JPS5843585A - Superconductive wiring - Google Patents
Superconductive wiringInfo
- Publication number
- JPS5843585A JPS5843585A JP56140979A JP14097981A JPS5843585A JP S5843585 A JPS5843585 A JP S5843585A JP 56140979 A JP56140979 A JP 56140979A JP 14097981 A JP14097981 A JP 14097981A JP S5843585 A JPS5843585 A JP S5843585A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- superconductive
- ground plane
- magnetic shield
- providing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 4
- 230000005668 Josephson effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/80—Constructional details
Landscapes
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、超電導配線に係わ８、特（配−のインダクタ
ンスの低減に関する。 −
ジョセフソン効果を利用する論理素子、メモリ素子の研
究が近年盛んである。微細バタン技術を応用して作製す
るこれ等の素子における配線は、超電導グランドプレン
上に設けられるのが通常である。この場合配線とグラン
ドグレンの距離が配線インダクタンスを定める重要パラ
メータとなる。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to superconducting wiring, and particularly to reducing the inductance of wiring. - Research on logic elements and memory elements that utilize the Josephson effect has been active in recent years. The wiring in these devices manufactured by applying technology is usually provided on a superconducting ground plane.In this case, the distance between the wiring and the ground plane is an important parameter that determines the wiring inductance.
多層配線の上部層では、距離が大きくなり配線インダク
タンスが大きぐなりすぎる欠点があった。In the upper layer of multilayer wiring, the distance becomes large and the wiring inductance becomes too large.
本発明は、上記インダクタンスの低減化を目的とする。The present invention aims to reduce the above-mentioned inductance.
第１図は従来配線の典型的断面図である。グランドプレ
ン１上に、超゛電導配線３．５がある。２゜４は絶縁膜
である。問題となるのは配線５である。FIG. 1 is a typical cross-sectional view of conventional wiring. On the ground plane 1 there is a superconducting wiring 3.5. 2.4 is an insulating film. The problem is the wiring 5.
この配線の単位長当りのインダクタンスは。The inductance per unit length of this wiring is.
Ｌ＝ζξｄ 、ｄ＝む＋ｔ４＋λＬ十λ２μ・ ；真空
透磁率、Ｗ、；配線５の線幅ｔ６．；絶縁膜厚、λ）、
λ： ；ｔ、ｓ層のロン′ ゛
トン長となる。Ｌがｄｇ比例することは、配線５を
流れる電流の作る磁界の拡がりの程度がＬに比例するこ
とを意味する。したがって磁界の拡がりを抑えることが
Ｌの低減化につながる。本発明においては、配線５とグ
ランドプレ４ン１の間に超電導体磁気シールドを設けＬ
の低減化を実現した。微細バタン加工技術を利用して作
製する、多層配線を用薄膜を利用できるため１本発明の
実現はプロセス的にも容品である。L=ζξd, d=M+t4+λL+λ2μ・ ; Vacuum permeability, W, ; Line width of wiring 5 t6. ; Insulating film thickness, λ),
λ: ;t, s layer Ron' ゛
Becomes ton length. The fact that L is proportional to dg means that the degree of spread of the magnetic field created by the current flowing through the wiring 5 is proportional to L. Therefore, suppressing the spread of the magnetic field leads to a reduction in L. In the present invention, a superconducting magnetic shield is provided between the wiring 5 and the ground plane 1.
achieved a reduction in Since a thin film can be used for multilayer wiring, which is produced using a fine batten processing technique, the present invention can be realized easily in terms of process.
第２図が実施例の断面図である。グランドプレンｌは４
Ｇ（１ｍのＮｂＭであり、そのロンドン畏はλ＠ｇ５ｎ
ｍである。２／、４／はｓｔｏ絶縁膜でそれぞれの膜厚
はｉ 、／ ＋＝ ｌＱＱＱｎｍ 、 ｔ 、’ ：＝
ｓｏｏｎｍである。５．３′は同材料ｐｂ−Ｉｎ−Ａｕ
で作製した。膜厚は、それぞれｌｓ： ８０Ｏｎｍｓ’
ｓ’＝２００ｎｍである。線幅はｓ Ｗ＠ ＝１０ｔ”
ｅＷ１’＝１００＃ｍである。ロンドン畏れ＝λ、−
１４０ ｎｍであった。ストリップライン３′は。FIG. 2 is a sectional view of the embodiment. Grand plane l is 4
G (1m NbM, its London size is λ@g5n
It is m. 2/ and 4/ are sto insulating films whose thicknesses are i, / += lQQQnm, t,' :=
It's soon. 5.3' is the same material pb-In-Au
It was made with The film thickness is ls: 80 Onms'
s'=200 nm. The line width is s W @ = 10t”
eW1'=100#m. Fear of London = λ, -
It was 140 nm. Strip line 3' is.
第１図の薄膜層３に相当する。実施例における単位長当
りのインダクタンスは、およそ。This corresponds to the thin film layer 3 in FIG. The inductance per unit length in the example is approximately.
である。この値はストリツツライ−ンがない場合の約４
５９６である。 、□、１□釆は大きい。また、
素子配線におけるインダクタンス値の調整などの場合に
関しても本発明は簡便なる手段を提供するものである。It is. This value is approximately 4 without the stripe line.
It is 596. , □, 1□ buttons are large. Also,
The present invention also provides a simple means for adjusting the inductance value in element wiring.
同、配線の一部に本発明の磁気シールド管段はインダク
タンスの値の微調を行うことも可能である。Similarly, it is also possible to finely adjust the inductance value of the magnetically shielded tube stage of the present invention in a part of the wiring.
【図面の簡単な説明】
第１図は従来配線の断面図であり、第２図は本発明実施
例を示すものである。
１・・・グランドプレン、２．２’、４．４’・・・絶
縁薄膜、３・・・中間配線、５・・・本発明の対象とな
る配線、ｙｆＪ＋ 図
？
￥３ ２ 回 ・BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a sectional view of conventional wiring, and FIG. 2 shows an embodiment of the present invention. 1... Ground plane, 2.2', 4.4'... Insulating thin film, 3... Intermediate wiring, 5... Wiring targeted by the present invention, yfJ+ Figure? ￥3 2 times ・
Claims (1)
超電導配線において、この超電導配線と上記超電導グラ
ンドグレン・層間に磁気シールド層を有することを特徴
とする超電導配線。A superconducting interconnect provided on a superconducting ground plane via an insulating film, the superconducting interconnect having a magnetic shield layer between the superconducting interconnect and the superconducting ground plane layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56140979A JPS5843585A (en) | 1981-09-09 | 1981-09-09 | Superconductive wiring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56140979A JPS5843585A (en) | 1981-09-09 | 1981-09-09 | Superconductive wiring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5843585A true JPS5843585A (en) | 1983-03-14 |
Family
ID=15281297
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56140979A Pending JPS5843585A (en) | 1981-09-09 | 1981-09-09 | Superconductive wiring |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5843585A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61244078A (en) * | 1985-04-22 | 1986-10-30 | Agency Of Ind Science & Technol | Manufacture of superconducting lines |
-
1981
- 1981-09-09 JP JP56140979A patent/JPS5843585A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61244078A (en) * | 1985-04-22 | 1986-10-30 | Agency Of Ind Science & Technol | Manufacture of superconducting lines |
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