JPH0222369B2 - - Google Patents

Info

Publication number
JPH0222369B2
JPH0222369B2 JP56166531A JP16653181A JPH0222369B2 JP H0222369 B2 JPH0222369 B2 JP H0222369B2 JP 56166531 A JP56166531 A JP 56166531A JP 16653181 A JP16653181 A JP 16653181A JP H0222369 B2 JPH0222369 B2 JP H0222369B2
Authority
JP
Japan
Prior art keywords
weight
parts
naphthoquinone
formula
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56166531A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57111530A (en
Inventor
Buuru Geruharuto
Rutsukeruto Hansu
Shutaaruhoofuen Pauru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS57111530A publication Critical patent/JPS57111530A/ja
Publication of JPH0222369B2 publication Critical patent/JPH0222369B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Refuse Collection And Transfer (AREA)
  • Packaging For Recording Disks (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
JP56166531A 1980-10-24 1981-10-20 Photosensitive mixture and photosensitive copying material manufactured from said mixture Granted JPS57111530A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803040157 DE3040157A1 (de) 1980-10-24 1980-10-24 Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial

Publications (2)

Publication Number Publication Date
JPS57111530A JPS57111530A (en) 1982-07-12
JPH0222369B2 true JPH0222369B2 (en, 2012) 1990-05-18

Family

ID=6115121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56166531A Granted JPS57111530A (en) 1980-10-24 1981-10-20 Photosensitive mixture and photosensitive copying material manufactured from said mixture

Country Status (9)

Country Link
US (1) US4409314A (en, 2012)
EP (1) EP0050806B1 (en, 2012)
JP (1) JPS57111530A (en, 2012)
AT (1) ATE17793T1 (en, 2012)
BR (1) BR8106860A (en, 2012)
CA (1) CA1193275A (en, 2012)
DE (2) DE3040157A1 (en, 2012)
FI (1) FI813304A7 (en, 2012)
ZA (1) ZA817278B (en, 2012)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3124936A1 (de) * 1981-06-25 1983-01-20 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4596763A (en) * 1984-10-01 1986-06-24 American Hoechst Corporation Positive photoresist processing with mid U-V range exposure
JPS61118744A (ja) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
US4588670A (en) * 1985-02-28 1986-05-13 American Hoechst Corporation Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPS62178562A (ja) * 1986-01-30 1987-08-05 Japan Synthetic Rubber Co Ltd １，２−キノンジアジド化合物の製造方法
DE3603578A1 (de) * 1986-02-06 1987-08-13 Hoechst Ag Neue bis-1,2-naphthochinon-2-diazid-sulfonsaeure- amide, ihre verwendung in einem strahlungsempfindlichen gemisch und strahlungsempfindliches kopiermaterial
US5182183A (en) * 1987-03-12 1993-01-26 Mitsubishi Kasei Corporation Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
DE602004015513D1 (de) * 2004-05-27 2008-09-11 Think Labs Kk Positive lichtempfindliche zusammensetzung

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510151A (en, 2012) * 1949-07-23
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL130027C (en, 2012) * 1959-01-15
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US3802885A (en) * 1967-08-15 1974-04-09 Algraphy Ltd Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base
DE1904764A1 (de) * 1969-01-31 1970-09-10 Algraphy Ltd Positiv arbeitende lichtempfindliche Flachdruckplatten und Verfahren zu ihrer Herstellung
US3852771A (en) 1973-02-12 1974-12-03 Rca Corp Electron beam recording process
US4005437A (en) * 1975-04-18 1977-01-25 Rca Corporation Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
JPS51139402A (en) * 1975-05-24 1976-12-01 Tokyo Ouka Kougiyou Kk Positive photooresist composition
US4174222A (en) * 1975-05-24 1979-11-13 Tokyo Ohka Kogyo Kabushiki Kaisha Positive-type O-quinone diazide containing photoresist compositions
JPS5251931A (en) * 1975-10-24 1977-04-26 Tokyo Ohka Kogyo Co Ltd Novel positive type photoresist composition

Also Published As

Publication number Publication date
EP0050806A3 (en) 1982-08-18
JPS57111530A (en) 1982-07-12
EP0050806A2 (de) 1982-05-05
FI813304L (fi) 1982-04-25
US4409314A (en) 1983-10-11
CA1193275A (en) 1985-09-10
BR8106860A (pt) 1982-07-06
DE3173648D1 (en) 1986-03-13
ATE17793T1 (de) 1986-02-15
DE3040157A1 (de) 1982-06-03
EP0050806B1 (de) 1986-01-29
ZA817278B (en) 1982-09-29
FI813304A7 (fi) 1982-04-25

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