JPS5825629A - ｏ−ナフトキノンジアジドをベ−スとする感光性混合物及び該混合物から製造した感光性複写材料 - Google Patents

ｏ−ナフトキノンジアジドをベ−スとする感光性混合物及び該混合物から製造した感光性複写材料

Info

Publication number
JPS5825629A
JPS5825629A JP57119996A JP11999682A JPS5825629A JP S5825629 A JPS5825629 A JP S5825629A JP 57119996 A JP57119996 A JP 57119996A JP 11999682 A JP11999682 A JP 11999682A JP S5825629 A JPS5825629 A JP S5825629A
Authority
JP
Japan
Prior art keywords
photosensitive
naphthoquinone
group
mixtures
diazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57119996A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0160811B2 (en, 2012
Inventor
パウル・シユタ−ルホ−フエン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5825629A publication Critical patent/JPS5825629A/ja
Publication of JPH0160811B2 publication Critical patent/JPH0160811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C08G8/32—Chemically modified polycondensates by organic acids or derivatives thereof, e.g. fatty oils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Fats And Perfumes (AREA)
  • Color Printing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Moulding By Coating Moulds (AREA)
JP57119996A 1981-07-14 1982-07-12 ｏ−ナフトキノンジアジドをベ−スとする感光性混合物及び該混合物から製造した感光性複写材料 Granted JPS5825629A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3127754.3 1981-07-14
DE19813127754 DE3127754A1 (de) 1981-07-14 1981-07-14 Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (2)

Publication Number Publication Date
JPS5825629A true JPS5825629A (ja) 1983-02-15
JPH0160811B2 JPH0160811B2 (en, 2012) 1989-12-26

Family

ID=6136873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57119996A Granted JPS5825629A (ja) 1981-07-14 1982-07-12 ｏ−ナフトキノンジアジドをベ−スとする感光性混合物及び該混合物から製造した感光性複写材料

Country Status (11)

Country Link
US (1) US4439511A (en, 2012)
EP (1) EP0069966B1 (en, 2012)
JP (1) JPS5825629A (en, 2012)
AT (1) ATE15726T1 (en, 2012)
AU (1) AU8577282A (en, 2012)
BR (1) BR8204072A (en, 2012)
CA (1) CA1214676A (en, 2012)
DE (2) DE3127754A1 (en, 2012)
ES (1) ES513938A0 (en, 2012)
FI (1) FI822470A7 (en, 2012)
ZA (1) ZA824704B (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097347A (ja) * 1983-11-01 1985-05-31 Hitachi Chem Co Ltd 画像形成性感光性組成物

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3246106A1 (de) * 1982-12-13 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
GB2212933B (en) * 1987-11-27 1991-10-16 Tokyo Ohka Kogyo Co Ltd A positive-working photoresist composition
US4957846A (en) * 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
US4992356A (en) * 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group
US4992596A (en) * 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures
US5306594A (en) * 1991-11-04 1994-04-26 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
US6461794B1 (en) * 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510151A (en, 2012) * 1949-07-23
BE506677A (en, 2012) * 1950-10-31
BE586713A (en, 2012) * 1959-01-21
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS505084B1 (en, 2012) * 1970-09-16 1975-02-28
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097347A (ja) * 1983-11-01 1985-05-31 Hitachi Chem Co Ltd 画像形成性感光性組成物

Also Published As

Publication number Publication date
FI822470L (fi) 1983-01-15
FI822470A7 (fi) 1983-01-15
DE3127754A1 (de) 1983-02-03
EP0069966A1 (de) 1983-01-19
ZA824704B (en) 1983-04-27
JPH0160811B2 (en, 2012) 1989-12-26
FI822470A0 (fi) 1982-07-12
EP0069966B1 (de) 1985-09-18
ES8309009A1 (es) 1983-10-01
BR8204072A (pt) 1983-07-05
DE3266383D1 (en) 1985-10-24
ES513938A0 (es) 1983-10-01
ATE15726T1 (de) 1985-10-15
AU8577282A (en) 1983-01-20
US4439511A (en) 1984-03-27
CA1214676A (en) 1986-12-02

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