JPS5824786A - 照射加熱炉 - Google Patents
照射加熱炉Info
- Publication number
- JPS5824786A JPS5824786A JP12194681A JP12194681A JPS5824786A JP S5824786 A JPS5824786 A JP S5824786A JP 12194681 A JP12194681 A JP 12194681A JP 12194681 A JP12194681 A JP 12194681A JP S5824786 A JPS5824786 A JP S5824786A
- Authority
- JP
- Japan
- Prior art keywords
- lamp
- irradiation
- path member
- air path
- lamps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims description 35
- 238000001816 cooling Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000007789 sealing Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Landscapes
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12194681A JPS5824786A (ja) | 1981-08-05 | 1981-08-05 | 照射加熱炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12194681A JPS5824786A (ja) | 1981-08-05 | 1981-08-05 | 照射加熱炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5824786A true JPS5824786A (ja) | 1983-02-14 |
| JPS61547B2 JPS61547B2 (enrdf_load_stackoverflow) | 1986-01-09 |
Family
ID=14823828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12194681A Granted JPS5824786A (ja) | 1981-08-05 | 1981-08-05 | 照射加熱炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5824786A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS602296U (ja) * | 1983-06-20 | 1985-01-09 | ウシオ電機株式会社 | 光照射炉 |
| JPS6049626U (ja) * | 1983-09-13 | 1985-04-08 | ニチデン機械株式会社 | 赤外線加熱装置 |
-
1981
- 1981-08-05 JP JP12194681A patent/JPS5824786A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS602296U (ja) * | 1983-06-20 | 1985-01-09 | ウシオ電機株式会社 | 光照射炉 |
| JPS6049626U (ja) * | 1983-09-13 | 1985-04-08 | ニチデン機械株式会社 | 赤外線加熱装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61547B2 (enrdf_load_stackoverflow) | 1986-01-09 |
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