JPS5836474A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS5836474A JPS5836474A JP56132749A JP13274981A JPS5836474A JP S5836474 A JPS5836474 A JP S5836474A JP 56132749 A JP56132749 A JP 56132749A JP 13274981 A JP13274981 A JP 13274981A JP S5836474 A JPS5836474 A JP S5836474A
- Authority
- JP
- Japan
- Prior art keywords
- heating element
- heat
- signal
- thermal head
- resistance value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims 1
- 238000001454 recorded image Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 2
- 238000007254 oxidation reaction Methods 0.000 abstract description 2
- 230000001590 oxidative effect Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910004479 Ta2N Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/35—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads providing current or voltage to the thermal head
Landscapes
- Electronic Switches (AREA)
- Non-Adjustable Resistors (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、感熱記録に用いられるサーマルヘッドに関す
るものであって、詳しくは、サーマルヘッドを構成する
発熱体の構造に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thermal head used for thermosensitive recording, and more particularly to the structure of a heating element constituting the thermal head.
第１図は、このようなサーマルへ、ドの一例を示す構成
説明図でありて、１は絶縁基板、２は熱抵抗層、３は発
熱体、４は給電体、５は発熱体保握層、６は耐摩耗層で
ある。たとえば、基板１としてはアルミナセラミックが
用いられ、熱抵抗層２としてはガラスグレーズが用いら
れ、発熱体５としてはＴａ２Ｎが用いられ、給電体４と
してはＭが用いられ、保画層５としてはｓｉｏ□が用い
られ、耐蒙耗層６としてはＡｇ２Ｏ３が用いられている
。FIG. 1 is a configuration explanatory diagram showing an example of such a thermal conductor, in which 1 is an insulating substrate, 2 is a thermal resistance layer, 3 is a heating element, 4 is a power supply element, and 5 is a heating element holding element. Layer 6 is a wear-resistant layer. For example, alumina ceramic is used as the substrate 1, glass glaze is used as the thermal resistance layer 2, Ta2N is used as the heating element 5, M is used as the power supply element 4, and M is used as the image retention layer 5. sio□ is used, and the wear-resistant layer 6 is made of Ag2O3.
ところで、発熱体５として用いられるＴａ２Ｎは、公知
のスパッタリング技術によシ形成されるが、スバ、タリ
ングのみで所定の抵抗値を得ることは困難であることが
多い。そこで、一般には、保護層５を形成するのに先だ
って、発熱体３が形成された基板１を拡散炉内で加熱し
、発熱体３の光面に熱酸化膜（Ｔａ２０５） ３’を形
成して抵抗値を調整することが行われている。Incidentally, Ta2N used as the heating element 5 is formed by a known sputtering technique, but it is often difficult to obtain a predetermined resistance value only by sputtering and sputtering. Therefore, in general, before forming the protective layer 5, the substrate 1 on which the heating element 3 is formed is heated in a diffusion furnace to form a thermal oxide film (Ta205) 3' on the optical surface of the heating element 3. The resistance value is adjusted by
しかし、このような方法によれば、抵抗値の調整に相当
の時間を要することになる。また、このようにして構成
される発熱体３の抵抗値の分布に着目すると、はぼ均一
化されている。この結果、通電時の発熱温度は、中央部
で高く周辺部で低くな如、記録品質を低下させる一因に
もなりている。However, according to such a method, it takes a considerable amount of time to adjust the resistance value. Further, when paying attention to the distribution of resistance values of the heating element 3 constructed in this manner, it is found that the distribution of resistance values is almost uniform. As a result, the temperature generated during energization is high at the center and low at the periphery, which is a factor in deteriorating recording quality.
本発明は、このような欠点管解決したものであって、発
熱体の減面に自己発熱による熱酸化膜を形成するように
したものである。The present invention solves this problem by forming a thermal oxide film on the reduced area of the heating element due to self-heating.
第２図は、本発明に係るサーマルヘッドを実現するため
の調整装置の一例を示す回路図でわりて、Ｒは基準抵抗
値に対応し良信号ＳＲを発生する基準回路、Ｘは被調整
発熱体の抵抗値に対応した信号Ｓｘを発生する被調整回
路、ＣＯλ１ｐはこれら両信号５Ｒ２Ｓｘ（７）大きさ
を比較して所定の信号ＳＯを送出する比較回路、Ｄは被
調整発熱体に通電して発熱させる駆動回路である。この
駆動回路りは、比較回路ＣＯＭＰの出力信号ＳＯに応じ
て駆動制御される。すなわち、ＳＲ＞ＳＸの状態では被
調整発熱体に通電して発熱させるように制御され、ＳＲ
≦Ｓｘになると被調整発熱体への通電を停止するように
制御される。FIG. 2 is a circuit diagram showing an example of an adjustment device for realizing a thermal head according to the present invention, where R is a reference circuit that corresponds to the reference resistance value and generates a good signal SR, and X is the heat generation to be adjusted. COλ1p is a circuit to be adjusted that generates a signal Sx corresponding to the resistance value of the body, COλ1p is a comparison circuit that compares the magnitude of both signals 5R2Sx (7) and sends out a predetermined signal SO, and D is a circuit that energizes the heating element to be adjusted. This is a drive circuit that generates heat. This drive circuit is driven and controlled according to the output signal SO of the comparison circuit COMP. That is, in the state of SR>SX, the controlled heating element is controlled to be energized and generate heat, and SR
When ≦Sx, the control is performed to stop energizing the heating element to be adjusted.
ここで、被調整発熱体の異面は、酸化雰囲気中に露出さ
れているものとする。これにより、゛被調整％熱体の異
面には、発熱体自体の発熱による酸イヒ膜が形成される
ことになシ、発熱体の抵抗値は高くなる。Here, it is assumed that the different surface of the heating element to be adjusted is exposed to an oxidizing atmosphere. As a result, an acid film is not formed on the other side of the heating element to be adjusted due to the heat generated by the heating element itself, and the resistance value of the heating element becomes high.
このようにして形成される熱酸化膜による抵抗値の分布
は次のようになる。スノ（ツタリング後の抵抗値は、全
領域において均一である。したがつて、通電開始時には
全領域に均一に電流が流れて均一に発熱する０しかし、
通電を継続していくと、中央部分の温度が周辺部に比べ
て高くなり、それだけ熱酸化作用も促進される。これに
よシ、中央部分の抵抗値が周辺部に比べて高くなった状
態で抵抗値の調整が完了することになる。このような抵
抗値分布を持つた発熱体を用いてサーマルヘッドを構成
することによシ、記録時における温度分布は、中希部分
に比べて周辺部が高くなる。これは、電流分布が中心部
では粗になり周辺部で密になることによる０このように
して構成されたサーマルへ、ドにおける温度分布は、従
来のサーマルへ、ドに比べて平均化されたものとなり、
記録品質を向上させることができる。The distribution of resistance values due to the thermal oxide film formed in this manner is as follows. The resistance value after tsuttering is uniform in the entire area. Therefore, at the start of energization, the current flows uniformly in the entire area and heats up uniformly. However,
As the current is continued, the temperature of the central part becomes higher than that of the peripheral part, and the thermal oxidation effect is promoted accordingly. As a result, the adjustment of the resistance value is completed in a state where the resistance value of the central portion is higher than that of the peripheral portion. By constructing a thermal head using a heating element having such a resistance value distribution, the temperature distribution during recording is higher in the peripheral portion than in the middle rare portion. This is because the current distribution is coarse in the center and dense in the periphery.The temperature distribution in the thermals constructed in this way is averaged compared to the conventional thermals. Become a thing,
Recording quality can be improved.
以上説明したように、本発明によれば、比較的短時間で
発熱体の抵抗値が所定の値に調整できるとともに、記録
品質の優れたサーマルへ、ドが実現でき、実用上の効果
は大きい。As explained above, according to the present invention, the resistance value of the heating element can be adjusted to a predetermined value in a relatively short time, and thermal recording with excellent recording quality can be realized, which has a great practical effect. .
第１図はサーマルへ、ドの一例な示す構成説明図、第２
図は本発明に系るサーマルヘッドを実現するための調整
装置の一例を示す回路図である。
１（・・・基準回路、Ｘ・・・被調整回路、ＣＯＭＰ・
・・比較回路、Ｄ・・・駆動回路。Figure 1 is an explanatory diagram showing an example of the configuration of thermal
The figure is a circuit diagram showing an example of an adjustment device for realizing a thermal head according to the present invention. 1 (...Reference circuit, X...Circuit to be adjusted, COMP
... Comparison circuit, D... Drive circuit.
Claims (1)
て発熱体に通電して発熱体を発熱させ、感熱ｄｃ！録紙
に所望の記録像を形成するサーマルヘッドにおいて、発
熱体として、表面に自己発帖による熱酸化膜が形成され
たものを用いることを特徴とするサーマルヘッド。A heating element and a power feeder are placed on an insulating substrate, and electricity is applied to the heating element via the power feeder to cause the heating element to generate heat, resulting in a thermal DC! 1. A thermal head for forming a desired recorded image on recording paper, characterized in that a heating element on which a thermally oxidized film is formed by self-exploitation is used as a heating element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56132749A JPS5836474A (en) | 1981-08-26 | 1981-08-26 | Thermal head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56132749A JPS5836474A (en) | 1981-08-26 | 1981-08-26 | Thermal head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5836474A true JPS5836474A (en) | 1983-03-03 |
Family
ID=15088673
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56132749A Pending JPS5836474A (en) | 1981-08-26 | 1981-08-26 | Thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5836474A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60199672A (en) * | 1984-03-23 | 1985-10-09 | Seiko Instr & Electronics Ltd | Thermal head and manufacture thereof |
| JPS6292864A (en) * | 1985-10-18 | 1987-04-28 | Fuji Xerox Co Ltd | Manufacture of thick-film type thermal head |
-
1981
- 1981-08-26 JP JP56132749A patent/JPS5836474A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60199672A (en) * | 1984-03-23 | 1985-10-09 | Seiko Instr & Electronics Ltd | Thermal head and manufacture thereof |
| JPS6292864A (en) * | 1985-10-18 | 1987-04-28 | Fuji Xerox Co Ltd | Manufacture of thick-film type thermal head |
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