JPS5824786A - Irradiation heating furnace - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] The present invention relates to an irradiation heating furnace.

Of the devices generally used for heat treatment, lamps
The irradiation heating furnace that irradiates the workpiece with synchrotron radiation of 0IJ
It has several features.

l) Due to the very small heat capacity of the lamp itself, rapid increases and decreases in heating temperature are possible. .

2) By controlling the electric power supplied to the lamp, the heating temperature can be easily controlled.

3) Since it is non-contact heating using radiation light from a lamp,
It does not contaminate the object to be processed.

4) The start-up time after startup is short and the energy efficiency is high, so less energy is consumed.

5) Compared to direct current furnaces, high frequency furnaces, etc., the equipment is smaller and the cost is lower.

Irradiation heating furnaces are used for heat treatment and drying of steel materials, plastic molding, thermal property testing equipment, etc. (3). Particularly recently, processes that require heating in semiconductor manufacturing, such as impurity diffusion processes, vapor deposition processes, recovery processes for crystal defects in ion implantation layers, heat treatment processes for electrical activation, and The use of irradiation heating furnaces is being considered in place of electric furnaces, high-frequency furnaces, etc., which have been conventionally used as heating furnaces when carrying out heat treatment steps to nitride or oxidize the surface layer of Kti silicon wafers. ing. This means that in the irradiation heating furnace,
The object to be processed can be uniformly heated with a conventional heating device that does not contaminate the object to be processed or have a negative electrical effect, and consumes only a small amount of power. In order to cope with the recent increase in the area of semiconductors, the Ell radiation heating furnace has various features and is widely used in industry. However, one drawback of conventional irradiation heating furnaces is that they cannot uniformly heat a large-area workpiece at high mKM due to rapid overflow. It is a point light source with an enclosure made of quartz glass or the like, and cannot be used alone to form a surface light source with a two-dimensional spread. Although it is possible to heat a small area to a high temperature, it is not possible to heat a large area to a high temperature. For this reason, conventional irradiation heating furnaces are equipped with IIWk lamps, but if the lamps are placed close together, the temperature of the envelope will increase as the lamps have higher output. In practice, it is not possible to arrange a large number of high-output lamps at high density because the lamp life is extremely short. As a result, when the object to be treated has a large area, K
(Due to non-uniformity of irradiation intensity) heating unevenness occurs, causing deformation of the object to be treated, and the irradiation energy density in the irradiation space cannot be increased, and the upper limit of the possible heating temperature is at most 1200℃. However, there are drawbacks such as the fact that the desired treatment is impossible, and that the treatment time required to achieve the necessary heat treatment is long.

These drawbacks, especially when precisely controlled heating is required such as in the heating process in the manufacture of semiconductors, result in a large interlayer. To provide an irradiation heating furnace in which a plurality of lamps can be arranged at a high density, and therefore a large area of a workpiece can be heated with a large φ irradiation energy density with high uniformity. With the goal.

The feature of the present invention is that the transmission KtlKti! a first air duct member connected to the exhaust 111K'', a 20th air duct member connected to the exhaust 111K'', one lamp support provided near the exit of the first air duct part, and the second air duct The other lamp support is layered near the entrance of the member, and the one lamp support is attached at both ends thereof so as to face the irradiation space between the #!I air path member and the second air path member. It comprises a plurality of lamps held by a lamp support and a main mirror disposed on the opposite side of the irradiation space with respect to the lamps.

An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 shows the configuration of an irradiation heating furnace according to an embodiment of the present invention, and as shown in FIG. Main mirrors 2 and 3 are arranged to cover the upper and lower sides of the main mirrors, respectively. The reflecting surfaces KFi of each of these main mirrors 2 and 3 are formed with a plurality of semicircular grooves lined up in the lateral direction of the main mirrors 2 and 3 (in Fig. 1, it is the left and right direction, and the second In the figure, it extends over its entire length in the direction perpendicular to the plane of the paper. At the side edges of the main mirrors 2 and 3 in the lateral direction, a first
A blower 5 is connected to the first air path member 4, and a second air path member 6 is connected to the other side edge of the main mirrors 2 and 3 in the lateral direction. An exhaust fan 7 is connected to these 12 air duct members 6. @One lamp support is installed near the outlet of the first air duct member 4 and near the second air duct member 6, respectively. 8 and the other lamp support 9 are provided, and each of the lamp supports 8 and 9 has a longer bar-shaped hapgen lamp l0C extending along the gutter-like groove mK in the main mirrors 2 and 3, respectively. ) supports both ends,
Therefore, the lamp 10 is arranged so that the irradiation space is realKWJ. Further, the lamp supports 8 and 9Fi, (7) are fixed by screws 24 to side mirrors 20 and 21 having mirror surfaces on their inner surfaces, which are arranged so as to cover both sides of the dark investigation space l, As shown in FIG. 3, the upper and lower edges of each of the lamp receiving grooves 21 are formed at positions K111 corresponding to the grooves waK. , the lamp 10 is held in its sealing part 12.12 in a near-tubular part, so that the first
As shown in the figure, each sealing m12.12 of the lamp 10 is exposed outwardly, i.e. into the first air channel member 4 and the second air channel member 6. ! [12,1
The external lead 14.14 extending from the 2nd side has a current supply line 26 extending through the walls of the first air path member 4 and the second air path member 6 via an insulating material 25.25 such as Teflon. .2
Connect 6. Then, a water conduit W is formed that passes through the main mirrors 2 and 3 and the side cellars 20 and 21KH water-cooled case, specifically, the material members of the main mirrors 2 and 3 and the side mirrors 20 and 21. , connect the cooling water supply mechanism to this.

A seal 11 made of quartz glass) and this seal 11
(The conductive member 13.13 made of metal foil sealed in the sealing parts 12, 12, and the conductive member 1
3.13) External leads 1 each extending outside the envelope 11
4.14 and the conductive material 13.13 respectively.
1, a filament 16 disposed along the tube axis of the envelope 11;
7. The filament 16Fi, the non-light emitting part N
and light-emitting parts R alternately, both ends Ktj and non-light-emitting parts y
1. It has N/. To give a specific numerical example, the diameter of the main mirror 2 and 30 circular grooves is 4t120m%
Distance between centers of adjacent grooves 4. Fi21■, lamp 1
0, the outer diameter of the tubular portion of the envelope 11 is DtjlOm, and the non-light-emitting portions W at both ends of the filament 16.

The length of each N' is 37 ms, 2416
0 non-emissive mN' at both ends, length excluding N', IIi23
The rating of the 0mb lamp 10 is 230V-3200Ws.
j80 proverb, the distance between the side cellars 20 and 21 is Fi23011m, and for each groove ■, the distance MK is 1 to 2 ■displaced from the center of the semicircle related to that groove toward the bottom. A lamp 10 is arranged so that the tube axis is positioned and pressed. First air duct member 4 and 1120 air duct member 6K
The maximum air volume of all air blowers and exhaust units that are connected is 8-
It is 7 minutes long. Therefore, by lighting the lamp 10, light is emitted from the irradiation space IK clamp 0 with the addition of reflections from the main mirrors 2 and 3 and the hook mirrors 20 and 21. For example, as shown in FIG. The object to be treated is tfi! through an opening (see FIG. 2) 30. The object to be treated is heated by placing it in the irradiation space 1 using a transfer mechanism such as a conveyor so that the object can be heated.

Above structure tK Yore Mori, each lamp 10ti, 10th wind l! i
(10) Air from the blower 5 flows along the length of the enclosure 11 from one end located near the outlet of the member 4, and (10) passes through the other end located near the entrance of the second air path member 60. The wind from the exhaust fan 7 flowing along the length of the enclosure 11 and K
As a result, the entire length of the enclosure 11 is forcibly cooled, and at the same time, the main mirrors 2 and 3 are also forcibly cooled over their entire length. By making the surfaces similar to each other, even when there is an object to be processed in the irradiation space 1, and also in the case of They can always be cooled well and stably without any problems. Further, the sealing of the lamp 10 [12,
12t! Since the lamp 10 is located outside of the side flares 20 and 21, it does not receive direct light from other lamps. In the tube 11 section surrounding SN' and N', side mirrors 20 and 21. which have a water cooling mechanism are installed. and K) are retained by the lamp supports 8 and 9 cooperating therewith, so that heat conduction across the central part of the enclosure 11 of the lamp 10 is prevented, and the sealing part 12, 12 is the first air passage (1
The sealing part 1 of the lamp 0 is effectively cooled because it is exposed and located inside the first air passage member 4 and the second air passage member 6.
2. Deterioration in 12 is significantly suppressed. Therefore, even if the lamp 10 has a high output, the service life of the lamp 10 will be shortened even if the distance between adjacent lamps is shortened and the lamps 10 are densely arranged. Therefore, it is possible to arrange the III lamps 10 in a high density, and the vI number of the rod-shaped lamps 10, which alone form a #'i line light source, can be increased in a high density. By installing them side by side, you can create a large irradiation space! For the object to be treated inside, these II number of lamps 10 effectively form a surface light source, and III! By setting the relationship between the lamps 10 equally or appropriately, the illuminance distribution in the direction in which the lamps 10 are arranged can be made uniform, and as a result, even large volumes of objects can be treated. Objects can be heated with high uniformity at large irradiation energy densities.

Here, we will give an example of the temperature rise test conducted at the above-mentioned HK.
The heating temperature change when supplying 01/201600W ID power to each 5 mm 10K rating was measured by gluing a thermocouple to a 4-inch square silicone sea urchin with a thickness of 45°, and the measured temperature change was As shown in FIG.
If the temperature reaches a very high WjhK and the rated power of 3200W is supplied, the lighting will not last until 3 seconds have elapsed.
The temperature reached 1,400℃, and in each case, the surface layer of the silicon wafer melted over the entire surface within a short period of time.In this way, the fact that a temperature high enough to melt the silicon wafer can be obtained is an important characteristic of semiconductors. In the manufacturing process of #
(Very important) This makes it possible to achieve temperature increases over a large area and in a short time, which was not possible with conventional irradiation furnaces.

By the way, in the above embodiment, since the filament 16 of each lamp 1° has non-emitting @N and emitting [R] alternately, the length of the end light emitting parts R', 1' is longer than that of the other light emitting parts. If the ISR is configured with a large filament 16, the illuminance distribution in the length direction of each lamp 10 (13) will be appropriate in combination with the concave grooves of the main mirrors 2 and 3. It can be made into something. To explain specifically, according to the concrete NO clamp OK mentioned above, the tube axis of the lamp 10! D45111
The illuminance pattern at the JIII level is as shown in Figure 6 (a), where the illuminance at both ends of the filament (16) is higher than that at the center due to the longer end light emitting wings ', 1' of the filament (16). However, by combining this lamp IO with the concave groove set in the numerical example mentioned above), the illuminance pattern at the same level can be obtained as a flat and highly uniform illuminance pattern as shown in Figure 6(b)K. becomes. Therefore, the irradiation space I
In this case, irradiation is performed with uniform irradiation energy density both in the direction in which the lamps 10 are arranged side by side and in the length direction of the lamps 10.
Therefore, the entire surface of the object to be processed can be heated uniformly.

To explain yet another effect, each of the lamps IO has the following effects:
Instead of the conventional method of providing a cap at both end sealing portions and supporting the lamp through the cap, it is possible to support the lamp through the outer wall surface of the tube We near the both end sealing portions 12.12 of the enclosure 11. and supported by lamp supports 8 and 9.
(14) Therefore, the sealing parts 12, 12 can be exposed in a loincloth state, and therefore the heat dissipation from the sealing parts 12, 12 is extremely effective, and the inside of the sealing parts 12, 12 is The sealed conductive member 13.13 is prevented from being oxidized and disconnected, so that the service life of the lamp is not shortened. This effect can be reliably and significantly obtained by positioning the sealing portions 12, 12 within the cooling air passage. In addition, the lamp supports 8 and 9Fi that support the lamp 1o can be forcibly cooled by a water cooling mechanism that directly cools them, r:t, and it is possible to prevent adverse effects such as deformation due to the heat of the lamp 10. can. Supporting the lamp 10 by its tube-shaped portion in this manner means that the supported tube wall portion becomes the coldest point inside the envelope.1 In the case of a halogen lamp, the temperature of the coldest point decreases. The temperature must be approximately 120°C or higher, which is necessary to maintain the halogen cycle, but in high-output halogen lamps, the temperature at the coldest point will never drop below 120°C.
Therefore, the herogen cycle is not inhibited. In addition, (15) In the heat treatment of semiconductors in an irradiation furnace, if the lamp is equipped with a cap, dust such as adhesive shavings, etc., which are generated in large quantities, will have a huge negative effect on the characteristics of the semiconductor. It turns out, but
Since the sealing portion 12.12 can remain as a loincloth, such a problem does not occur.

As described above, the present invention has a first air path member connected to the air blower, a second air path member connected to the exhaust fan, and a second air path member provided near the outlet of the first air path member. one lamp support and the other lamp support provided near the entrance of the 20th air path member, and facing the irradiation space between the first air path member and the second air path member; This is because the structure comprises a plurality of lamps whose ends are held by the one lamp support and the other lamp support, respectively, and a main body placed on the opposite side of the irradiation space with respect to the lamps. , a plurality of lamps can be arranged at a high density, and therefore a large area of the workpiece can be heated with high uniformity and a large irradiation energy density.

[Brief explanation of the drawing]

■Sho 58-2478G (5)' Figure 1 is an explanatory sectional view showing one embodiment of the irradiation heating furnace of the present invention, and Figure 2 is an explanatory sectional view of the lamp and mirror shown in Figure 1, viewed from the side. Figure 3 shows the lamp support.
11I4 is an explanatory diagram of a lamp suitably used in the present invention, [Figure 5 is a characteristic curve diagram regarding heating temperature change in a specific device of the irradiation heating furnace of the present invention, and Figure 6 (
(a) and (b) are characteristic curve diagrams showing the illuminance pattern of the lamp shown in FIG. 4 alone and in combination with a mirror, respectively. 1... Irradiation space 2.3... Main mirror 4.
...First air path member 5...Blower 6...Second air path member 7...Blower 8.9...Lamp support 10...Herogen lamp 12... Sealing part
16... Filament 20. 21... Side mirror 23... Holder m... Concave groove leaf 2 Figure 3 Frame 3 Figure 20 (21) Reed 5 Dots Tll space (excerpt); Figure 6 (0) ) Procedural amendment C method) % formula % 1. Indication of case Patent FF156-121946 No. 2
, Title of the invention Irradiation heating furnace 3, relationship to the person who commits divine righteousness Patent applicant address 1911 Asahi Higashiminato Building, 2-6-1 Otemachi, Chiyoda-ku, Tokyo Name Ushio Denki Co., Ltd. 4, Agent 1 ) Engraving of the drawing (no changes to the content)

Claims (1)

[Claims] 1) An air path member @1 connected to the blower and an air exhaust IIK
a 20th air path member to be connected, one lamp support provided near the outlet of the first air path member, the other lamp support provided near the entrance of the second air path member, and the a plurality of lamps having both ends held by the one lamp support and the other lamp support, respectively, so as to face the irradiation space between the first air path member and the twentieth air path member; An irradiation heating furnace 0 characterized by comprising an irradiation space and a main mirror disposed opposite mK to the lamp. 2) A gutter-like groove is formed on the reflective surface of the main mirror along the longitudinal direction of the lamp. 3) A side mirror for supporting the one lamp support and the other lamp support is added.
The irradiation heating furnace according to item 1 or item 112. (2) 4) Claim 3 in which the side mirror has a water cooling mechanism
The irradiation heating furnace described in Section 1.