JPS5826197B2 - Manufacturing method of printed wiring board with metal core - Google Patents

Manufacturing method of printed wiring board with metal core

Info

Publication number
JPS5826197B2
JPS5826197B2 JP13131980A JP13131980A JPS5826197B2 JP S5826197 B2 JPS5826197 B2 JP S5826197B2 JP 13131980 A JP13131980 A JP 13131980A JP 13131980 A JP13131980 A JP 13131980A JP S5826197 B2 JPS5826197 B2 JP S5826197B2
Authority
JP
Japan
Prior art keywords
hole
metal
core material
metal plate
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13131980A
Other languages
Japanese (ja)
Other versions
JPS5756997A (en
Inventor
信治 井上
宏治 上山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP13131980A priority Critical patent/JPS5826197B2/en
Publication of JPS5756997A publication Critical patent/JPS5756997A/en
Publication of JPS5826197B2 publication Critical patent/JPS5826197B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は、金属芯入り印刷配線板の製造法、詳しくは、
表面に銅箔が貼合され、スルホールが設けられた金属芯
入り印刷配線板の金属芯スルホール内壁のエツチング法
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a printed wiring board with a metal core, specifically,
This invention relates to a method for etching the inner wall of a metal core through hole in a printed wiring board with a metal core, the surface of which is laminated with copper foil and provided with through holes.

金属芯入り表面銅張積層板に穴あけを施した後、その穴
内に上下面の各パターンを金属芯材に接触することなく
接続するために、又は、片面のパターンと穴内壁とを接
続するために、穴内壁に銅めっきを施す際に金属芯材に
、穴内壁鋼めっきが電気的に接触することを避けるため
に穴内の芯材のみエツチングして、そのエツチングされ
た所に電層塗装を施し絶縁層を形成している。
After drilling a hole in a surface copper-clad laminate with a metal core, in order to connect each pattern on the upper and lower surfaces within the hole without contacting the metal core, or to connect the pattern on one side and the inner wall of the hole. When applying copper plating to the inner wall of the hole, in order to avoid electrical contact between the metal core material and the steel plating on the inner wall of the hole, only the core material inside the hole is etched, and the etched area is coated with an electric layer. Forms an insulating layer.

すなわち金属芯入り表面銅張積層板においてスルホール
を形成するには、先ずパリが出ないように穴あけを行い
、穴内の金属芯を20〜100μmエツチングし、そこ
に電気泳動を原理とする電着塗装等電気的駆動力により
絶縁層を形成し、その後全体にめっきが施される。
In other words, to form through-holes in surface copper-clad laminates with metal cores, holes are first drilled to prevent holes from appearing, the metal cores in the holes are etched by 20 to 100 μm, and then electrodeposited using electrophoresis as the principle. An insulating layer is formed using an electrically driven force, and then the entire structure is plated.

金属芯入り配線板にスルホールを形成させた場合、第1
図に示すように金属芯は積層板内部においてパリを生じ
易く金属板芯材を陽極、他の電極を陰極として電解液中
でエツチングするという単に穴の内壁に平行にエツチン
グするだけでは、表面の銅箔との距離を大きくできなく
、また電着塗装後コーナ部分の絶縁層の膜厚を保つこと
が困難であり高い破壊電圧を得ることができない。
When through holes are formed in a wiring board with a metal core, the first
As shown in the figure, the metal core tends to cause flashing inside the laminate, so simply etching parallel to the inner wall of the hole by using the metal plate core as an anode and the other electrode as a cathode in an electrolytic solution will not work. It is not possible to increase the distance to the copper foil, and it is difficult to maintain the thickness of the insulating layer at the corner after electrodeposition, making it impossible to obtain a high breakdown voltage.

第1図に於て、1は銅箔、2は基材に熱硬化性樹脂を充
填したプリプレグ、3は金属板芯材、4はスルホールを
あけるときに形成されるパリである。
In FIG. 1, 1 is a copper foil, 2 is a prepreg whose base material is filled with thermosetting resin, 3 is a metal plate core material, and 4 is a hole formed when a through hole is made.

また金属板芯材を陽極、他の電極を陰極としてエツチン
グした場合、エツチング除去された金属板芯材の金属が
銅箔に付着するという問題もある。
Furthermore, when etching is performed using the metal plate core material as an anode and the other electrodes as cathodes, there is a problem that the etched metal of the metal plate core material adheres to the copper foil.

金属板芯材の角部をエツチングするために、金属板芯材
3を陽極、銅箔1を陰極として電解液中で、エツチング
することも考えられるが、この場合は、第2図に示すよ
うに金属板芯材のスルホール内壁中央部がエツチングさ
れず電着樹脂の付着が不十分となる。
In order to etch the corners of the metal plate core material, etching may be carried out in an electrolytic solution using the metal plate core material 3 as an anode and the copper foil 1 as a cathode, but in this case, as shown in FIG. The central part of the inner wall of the through hole in the metal plate core material is not etched, resulting in insufficient adhesion of the electrodeposited resin.

本発明はこのような点に鑑みてなされたもので、金属板
を芯材とし、その表面に基材に熱硬化樹脂を充填したプ
リプレグを重ねその上から銅箔をプレスした金属芯入り
銅張り積層板にスルホールを形成し、スルホール内壁の
金属板芯材をエツチングし、その部分に、電気的駆動力
により絶縁皮膜を形成させ、スルホール内壁に化学メッ
キ導体層を形成させる金属芯入り印刷配線板の製造法に
於て、電解液中で、金属板芯材を陽極、他の電極を陰極
とすると共に、銅箔に金属板芯材よりも卑な電位を与え
てエツチングすることを特徴とするものである。
The present invention was made in view of these points, and consists of a metal cored copper cladding in which a metal plate is used as a core material, and a prepreg filled with a thermosetting resin is layered on the surface of the core material, and copper foil is pressed on top of the prepreg. A printed wiring board with a metal core in which through-holes are formed in a laminate, the metal plate core material on the inner wall of the through-hole is etched, an insulating film is formed on that part by electrical driving force, and a chemically plated conductor layer is formed on the inner wall of the through-hole. The manufacturing method is characterized by etching in an electrolytic solution by using the metal plate core material as an anode and the other electrodes as a cathode, and applying a lower potential to the copper foil than the metal plate core material. It is something.

第3図に於て、5は陰極であり、金属板芯材は陽極とさ
れる。
In FIG. 3, 5 is a cathode, and the metal plate core material is an anode.

銅箔には、金属板芯材より卑な電位が与えられ、塩酸等
の電解液中で電解エツチングする。
The copper foil is given a lower potential than the metal plate core material and electrolytically etched in an electrolytic solution such as hydrochloric acid.

このようにするとスルホール内の構造は第4図に示す様
にパリが取れ金属芯のコーナ部分が丸くなる。
By doing this, the structure inside the through-hole will be flattened and the corners of the metal core will be rounded, as shown in FIG.

この後、電着塗装、粉体塗装等電気的駆動力により金属
芯のみに絶縁樹脂層流して、積層板全体に化学めっきを
施すと、その構造は第5図に示す様に金属芯と表面のめ
っきとの距離は一定値以上に保たれる。
After this, the insulating resin layer is applied only to the metal core using electrical driving force such as electrodeposition coating or powder coating, and chemical plating is applied to the entire laminate.The structure is as shown in Figure 5. The distance to the plating is kept above a certain value.

第5図に於て、6は絶縁樹脂層、7は化学めっき層であ
る。
In FIG. 5, 6 is an insulating resin layer, and 7 is a chemical plating layer.

実施例 1.0間の鉄板を芯とする金属芯入り両面銅張り積層板
において、エツチング用電解液に希塩酸を用いて第3図
に示す回路による電解エツチングを施し、自動車の外装
塗装の下地塗装に使用されているカチオン性電着塗料を
金属芯のみに施し、その後化学銅めっき0.5〜10μ
m1電気銅めっき10〜50μmを積層板全体に施し、
スルホールを利用して回路形成した。
Example 1. A double-sided copper-clad laminate with a metal core made of an iron plate between 1 and 2 was subjected to electrolytic etching according to the circuit shown in Figure 3 using dilute hydrochloric acid as the etching electrolyte, and was used as a base coat for automobile exterior painting. The cationic electrodeposition paint used in
m1 electrolytic copper plating of 10 to 50 μm is applied to the entire laminate,
A circuit was formed using through holes.

そして耐圧試験を行った結果1kV、1分間以上で充分
耐圧を有するものであった。
As a result of a voltage resistance test, it was found to have sufficient voltage resistance at 1 kV for 1 minute or more.

以上説明したように、本発明に於ては金属芯入り両面銅
張積層板において、穴あけ後穴内の金属芯のコーナ部を
選択的エツチングによって取ることによりパリの発生し
易い穴内の金属芯のコーナ部で発生する絶縁不良事故を
無くすることができた。
As explained above, in the present invention, in a double-sided copper-clad laminate with a metal core, the corners of the metal core in the hole where burrs are likely to occur can be removed by selectively etching the corners of the metal core in the hole after drilling. We were able to eliminate insulation failure accidents that occurred in the area.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、金属芯入り印刷配線板のスルホール部断面図
、第2図は、従来の方法でエツチングした時の金属芯入
り印刷配線板のスルホール部断面図、第3図は本発明の
エツチング法を示す断面図、第4図は本発明の方法によ
りエツチングした時の金属芯入り印刷配線板のスルホー
ル部断面図、第5図は第4図のものに、電着塗装、化学
メッキを施した状態のスルホール部断面図である。 符号の説明、1・・・・・・銅箔、2・・・・・・プリ
プレグ、3・・・・・・金属板芯材、4・・・・・・パ
リ、5・・・・・・陰極電極、6・・・・・・絶縁樹脂
層、7・・・・・・化学めっき層。
Fig. 1 is a sectional view of the through-hole part of a printed wiring board with a metal core, Fig. 2 is a sectional view of the through-hole part of the printed wiring board with a metal core etched by the conventional method, and Fig. 3 is a sectional view of the through-hole part of the printed wiring board with a metal core etched by the conventional method. Fig. 4 is a cross-sectional view of a through-hole portion of a printed wiring board with a metal core etched by the method of the present invention, and Fig. 5 is a cross-sectional view of the through-hole portion of a printed wiring board with a metal core etched by the method of the present invention. FIG. Explanation of symbols, 1... Copper foil, 2... Prepreg, 3... Metal plate core material, 4... Paris, 5... - Cathode electrode, 6... Insulating resin layer, 7... Chemical plating layer.

Claims (1)

【特許請求の範囲】[Claims] 1 金属板を芯材とし、その表面に基材に熱硬化性樹脂
を充填したプリプレグを重ねその上から銅箔をプレスし
た金属芯入り銅張り積層板にスルホールを形成し、スル
ホール内壁の金属板芯材をエツチングし、その部分に、
電気的駆動力により絶縁皮膜を形成させ、スルホール内
壁に化学メッキ導体層を形成させる金属芯入り印刷配線
板の製造法に於て、電解液中で、金属板芯材を陽極、他
の電極を陰極とすると共に、銅箔に金属板芯材よりも卑
な電位を与えてエツチングすることを特徴とする金属芯
入り印刷配線板の製造法。
1 A through hole is formed in a copper-clad laminate with a metal core made by using a metal plate as a core material, stacking a prepreg filled with a thermosetting resin as a base material on the surface and pressing copper foil on top of the prepreg, and forming a through hole in the metal plate on the inner wall of the through hole. The core material is etched and the area is etched,
In the manufacturing method of printed wiring boards with metal cores, in which an insulating film is formed by electrical driving force and a chemically plated conductor layer is formed on the inner wall of the through-hole, the metal plate core material is used as an anode and other electrodes are used as an anode in an electrolytic solution. A method for producing a printed wiring board with a metal core, characterized in that the copper foil serves as a cathode and is etched by applying a potential lower than that of the metal plate core material.
JP13131980A 1980-09-19 1980-09-19 Manufacturing method of printed wiring board with metal core Expired JPS5826197B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13131980A JPS5826197B2 (en) 1980-09-19 1980-09-19 Manufacturing method of printed wiring board with metal core

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13131980A JPS5826197B2 (en) 1980-09-19 1980-09-19 Manufacturing method of printed wiring board with metal core

Publications (2)

Publication Number Publication Date
JPS5756997A JPS5756997A (en) 1982-04-05
JPS5826197B2 true JPS5826197B2 (en) 1983-06-01

Family

ID=15055164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13131980A Expired JPS5826197B2 (en) 1980-09-19 1980-09-19 Manufacturing method of printed wiring board with metal core

Country Status (1)

Country Link
JP (1) JPS5826197B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS627572U (en) * 1985-06-28 1987-01-17

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0751799Y2 (en) * 1988-04-06 1995-11-22 三洋電機株式会社 Solid-state imaging device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS627572U (en) * 1985-06-28 1987-01-17

Also Published As

Publication number Publication date
JPS5756997A (en) 1982-04-05

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