JPS583298Y2 - 電子ビ−ム露光用基板ホルダ− - Google Patents

電子ビ−ム露光用基板ホルダ−

Info

Publication number
JPS583298Y2
JPS583298Y2 JP1977136073U JP13607377U JPS583298Y2 JP S583298 Y2 JPS583298 Y2 JP S583298Y2 JP 1977136073 U JP1977136073 U JP 1977136073U JP 13607377 U JP13607377 U JP 13607377U JP S583298 Y2 JPS583298 Y2 JP S583298Y2
Authority
JP
Japan
Prior art keywords
holder
substrate
holding member
electron beam
screw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1977136073U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5461563U (enrdf_load_stackoverflow
Inventor
憲一 川島
馨 木鉛
喜一 高木
脩 森田
忠輔 楝方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Fujitsu Ltd
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Fujitsu Ltd
Priority to JP1977136073U priority Critical patent/JPS583298Y2/ja
Publication of JPS5461563U publication Critical patent/JPS5461563U/ja
Application granted granted Critical
Publication of JPS583298Y2 publication Critical patent/JPS583298Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP1977136073U 1977-10-11 1977-10-11 電子ビ−ム露光用基板ホルダ− Expired JPS583298Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1977136073U JPS583298Y2 (ja) 1977-10-11 1977-10-11 電子ビ−ム露光用基板ホルダ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1977136073U JPS583298Y2 (ja) 1977-10-11 1977-10-11 電子ビ−ム露光用基板ホルダ−

Publications (2)

Publication Number Publication Date
JPS5461563U JPS5461563U (enrdf_load_stackoverflow) 1979-04-28
JPS583298Y2 true JPS583298Y2 (ja) 1983-01-20

Family

ID=29106975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1977136073U Expired JPS583298Y2 (ja) 1977-10-11 1977-10-11 電子ビ−ム露光用基板ホルダ−

Country Status (1)

Country Link
JP (1) JPS583298Y2 (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042119A (en) * 1975-06-30 1977-08-16 International Business Machines Corporation Workpiece positioning apparatus
JPS5260074A (en) * 1975-11-12 1977-05-18 Jeol Ltd Charge particle beam apparatus

Also Published As

Publication number Publication date
JPS5461563U (enrdf_load_stackoverflow) 1979-04-28

Similar Documents

Publication Publication Date Title
JPH04317316A (ja) 投影露光装置
IE51060B1 (en) Apparatus for prealignment of a wafer
DE2942388A1 (de) Halbleiterplaettchen-positioniervorrichtung
US4420233A (en) Projecting apparatus
GB1589285A (en) Automatic adjustment of a mask with respect to the surface of a substrate body and the subsequent focussing of an image thereof
KR20090028462A (ko) 기판 측정용 스테이지
US4521114A (en) Single lens repeater
JPS583298Y2 (ja) 電子ビ−ム露光用基板ホルダ−
JP2002368378A (ja) 基板クランプ装置
GB2052767A (en) Single Lens Repeater
EP0620584B1 (en) Apparatus and method for providing consistent, non-jamming registration of notched semiconductor wafers
US6172757B1 (en) Lever sensor for stepper field-by-field focus and leveling system
JPS6349895B2 (enrdf_load_stackoverflow)
JP2006100590A (ja) 近接露光装置
JPH0337229Y2 (enrdf_load_stackoverflow)
JP3254274B2 (ja) X線単結晶方位測定装置
JPH09219437A (ja) 位置決め装置
JP2006093604A (ja) 近接露光装置
JP4487688B2 (ja) ステップ式近接露光装置
JP4487700B2 (ja) 近接露光装置
JPS59161815A (ja) 投影露光装置
JPS60123028A (ja) 露光装置
JPH08288371A (ja) 被処理材の固定装置
JP2631526B2 (ja) 露光装置
JP3326290B2 (ja) 露光方法