JPH0357076B2 - - Google Patents

Info

Publication number
JPH0357076B2
JPH0357076B2 JP58171174A JP17117483A JPH0357076B2 JP H0357076 B2 JPH0357076 B2 JP H0357076B2 JP 58171174 A JP58171174 A JP 58171174A JP 17117483 A JP17117483 A JP 17117483A JP H0357076 B2 JPH0357076 B2 JP H0357076B2
Authority
JP
Japan
Prior art keywords
compound semiconductor
melt
solution
crystal
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58171174A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6065799A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58171174A priority Critical patent/JPS6065799A/ja
Priority to KR8405728A priority patent/KR890002000B1/ko
Priority to US06/652,239 priority patent/US4620897A/en
Priority to EP84306410A priority patent/EP0140565B1/en
Priority to DE8484306410T priority patent/DE3479523D1/de
Publication of JPS6065799A publication Critical patent/JPS6065799A/ja
Priority to US06/864,982 priority patent/US5021224A/en
Publication of JPH0357076B2 publication Critical patent/JPH0357076B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP58171174A 1983-09-19 1983-09-19 結晶成長方法 Granted JPS6065799A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP58171174A JPS6065799A (ja) 1983-09-19 1983-09-19 結晶成長方法
KR8405728A KR890002000B1 (en) 1983-09-19 1984-09-19 Method for growing multicomponent compound semiconductor crystals
US06/652,239 US4620897A (en) 1983-09-19 1984-09-19 Method for growing multicomponent compound semiconductor crystals
EP84306410A EP0140565B1 (en) 1983-09-19 1984-09-19 Method for growing multicomponent compound semiconductor crystals
DE8484306410T DE3479523D1 (en) 1983-09-19 1984-09-19 Method for growing multicomponent compound semiconductor crystals
US06/864,982 US5021224A (en) 1983-09-19 1986-05-20 Apparatus for growing multicomponents compound semiconductor crystals

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58171174A JPS6065799A (ja) 1983-09-19 1983-09-19 結晶成長方法

Publications (2)

Publication Number Publication Date
JPS6065799A JPS6065799A (ja) 1985-04-15
JPH0357076B2 true JPH0357076B2 (enrdf_load_stackoverflow) 1991-08-30

Family

ID=15918370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58171174A Granted JPS6065799A (ja) 1983-09-19 1983-09-19 結晶成長方法

Country Status (1)

Country Link
JP (1) JPS6065799A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4941088B2 (ja) * 2007-05-14 2012-05-30 住友金属工業株式会社 単結晶の製造方法および製造装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5845193A (ja) * 1981-09-14 1983-03-16 Fujitsu Ltd エピタキシヤル成長方法

Also Published As

Publication number Publication date
JPS6065799A (ja) 1985-04-15

Similar Documents

Publication Publication Date Title
Mlavsky et al. Crystal growth of GaAs from Ga by a traveling solvent method
US5021224A (en) Apparatus for growing multicomponents compound semiconductor crystals
US3632431A (en) Method of crystallizing a binary semiconductor compound
US4032370A (en) Method of forming an epitaxial layer on a crystalline substrate
US3086857A (en) Method of controlling liquid-solid interfaces by peltier heat
JPH0357076B2 (enrdf_load_stackoverflow)
US3530011A (en) Process for epitaxially growing germanium on gallium arsenide
US3520735A (en) Method of manufacturing semiconductor devices
US3360406A (en) Temperature gradient zone melting and growing of semiconductor material
GB1581457A (en) Method of epitaxially depositing a semiconductor material
JPS5853826A (ja) 液相エピタキシヤル成長方法
US3103455A (en) N-type
US3948692A (en) Method of preparing multi-layer semiconductor hetero-structures on the basis of compounds AIII BV where AIII is a metal of group three and BV is a non-metal of group five
JPH0219967B2 (enrdf_load_stackoverflow)
EP1400614A2 (en) Process and apparatus for liquid phase epitaxy
Dorogan et al. Method of GaAs growth on single crystal Si substrate
JP3717220B2 (ja) 液相エピタキシャル成長法
JPS5860534A (ja) 半導体結晶の製造方法
JPS5827238B2 (ja) 単結晶の製造方法
JPH0572360B2 (enrdf_load_stackoverflow)
JPH02111690A (ja) 化合物半導体結晶成長方法及びそれを実施する装置
JPH025716B2 (enrdf_load_stackoverflow)
JPS6218705A (ja) 結晶成長方法
JPS60134418A (ja) 液相エピタキシヤル層の評価方法
JPH0264087A (ja) 半導体結晶成長装置