A (en) 1980-09-25
FR2452128A1 (fr) 1980-10-17
DE3008956A1 (de) 1980-09-25

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