JPH0415609B2 - - Google Patents

Info

Publication number
JPH0415609B2
JPH0415609B2 JP57107165A JP10716582A JPH0415609B2 JP H0415609 B2 JPH0415609 B2 JP H0415609B2 JP 57107165 A JP57107165 A JP 57107165A JP 10716582 A JP10716582 A JP 10716582A JP H0415609 B2 JPH0415609 B2 JP H0415609B2
Authority
JP
Japan
Prior art keywords
cathode
electron
electron beam
aperture mask
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57107165A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58223323A (ja
Inventor
Isao Sasaki
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP10716582A priority Critical patent/JPS58223323A/ja
Publication of JPS58223323A publication Critical patent/JPS58223323A/ja
Publication of JPH0415609B2 publication Critical patent/JPH0415609B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10716582A 1982-06-22 1982-06-22 電子ビ−ム描画装置 Granted JPS58223323A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10716582A JPS58223323A (ja) 1982-06-22 1982-06-22 電子ビ−ム描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10716582A JPS58223323A (ja) 1982-06-22 1982-06-22 電子ビ−ム描画装置

Publications (2)

Publication Number Publication Date
JPS58223323A JPS58223323A (ja) 1983-12-24
JPH0415609B2 true JPH0415609B2 (enrdf_load_stackoverflow) 1992-03-18

Family

ID=14452128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10716582A Granted JPS58223323A (ja) 1982-06-22 1982-06-22 電子ビ−ム描画装置

Country Status (1)

Country Link
JP (1) JPS58223323A (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5332677A (en) * 1976-09-08 1978-03-28 Toshiba Corp Electron beam exposure apparatus
JPS5648029A (en) * 1979-09-26 1981-05-01 Toshiba Corp Electron gun
JPS56132736A (en) * 1980-03-21 1981-10-17 Toshiba Corp Electron gun

Also Published As

Publication number Publication date
JPS58223323A (ja) 1983-12-24

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