JPH01181597A - Manufacture of printed wiring board - Google Patents
Manufacture of printed wiring boardInfo
- Publication number
- JPH01181597A JPH01181597A JP305888A JP305888A JPH01181597A JP H01181597 A JPH01181597 A JP H01181597A JP 305888 A JP305888 A JP 305888A JP 305888 A JP305888 A JP 305888A JP H01181597 A JPH01181597 A JP H01181597A
- Authority
- JP
- Japan
- Prior art keywords
- anodic oxide
- oxide film
- printed wiring
- wiring board
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 27
- 239000010407 anodic oxide Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 12
- 239000011347 resin Substances 0.000 claims abstract description 11
- 229920005989 resin Polymers 0.000 claims abstract description 11
- 230000004888 barrier function Effects 0.000 claims abstract description 10
- 238000001962 electrophoresis Methods 0.000 claims abstract description 7
- 239000004020 conductor Substances 0.000 claims abstract description 6
- 238000007747 plating Methods 0.000 abstract description 8
- 238000005530 etching Methods 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000009713 electroplating Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- 241001446276 Helia <angisperm> Species 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- AGLSQWBSHDEAHB-UHFFFAOYSA-N azane;boric acid Chemical compound N.OB(O)O AGLSQWBSHDEAHB-UHFFFAOYSA-N 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
Landscapes
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は熱伝導性の良いアルミニュームベース印刷配線
板に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an aluminum-based printed wiring board with good thermal conductivity.
従来よりアルミニュームベース印刷配線板の製造方法と
して種々提案されている0例えばポーラス型陽極酸化を
行なった後、電気泳動法により絶縁皮膜を形成した後導
体回路を形成する方法や、スルホール形成基板において
は例えば松下電工(公開特許公報 昭80−21458
7)により提案されているようにスルホール孔壁の絶縁
化を絶縁樹脂を用いて全体を埋めた後、絶縁層を残し再
び孔あけを行なった後回路を形成する方法等がある。Various methods have been proposed for manufacturing aluminum-based printed wiring boards. For example, Matsushita Electric Works (Public Patent Publication 1980-21458)
7), there is a method of insulating the through hole wall by filling the entire hole with an insulating resin, leaving an insulating layer, drilling the hole again, and then forming a circuit.
前記後者の方法は再孔あけ時の位芒合せの難しさから高
精度化に限界がある。また前者の方法は電気的絶縁に対
する高い信頼性を保つことが難しいという欠点がある。The latter method has a limit in achieving high accuracy due to the difficulty of alignment during re-drilling. Furthermore, the former method has the disadvantage that it is difficult to maintain high reliability in electrical insulation.
本発明は上記両者の欠点を除去することにより高精度で
あると同時に電気的絶縁の信頼性の高いアルミニューム
ベース印刷配線板の製造方法を提供するものである。The present invention provides a method for manufacturing an aluminum-based printed wiring board that has high precision and high reliability in electrical insulation by eliminating both of the above-mentioned drawbacks.
本発明はアルミニューム基材上にポーラス型の陽極酸化
皮膜を形成した後、バリヤ型の陽極酸化皮膜を形成し、
電気泳動法により絶縁性樹脂を電着することにより絶縁
層を形成し、その上に導体回路を形成することを特徴と
する印刷配線板の製造方法である。In the present invention, after forming a porous type anodic oxide film on an aluminum base material, a barrier type anodic oxide film is formed,
This method of manufacturing a printed wiring board is characterized by forming an insulating layer by electrodepositing an insulating resin by electrophoresis, and forming a conductor circuit thereon.
本発明によるアルミニューム基材としては、アルミニュ
ーム金属もしくはその合金、またはアルミニューム金属
もしくはその合金上に銅箔等の金属箔を絶縁性接着剤を
用いて接着された基材が用いられる。As the aluminum base material according to the present invention, there is used an aluminum metal or an alloy thereof, or a base material in which a metal foil such as a copper foil is bonded onto an aluminum metal or an alloy thereof using an insulating adhesive.
以下に上記基材料工程図を参照しながら本発明を説明す
る。第1〜7図はアルミニューム金属もしくはその合金
をアルミニューム基材とした印刷配線板の製造工程を示
し、第8〜12図はアルミニューム金属もしくはその合
金上に金属箔を接着して基材とした印刷配線板の製造工
程を示す。The present invention will be described below with reference to the above-mentioned base material process diagram. Figures 1 to 7 show the manufacturing process of a printed wiring board using aluminum metal or its alloy as the aluminum base material, and Figures 8 to 12 show the manufacturing process of a printed wiring board using aluminum metal or its alloy as the base material. The manufacturing process of the printed wiring board is shown below.
第1および8図において、第1図はアルミニューム板1
を基材とし、第8図はアルミニューム板Aに銅箔りを接
着剤Cにより接着したものを基材とする。必要に応じて
スルホール2.B用の孔をあけるが、金属箔を接着した
アルミニューム基材の場合にはスルホール孔壁のみに本
発明方法を適用し、一方アルミニューム基材では基材表
面、スルホール孔壁ともに本発明方法による処理を行な
う。In Figures 1 and 8, Figure 1 shows the aluminum plate 1.
The base material shown in FIG. 8 is an aluminum plate A with a copper foil bonded to it using an adhesive C. Throughhole 2. if necessary. Holes for B are drilled, but in the case of an aluminum substrate with metal foil adhered, the method of the present invention is applied only to the through-hole hole walls, whereas in the case of aluminum substrates, the method of the present invention is applied to both the substrate surface and the through-hole hole walls. Processing is performed by
吹ぎにポーラス型の陽極酸化皮膜3.E(第2.9図)
を形成する。ポーラス型皮膜を形成するには、硫酸浴、
シュウ酸浴、リン酸浴、クロム酸浴が用いられる0次い
でバリヤ型陽極醸化皮膜4、F(第3.9図)処理がな
されるが、アルミニューム陽極酸化の特徴として、1層
目のポーラス皮膜上に21fJ目のバリヤ型皮膜が形成
されるのではなく、アルミニューム母材側に形成される
ことが本発明技術にとって重要なことであり、これによ
ってアルミニューム基材自体の絶縁性が従来よりはるか
に向上することと併せて1次ぎに行なわれる電気泳動絶
縁皮膜がポーラス型陽極酸化皮膜3.Hによく密着し信
頼性の高い層構成となることが出来る0本発明技術によ
り従来のポーラス型陽極酸化皮膜単独の場合に比べて絶
縁性がはるかに向上するのは、バリヤ型陽極酸化皮膜と
いう非常に高絶縁性皮膜を併用することにより達成され
るものである。バリヤ型皮膜を形成する電解浴としては
、ホウ酸アンモニューム浴、リン酸アンモニューム浴、
有機酸とアンモニアなどの緩衝溶液が用いられる。この
場合化成電圧は一層目のポーラス型陽極酸化皮膜の化成
電圧より高く、絶縁樹脂の電気泳動電圧より低いことが
必要でありかつ高絶縁性を保証するため極力高い電圧が
望ましい。Blown porous type anodic oxide film 3. E (Figure 2.9)
form. To form a porous film, a sulfuric acid bath,
The barrier type anodic oxidation coating 4, F (Fig. 3.9) treatment is performed using an oxalic acid bath, phosphoric acid bath, or chromic acid bath. It is important for the present invention that the 21fJ barrier type film is not formed on the porous film, but on the aluminum base material side, and this improves the insulation properties of the aluminum base material itself. 3. The electrophoretic insulation film that is applied in the first step is a porous type anodic oxide film, which is much improved compared to the conventional method. The barrier-type anodic oxide film, which can adhere well to H and form a highly reliable layer structure, has much higher insulation properties than the conventional porous anodic oxide film alone. This is achieved through the combined use of a very highly insulating film. Electrolytic baths for forming barrier-type films include ammonium boric acid bath, ammonium phosphate bath,
Buffer solutions such as organic acids and ammonia are used. In this case, the formation voltage needs to be higher than the formation voltage of the first porous anodic oxide film and lower than the electrophoresis voltage of the insulating resin, and is preferably as high as possible to ensure high insulation.
2段により陽極化成したアルミニューム基材は次いで電
気泳動法により絶縁樹脂層5.0(第4.9図)を形成
する。電着樹脂としてはカチオン型のエポキシ・系樹脂
またはアニオン型のアクリル系樹脂等が用いられる。続
いてアディティブ法またはパネルめっき法により銅めっ
き層6.H(第5.10図)をめっき後1通常のフォト
エツチング法を用いて導体回路を形成する。第6.11
図はエツチング前のエツチングレジスト層7.J9形成
を、第7.12図はエツチングによる導体回路の形成を
示す。The aluminum base material anodized in two stages is then subjected to electrophoresis to form an insulating resin layer 5.0 (FIG. 4.9). As the electrodeposited resin, a cationic epoxy resin or anionic acrylic resin is used. Next, a copper plating layer 6 is formed using an additive method or a panel plating method. After plating H (Fig. 5.10), a conductor circuit is formed using a conventional photoetching method. Chapter 6.11
The figure shows the etching resist layer 7 before etching. FIG. 7.12 shows the formation of a conductor circuit by etching.
以下実施例により本発明をさら≠説明する。 The present invention will be further explained below with reference to Examples.
実施例1
板厚1腸lのアルミニューム板に直径im腸の孔をあけ
た0次に50g/lの水酸化ナトリウムの水溶液中に8
0℃において1分間浸漬することにより脱脂を行なった
0次に150g/ 31の82SO4を含む水溶液中で
20℃においてアルミニューム板を陽極、鉛板を陰極と
して1.3A/dm″で30分間電解することによりポ
ーラス型の陽極酸化皮膜を形成した0次にpHを7.8
に調整した20g/JLのホウ酸アンモンを含む水溶液
中で50℃においてl v/secの昇圧速度で100
Vに昇圧した後100Vで3分間陽極電解することによ
りバリヤ型陽極酸化皮膜を形成した。Example 1 An aluminum plate with a plate thickness of 1 l and a hole with a diameter of 1 mm was drilled in an aqueous solution of 50 g/l of sodium hydroxide.
Degreased by immersing for 1 minute at 0°C, electrolyzed at 1.3 A/dm for 30 minutes at 20°C in an aqueous solution containing 150 g/31 of 82SO4, using an aluminum plate as an anode and a lead plate as a cathode. By doing so, a porous anodic oxide film was formed, and the pH was adjusted to 7.8.
100 at a pressure increase rate of l v/sec at 50 °C in an aqueous solution containing 20 g/JL ammonium borate adjusted to
After increasing the pressure to V, anodic electrolysis was performed at 100 V for 3 minutes to form a barrier type anodic oxide film.
続いてアニオン型電気泳動浴(バニライト8800 :
ハニー化成社製)中で20℃において140Vの電圧を
印加し3分間陽極電解を行なった。さらにHSlolB
(日立化成社製)により触媒化処理後、無電解銅めっ
きを行ないそ、の上に電気銅めっき衛30鱗の厚さに形
成した0次にフォトエツチング法によりスルホールを持
ったプリント配線板を形成した。得られたプリント配線
板は電気的絶縁の信頼性とり放散性が高く、かつ曲げ加
工部分にも配線可能であった。Next, an anionic electrophoresis bath (Vanilite 8800:
Anodic electrolysis was performed for 3 minutes by applying a voltage of 140 V at 20° C. in a container (manufactured by Honey Kasei Co., Ltd.). Furthermore, HSlolB
After catalytic treatment (manufactured by Hitachi Chemical Co., Ltd.), electroless copper plating was performed, and then a printed wiring board with through holes was formed using the zero-order photoetching method on which electrolytic copper plating was formed to a thickness of 30 scales. Formed. The obtained printed wiring board had high reliability in electrical insulation and high dissipation properties, and could be wired even in bent parts.
実施例2
板厚1.8mmのアルミニュームベース両面銅張積層板
(日本軽金属社製)を用いる以外は実施例1と同様の方
法によりスルホールを持ったプリント配線板を形成した
。たCし本発明方法によるポーラス型の陽極酸化皮膜、
バリヤ型陽極酸化皮膜および電気泳動絶縁樹脂の形成は
スルホール孔壁のみに適用した。得られたプリント配線
板は実施例1のプリント配線板と同様の性能、効果を有
していた。Example 2 A printed wiring board with through holes was formed in the same manner as in Example 1, except that an aluminum-based double-sided copper-clad laminate (manufactured by Nippon Light Metal Co., Ltd.) having a thickness of 1.8 mm was used. A porous anodic oxide film produced by the method of the present invention,
Formation of barrier type anodic oxide film and electrophoretic insulating resin was applied only to the through-hole pore walls. The obtained printed wiring board had the same performance and effects as the printed wiring board of Example 1.
以上説明したように本発明方法により製造されたアルミ
ニュームベース印刷配線板は熱伝導性に優れているため
大容量の電流を必要とする部品搭載に有利であり、曲げ
加工部分にも配線出来る利点がある。更に高精度で且つ
高い電気絶縁性を持ったアルミニュームベース印刷配線
板の製造原価を大幅に下げることが可能となった。As explained above, the aluminum-based printed wiring board manufactured by the method of the present invention has excellent thermal conductivity, so it is advantageous for mounting components that require a large amount of current, and has the advantage that it can be wired even in bent parts. There is. Furthermore, it has become possible to significantly reduce the manufacturing cost of aluminum-based printed wiring boards with high precision and high electrical insulation.
第1〜7図は本発明によるアルミニュームベース印刷配
線板の製造工程を示す模式的断面図、第8〜12図は本
発明による金属箔を接着したアルミニュームベース印刷
配線板の製造工程を示す模式的断面図
である。
l・・・アルミニューム板
2・・・スルホール
3・・・ポーラス型陽極酸化皮膜
4・・・バリヤ型陽極酸化皮膜
5・・・電気泳動絶縁樹脂層
6・・・銅めっき層
7・・・エツチングレジスト層
A・・・アルミニューム板
B・・・スルホール
C・・・接着剤
D・・・銅箔
E・・・ポーラス型陽極酸化皮膜
F・・・へリヤ型陽極酸化皮膜
G・・・電気泳動絶縁樹脂層
H・・・銅めっき層
J・・・エツチングレジスト層
特許出願人 キャノン株式会社
代 理 人 若 林 由!PJ1図
第2図
第5図
fi7図
fi8図
Me図
JA10図
:A12図Figures 1 to 7 are schematic cross-sectional views showing the manufacturing process of an aluminum-based printed wiring board according to the present invention, and Figures 8 to 12 show the manufacturing process of an aluminum-based printed wiring board to which metal foil is bonded according to the present invention. It is a schematic cross-sectional view. l... Aluminum plate 2... Through hole 3... Porous type anodic oxide film 4... Barrier type anodic oxide film 5... Electrophoretic insulating resin layer 6... Copper plating layer 7... Etching resist layer A...Aluminum plate B...Through hole C...Adhesive D...Copper foil E...Porous type anodic oxide film F...Helia type anodic oxide film G... Electrophoretic insulating resin layer H...Copper plating layer J...Etching resist layer Patent applicant: Canon Co., Ltd. Representative Yu Wakabayashi! PJ1 figure 2 figure 5 fi7 figure fi8 figure Me figure JA10 figure: A12 figure
Claims (1)
形成した後、バリヤ型の陽極酸化皮膜を形成し、電気泳
動法により絶縁性樹脂を電着することにより絶縁層を形
成し、その上に導体回路を形成することを特徴とする印
刷配線板の製造方法。1. After forming a porous type anodic oxide film on the aluminum base material, a barrier type anodic oxide film is formed, an insulating layer is formed by electrodepositing an insulating resin by electrophoresis, and a conductor circuit is formed on top of that. A method of manufacturing a printed wiring board, comprising: forming a printed wiring board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP305888A JPH01181597A (en) | 1988-01-12 | 1988-01-12 | Manufacture of printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP305888A JPH01181597A (en) | 1988-01-12 | 1988-01-12 | Manufacture of printed wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01181597A true JPH01181597A (en) | 1989-07-19 |
Family
ID=11546724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP305888A Pending JPH01181597A (en) | 1988-01-12 | 1988-01-12 | Manufacture of printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01181597A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012138558A (en) * | 2010-12-24 | 2012-07-19 | Samsung Electro-Mechanics Co Ltd | High heat radiation board based on electro-deposition coating and method of manufacturing the same |
-
1988
- 1988-01-12 JP JP305888A patent/JPH01181597A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012138558A (en) * | 2010-12-24 | 2012-07-19 | Samsung Electro-Mechanics Co Ltd | High heat radiation board based on electro-deposition coating and method of manufacturing the same |
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