JPS5845193A - エピタキシヤル成長方法 - Google Patents
エピタキシヤル成長方法Info
- Publication number
- JPS5845193A JPS5845193A JP14532581A JP14532581A JPS5845193A JP S5845193 A JPS5845193 A JP S5845193A JP 14532581 A JP14532581 A JP 14532581A JP 14532581 A JP14532581 A JP 14532581A JP S5845193 A JPS5845193 A JP S5845193A
- Authority
- JP
- Japan
- Prior art keywords
- solution
- soln
- growth
- inp substrate
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/10—Controlling or regulating
- C30B19/103—Current controlled or induced growth
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14532581A JPS5845193A (ja) | 1981-09-14 | 1981-09-14 | エピタキシヤル成長方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14532581A JPS5845193A (ja) | 1981-09-14 | 1981-09-14 | エピタキシヤル成長方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5845193A true JPS5845193A (ja) | 1983-03-16 |
JPH0139999B2 JPH0139999B2 (enrdf_load_stackoverflow) | 1989-08-24 |
Family
ID=15382546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14532581A Granted JPS5845193A (ja) | 1981-09-14 | 1981-09-14 | エピタキシヤル成長方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5845193A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6065799A (ja) * | 1983-09-19 | 1985-04-15 | Fujitsu Ltd | 結晶成長方法 |
-
1981
- 1981-09-14 JP JP14532581A patent/JPS5845193A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6065799A (ja) * | 1983-09-19 | 1985-04-15 | Fujitsu Ltd | 結晶成長方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0139999B2 (enrdf_load_stackoverflow) | 1989-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4620897A (en) | Method for growing multicomponent compound semiconductor crystals | |
Effer | Epitaxial growth of doped and pure GaAs in an open flow system | |
US4022652A (en) | Method of growing multiple monocrystalline layers | |
US3580732A (en) | Method of growing single crystals | |
JPS5845193A (ja) | エピタキシヤル成長方法 | |
US4565156A (en) | Apparatus for performing solution growth relying on temperature difference technique | |
US4692194A (en) | Method of performing solution growth of a GaAs compound semiconductor crystal layer under control of conductivity type thereof | |
JPH0610672Y2 (ja) | エピタキシヤル成長炉 | |
JPH0219967B2 (enrdf_load_stackoverflow) | ||
JP2885452B2 (ja) | ▲iii▼―▲v▼族化合物結晶のボート成長方法 | |
JPS6033797B2 (ja) | 単結晶の成長方法 | |
KR950000645B1 (ko) | 수평형 브리지만법에 의한 고품위 n-형 GaAs 단결정 성장방법 | |
SU588851A1 (ru) | Способ получени полупроводниковых структур | |
JPS63144189A (ja) | 液相エピタキシヤル成長装置 | |
SU1059031A1 (ru) | Устройство дл электрожидкостной эпитаксии | |
JPH0357076B2 (enrdf_load_stackoverflow) | ||
Yamagishi et al. | Study of Anodization Process on GaAs by In Situ Differential Reflectance | |
JPS6357398B2 (enrdf_load_stackoverflow) | ||
Amano et al. | LPE Growth and Characterization of High Purity In sub 0. 53 Ga sub 0. 47 As | |
JPS63136515A (ja) | 液相エピタキシヤル成長方法 | |
JPH02111690A (ja) | 化合物半導体結晶成長方法及びそれを実施する装置 | |
JPS6126594A (ja) | 結晶成長装置 | |
JPH03191515A (ja) | 結晶成長方法 | |
JPH0219966B2 (enrdf_load_stackoverflow) | ||
JPS59152296A (ja) | 分子線エピタキシヤル成長における分子線強度制御方法 |