JPS5839105A - 周波数一温度特性補償型弾性表面波共振器 - Google Patents
周波数一温度特性補償型弾性表面波共振器Info
- Publication number
- JPS5839105A JPS5839105A JP13739681A JP13739681A JPS5839105A JP S5839105 A JPS5839105 A JP S5839105A JP 13739681 A JP13739681 A JP 13739681A JP 13739681 A JP13739681 A JP 13739681A JP S5839105 A JPS5839105 A JP S5839105A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- frequency
- resonator
- temperature
- width
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000013078 crystal Substances 0.000 claims description 12
- 239000010453 quartz Substances 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 235000001674 Agaricus brunnescens Nutrition 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
- H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13739681A JPS5839105A (ja) | 1981-08-31 | 1981-08-31 | 周波数一温度特性補償型弾性表面波共振器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13739681A JPS5839105A (ja) | 1981-08-31 | 1981-08-31 | 周波数一温度特性補償型弾性表面波共振器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5839105A true JPS5839105A (ja) | 1983-03-07 |
JPH0124366B2 JPH0124366B2 (enrdf_load_stackoverflow) | 1989-05-11 |
Family
ID=15197682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13739681A Granted JPS5839105A (ja) | 1981-08-31 | 1981-08-31 | 周波数一温度特性補償型弾性表面波共振器 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5839105A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155640A (ja) * | 1985-12-27 | 1987-07-10 | Nec Corp | タイミング抽出回路 |
US5912602A (en) * | 1995-10-20 | 1999-06-15 | Seiko Epson Corporation | Surface acoustic wave device and method for designing same using resonators having different frequency-temperature characteristics |
US7042133B2 (en) | 2002-10-04 | 2006-05-09 | Seiko Epson Corporation | Surface acoustic wave device and method of adjusting a temperature characteristic of the same |
JP2006148372A (ja) * | 2004-11-17 | 2006-06-08 | Japan Radio Co Ltd | マルチバンド型弾性波フィルタ |
WO2006063984A1 (de) * | 2004-12-14 | 2006-06-22 | Tele Filter Gmbh | Oszillator mit zwei eintor-oberflächenwellenresonatoren |
-
1981
- 1981-08-31 JP JP13739681A patent/JPS5839105A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155640A (ja) * | 1985-12-27 | 1987-07-10 | Nec Corp | タイミング抽出回路 |
US5912602A (en) * | 1995-10-20 | 1999-06-15 | Seiko Epson Corporation | Surface acoustic wave device and method for designing same using resonators having different frequency-temperature characteristics |
US7042133B2 (en) | 2002-10-04 | 2006-05-09 | Seiko Epson Corporation | Surface acoustic wave device and method of adjusting a temperature characteristic of the same |
JP2006148372A (ja) * | 2004-11-17 | 2006-06-08 | Japan Radio Co Ltd | マルチバンド型弾性波フィルタ |
WO2006063984A1 (de) * | 2004-12-14 | 2006-06-22 | Tele Filter Gmbh | Oszillator mit zwei eintor-oberflächenwellenresonatoren |
US7511587B2 (en) | 2004-12-14 | 2009-03-31 | Tele Filter Gmbh | Oscillator comprising two one-port surface wave resonators |
Also Published As
Publication number | Publication date |
---|---|
JPH0124366B2 (enrdf_load_stackoverflow) | 1989-05-11 |
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