JPS58223323A - 電子ビ−ム描画装置 - Google Patents
電子ビ−ム描画装置Info
- Publication number
- JPS58223323A JPS58223323A JP10716582A JP10716582A JPS58223323A JP S58223323 A JPS58223323 A JP S58223323A JP 10716582 A JP10716582 A JP 10716582A JP 10716582 A JP10716582 A JP 10716582A JP S58223323 A JPS58223323 A JP S58223323A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- electron
- image
- beams
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 11
- 239000013078 crystal Substances 0.000 claims abstract description 13
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims abstract 2
- 238000000609 electron-beam lithography Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 4
- 229910025794 LaB6 Inorganic materials 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10716582A JPS58223323A (ja) | 1982-06-22 | 1982-06-22 | 電子ビ−ム描画装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10716582A JPS58223323A (ja) | 1982-06-22 | 1982-06-22 | 電子ビ−ム描画装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58223323A true JPS58223323A (ja) | 1983-12-24 |
| JPH0415609B2 JPH0415609B2 (enrdf_load_stackoverflow) | 1992-03-18 |
Family
ID=14452128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10716582A Granted JPS58223323A (ja) | 1982-06-22 | 1982-06-22 | 電子ビ−ム描画装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58223323A (enrdf_load_stackoverflow) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5332677A (en) * | 1976-09-08 | 1978-03-28 | Toshiba Corp | Electron beam exposure apparatus |
| JPS5648029A (en) * | 1979-09-26 | 1981-05-01 | Toshiba Corp | Electron gun |
| JPS56132736A (en) * | 1980-03-21 | 1981-10-17 | Toshiba Corp | Electron gun |
-
1982
- 1982-06-22 JP JP10716582A patent/JPS58223323A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5332677A (en) * | 1976-09-08 | 1978-03-28 | Toshiba Corp | Electron beam exposure apparatus |
| JPS5648029A (en) * | 1979-09-26 | 1981-05-01 | Toshiba Corp | Electron gun |
| JPS56132736A (en) * | 1980-03-21 | 1981-10-17 | Toshiba Corp | Electron gun |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0415609B2 (enrdf_load_stackoverflow) | 1992-03-18 |
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