JPS5836997A - Producing device for single crystal - Google Patents

Producing device for single crystal

Info

Publication number
JPS5836997A
JPS5836997A JP13516181A JP13516181A JPS5836997A JP S5836997 A JPS5836997 A JP S5836997A JP 13516181 A JP13516181 A JP 13516181A JP 13516181 A JP13516181 A JP 13516181A JP S5836997 A JPS5836997 A JP S5836997A
Authority
JP
Japan
Prior art keywords
single crystal
melt
raw material
crucible
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13516181A
Other languages
Japanese (ja)
Inventor
Shinji Esashi
江刺 信二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13516181A priority Critical patent/JPS5836997A/en
Publication of JPS5836997A publication Critical patent/JPS5836997A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt

Abstract

PURPOSE:To grow a long single crystal by using double crucibles, supplying a raw material from an automatic raw material supplying device into the outer crucible and pulling the single crystal by using the inner crucible connected to the outer crucible through melt flow holes. CONSTITUTION:The weight of a melt 16 which is melted by induction heating by a high frequency coil provided on the outer side of a protecting tube 7 is weighed with a load cell 9, and said weighing is interlocked to a raw material supplying device 12, whereby the weight of the melt 16 in double crucibles 1 is maintained at a set weight automatically. While a holding bar 11 is rotated in an inner crucible 4, the bar is pulled upward and a single crystal is pulled up from the melt 16 by the seed crystal 10 attached to the tip of the rod 11. According to said device, there is no possibility for deposition of the unmolten raw material onto the crystal under pulling up, and since the level of the melt is maintained constant, the growth of the long single crystal is made possible.

Description

【発明の詳細な説明】 本発明は自動原料供給装置を備えた単結晶製造装置に関
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a single crystal manufacturing apparatus equipped with an automatic raw material supply device.

電子機器用部品には各種の単結晶が使用されている。例
えけ弾性表面波素子の基板としてニオブ酸リチウム(L
iNbOs)= タンタル酸リチウム(LiTaOs 
)などがまた磁気バプルメ七す素子の基板としてガドリ
ニウム・ガリクムガーネット(Gd、Gap Ot* 
)などが挙げられる。こ\でこれらの結晶は融点がLI
NbOsの場合1253℃。
Various single crystals are used in parts for electronic devices. For example, lithium niobate (L) is used as a substrate for surface acoustic wave devices.
iNbOs) = Lithium tantalate (LiTaOs)
) etc. are also used as substrates for magnetic bubble elements (Gd, Gap Ot*).
), etc. So these crystals have a melting point of LI
1253°C for NbOs.

L I T a O@の場合1650℃などと高いため
坩堝として白金(pt)、イリジウム(!r)或は白金
・ロジウム合金(Pt−Rhlどの高融点貴金属がそれ
ぞれ育成ぜんとする結晶の融点に合わせて用いられてシ
リ、化学量論比に混合された焼結体粉末をフラックスと
共に坩堝に入れて高周波加熱により溶融し一方種結晶を
用い引上げ装置により単結晶の育成が行われている。
In the case of L I T a O@, the temperature is as high as 1650℃, so high melting point precious metals such as platinum (PT), iridium (!R), or platinum-rhodium alloy (Pt-Rhl) are used as crucibles, each at a temperature close to the melting point of the crystal to be grown. A sintered body powder mixed in a stoichiometric ratio with silicate is placed in a crucible together with a flux and melted by high frequency heating, while a single crystal is grown by a pulling device using a seed crystal.

こ\で結晶基板としては電子回路のバッチ生産の点から
なるべく大きなものが必要でありそのため直径の大きな
坩堝を用いて結晶の育成が行われているが、育成する結
晶は直径がなるべく大きいと同時にその長さの長いもの
が製造コスト低下の点から望まれている。
In this case, the crystal substrate needs to be as large as possible from the viewpoint of batch production of electronic circuits, and therefore crystals are grown using crucibles with a large diameter. Longer lengths are desired from the viewpoint of lower manufacturing costs.

然し通常の坩堝を用いる場合はその容量に制限があり、
そのため直径が大きく且つ長い結晶を育成することは困
難である。
However, when using a normal crucible, its capacity is limited,
Therefore, it is difficult to grow long crystals with large diameters.

本発明は長大な単結晶を育成する製造装置を開発するこ
とを目的とし、その方法として原料を溶融する坩堝を二
重構造とし、その外側坩堝に自動供給装置により原料粉
末を供給し、結晶成長中にその溶畿量を一定に保っこと
Kよりて長大化を実現するものである。
The purpose of the present invention is to develop a manufacturing device for growing a long single crystal.As a method, the crucible for melting the raw material has a double structure, and the raw material powder is supplied to the outer crucible by an automatic feeding device to grow the crystal. It is possible to increase the length by keeping the amount of elongation constant.

こ\で原料の自動供給装置は金属の真9蒸着装置などに
ついては既に公知であるカ1本発明にか\る装置はロー
ドセルと連動させて結晶成長を行う点に特色があり、ま
た二重坩堝も公知であるが従来の目的は結晶の成長にお
いて使用する坩堝の直径が示さい和結晶成長の調整が容
易であることから融液の流通孔をもつ内側坩堝を備える
ことにより容量が従来と同じで見かけの容量の小さい坩
堝を実現しているものであって本発明はこれとは別に供
給する原料粉末が直置に単結晶育成中の結晶に耐着析出
するのを防ぐことを主目的としている。
The automatic feeder for raw materials is already known, such as a metal evaporation device.The device according to the present invention is characterized in that it performs crystal growth in conjunction with a load cell, and also has a double Crucibles are also known, but the conventional purpose is to specify the diameter of the crucible used for crystal growth, and because it is easy to adjust the crystal growth, the capacity can be increased compared to conventional crucibles by providing an inner crucible with holes for the flow of melt. The present invention also realizes a crucible with a small apparent capacity, and the main purpose of the present invention is to prevent the separately supplied raw material powder from depositing on the crystal during direct growth of a single crystal. It is said that

以後LiNbO5の単結晶育成を例にとり本発明を説明
する。
Hereinafter, the present invention will be explained using LiNbO5 single crystal growth as an example.

第1図は本発明にか〜る単結晶製造装置の構成図であり
、第2図はこれに用いる二重坩堝lの斜視図である。
FIG. 1 is a block diagram of a single crystal production apparatus according to the present invention, and FIG. 2 is a perspective view of a double crucible I used therein.

連絡孔3を備えた内側坩堝4とがらなりこの場合ptて
形成されてhる。
An inner crucible 4 with a communicating hole 3 is formed, in this case PT.

この二重坩堝IKdLINbOs’)原料粉末が所定の
重量入れである。
This double crucible IKdLINbOs') raw material powder is placed in a predetermined weight.

こ\てLiNb0.の原料粉末は炭酸リチウム(x、s
、 Cow )トX酸化ニオ”j (Nbt On )
を0.94:117)化学量論比で混合し、1ooo℃
附近で焼M後粉砕したものよりなりている。
This is LiNb0. The raw material powder is lithium carbonate (x, s
, Cow)
were mixed in a stoichiometric ratio of 0.94:117) and heated to 1ooo℃.
It is made from pulverized material after being sintered nearby.

を〜る二重坩堝lはアルミナ(Al1 On )−ジル
コニヤ(ZrO,)など耐火性保温剤5を充填した耐火
物磁器6の中に図のように設置されており、この外側K
d透明石英やバイコールガラスなどからなる保護管7が
ありその外側に高周波コイル8があり高周波電源により
誘導加熱が行われるようKなっている。
As shown in the figure, the double crucible 1 carrying the
d There is a protective tube 7 made of transparent quartz, Vycor glass, etc., and a high frequency coil 8 is placed on the outside of the protective tube 7, so that induction heating is performed by a high frequency power source.

こ−で中央f15に二重坩堝lをもつ耐火物磁器6の総
重量はり一ドセル9により結晶成長中も測定できるよう
罠なって訃り、本実施例の場合測定精度は最大重量20
kgで0.5gの検出精度をもりている。
In this way, the total weight of the refractory porcelain 6 with the double crucible 1 in the center f15 is set as a trap so that it can be measured even during crystal growth using the dowel cell 9.In this embodiment, the measurement accuracy is a maximum weight of 20
It has a detection accuracy of 0.5g per kg.

次に単結晶引上げ用の種結晶10#iナフアイヤ或はア
ル建すなどの保持棒11KPt−Rh醜を用いて固縛し
、溶融物中Ks吊後後結晶引上atKより保持棒11を
回転し乍ら結晶を引き上げることにより液相成長した単
結晶を得ることができる。
Next, the seed crystal for pulling a single crystal is secured using a holding rod 11KPt-Rh, such as a 10 #i naphiya or aluminum holder, and after hanging Ks in the melt, the holding rod 11 is rotated from the crystal pulling atK. However, by pulling the crystal, a liquid-phase grown single crystal can be obtained.

次に本発明に係る原料供給装置12は炉の外側に設けら
れているもので、外蓋13および内蓋14に設けられて
いる穴を通って供給管15の先端社外側坩堝2の上部ま
て達し外側坩堝2KI料が供給できるようになっている
Next, the raw material supply device 12 according to the present invention is installed outside the furnace, and the tip of the supply pipe 15 passes through the holes provided in the outer cover 13 and the inner cover 14 to the upper part of the outer crucible 2. The outer crucible is now ready to be supplied with 2KI material.

か−る構成よりなる本装置の要点は高周波加熱により溶
融している溶融体16の重量をロードセル9により秤量
しこれを原料供給装置12と連動させることにより二重
坩堝l内の溶融体16の重量を設定重量値に自動的に維
持する仁とである。
The main point of this device having such a configuration is that the weight of the molten material 16 in the double crucible 1 is weighed by the load cell 9 and is linked to the raw material supply device 12. The weight is automatically maintained at the set weight value.

そのためには原料供給装置12より供給される原料が供
給管1secっまらないこと〜外1Ift#堝2にスム
ーズに供給されることが必要であり、ξのためには供給
管15に振動子を用いて微少振動を与えておくこと\、
融液の温度が1250℃を越えているから炉内の供給管
15はptで構成しておくことが必要である。
For this purpose, it is necessary that the raw material supplied from the raw material supply device 12 is smoothly supplied to the outer 1 Ift# pot 2 for 1 second through the supply pipe, and for ξ, a vibrator is required in the supply pipe 15. Apply slight vibration using
Since the temperature of the melt exceeds 1250° C., it is necessary that the supply pipe 15 in the furnace be made of PT.

C〜で単結晶を液相法を用い種結晶から引上げる際、融
液16の温度保持、保持棒11の回転速度および引上げ
逮1などが単結晶成長の重要な因子であるが、これらの
調整が難しくt次処理温度が1200℃以上の高温であ
りそのため長大な結晶が要望謬れていたのに4拘はらず
従来原料の自動供給によ、る結晶成長は行われていなか
った。
When pulling a single crystal from a seed crystal using the liquid phase method in C~, the temperature maintenance of the melt 16, the rotation speed of the holding rod 11, the pulling speed 1, etc. are important factors for single crystal growth. Adjustment is difficult and the temperature of the t-stage treatment is as high as 1200° C. or higher, and therefore, long crystals have been desired, but conventional crystal growth has not been carried out by automatic supply of raw materials.

本発明は原料を融液16の中に供給する際に未溶融の状
m”e引上げ中の結晶、上に析出するのを防ぐために二
重坩堝を使用しこれにより上記の欠陥結晶の成長を防ぐ
と共に融液液位の変動を抑制した仁と一誼一ドセル9と
原料供給装置12とを連動させることにより液位を一定
に保つようにした点に4I徽があり、本発明の実施によ
り従来と較べて超かに長大な単結晶の育成が可能となっ
た。
The present invention uses a double crucible to prevent the raw materials from being deposited on the unmelted crystals being pulled when feeding them into the melt 16, thereby preventing the growth of the defective crystals described above. The advantage of 4I lies in that the liquid level is kept constant by interlocking the liquid cell 9 and the raw material supply device 12 to prevent fluctuations in the melt liquid level, and by implementing the present invention, It has become possible to grow single crystals that are much longer than before.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る単結晶製造装置の構成図また第2
図はこの装置に用いる二重坩堝の斜視図である。 図において 1#i二重坩堝、2は外側坩堝、3は連絡孔、4は内側
坩堝、9はロードセル、Io#i種結晶、11は保持棒
、】2は原料供給装置、15は供給管、16は融液。 第1図 薯2TA ス
FIG. 1 is a block diagram of a single crystal manufacturing apparatus according to the present invention, and FIG.
The figure is a perspective view of a double crucible used in this device. In the figure, 1#i double crucible, 2 outer crucible, 3 communicating hole, 4 inner crucible, 9 load cell, Io#i seed crystal, 11 holding rod, ]2 raw material supply device, 15 supply pipe , 16 is a melt. Figure 1: 2TAS

Claims (1)

【特許請求の範囲】[Claims] 高周波加熱により溶融している融液より種結晶を用いて
引上げ法により単結晶の育成を行なう単結晶育成装置に
おいて、原料を溶融する坩堝として二重坩堝を用い外側
坩堝に自動原料供給装置より原料を供給し、融液流通孔
により相互に連絡畜れた内側坩堝を用いて結晶の引上げ
を行うことをelNとする単結晶製造装置。
In a single crystal growth device that grows a single crystal by a pulling method using a seed crystal from a melt melted by high-frequency heating, a double crucible is used as a crucible for melting raw materials, and raw materials are supplied to an outer crucible by an automatic raw material supply device. A single-crystal manufacturing device that supplies crystals and pulls crystals using inner crucibles that are interconnected through melt flow holes.
JP13516181A 1981-08-28 1981-08-28 Producing device for single crystal Pending JPS5836997A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13516181A JPS5836997A (en) 1981-08-28 1981-08-28 Producing device for single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13516181A JPS5836997A (en) 1981-08-28 1981-08-28 Producing device for single crystal

Publications (1)

Publication Number Publication Date
JPS5836997A true JPS5836997A (en) 1983-03-04

Family

ID=15145242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13516181A Pending JPS5836997A (en) 1981-08-28 1981-08-28 Producing device for single crystal

Country Status (1)

Country Link
JP (1) JPS5836997A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6299083A (en) * 1985-08-22 1987-05-08 デ ビア−ズ インダストリアル ダイアモンド デイビジヨン(プロプライエタリイ)リミテツド Tool component
US5087429A (en) * 1988-04-28 1992-02-11 Nkk Corporation Method and apparatus for manufacturing silicon single crystals
US5087321A (en) * 1987-12-08 1992-02-11 Nkk Corporation Manufacturing method and equipment of single silicon crystal

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6299083A (en) * 1985-08-22 1987-05-08 デ ビア−ズ インダストリアル ダイアモンド デイビジヨン(プロプライエタリイ)リミテツド Tool component
US5087321A (en) * 1987-12-08 1992-02-11 Nkk Corporation Manufacturing method and equipment of single silicon crystal
US5087429A (en) * 1988-04-28 1992-02-11 Nkk Corporation Method and apparatus for manufacturing silicon single crystals

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