JPS5834750U - solid-state image sensor - Google Patents
solid-state image sensorInfo
- Publication number
- JPS5834750U JPS5834750U JP12863381U JP12863381U JPS5834750U JP S5834750 U JPS5834750 U JP S5834750U JP 12863381 U JP12863381 U JP 12863381U JP 12863381 U JP12863381 U JP 12863381U JP S5834750 U JPS5834750 U JP S5834750U
- Authority
- JP
- Japan
- Prior art keywords
- solid
- image sensor
- state image
- light
- aluminum oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来の固体撮像素子について説明するための図
、第2図は本考案に係る固体撮像素子の一例を示す部分
断面図、第3図は第2図に示される例の一部分の形成方
法を説明するための工程図、第4図は本考案に係る固体
撮像素子の他の例を示す部分断面図、第5図は第4図に
示される例の一部分の形成方法を説明するための工程図
である。
図中、1は半導体基体、2は感光部、3は非感光部、4
は絶縁層、5は転送電極、7はフィルタ層、9及び13
は酸化アルミニウム遮光層、9′及び13′は開口、1
0はレジスト、11及び14は酸化アルミニウム膜、1
2は”アルミニウム 膜である。FIG. 1 is a diagram for explaining a conventional solid-state imaging device, FIG. 2 is a partial cross-sectional view showing an example of a solid-state imaging device according to the present invention, and FIG. 3 is a partial formation of the example shown in FIG. 2. FIG. 4 is a partial sectional view showing another example of the solid-state imaging device according to the present invention, and FIG. 5 is a process diagram for explaining the method of forming a part of the example shown in FIG. 4. This is a process diagram. In the figure, 1 is a semiconductor substrate, 2 is a photosensitive part, 3 is a non-photosensitive part, and 4
is an insulating layer, 5 is a transfer electrode, 7 is a filter layer, 9 and 13
is an aluminum oxide light-shielding layer, 9' and 13' are openings, 1
0 is a resist, 11 and 14 are aluminum oxide films, 1
2 is an aluminum film.
Claims (1)
ターリング法により形成された酸化アルミニウム遮光層
が配された固体撮像素子。A solid-state image sensor in which an aluminum oxide light-shielding layer formed by a sputtering method is disposed on a non-light-sensitive portion of a light-receiving surface formed on a semiconductor substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12863381U JPS5834750U (en) | 1981-08-29 | 1981-08-29 | solid-state image sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12863381U JPS5834750U (en) | 1981-08-29 | 1981-08-29 | solid-state image sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5834750U true JPS5834750U (en) | 1983-03-07 |
Family
ID=29922321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12863381U Pending JPS5834750U (en) | 1981-08-29 | 1981-08-29 | solid-state image sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5834750U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5897861A (en) * | 1981-12-08 | 1983-06-10 | Canon Inc | Sensor having directivity |
-
1981
- 1981-08-29 JP JP12863381U patent/JPS5834750U/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5897861A (en) * | 1981-12-08 | 1983-06-10 | Canon Inc | Sensor having directivity |
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