JPS58213456A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS58213456A
JPS58213456A JP57095917A JP9591782A JPS58213456A JP S58213456 A JPS58213456 A JP S58213456A JP 57095917 A JP57095917 A JP 57095917A JP 9591782 A JP9591782 A JP 9591782A JP S58213456 A JPS58213456 A JP S58213456A
Authority
JP
Japan
Prior art keywords
ground
output
conductive
input
conductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57095917A
Other languages
Japanese (ja)
Other versions
JPS6327859B2 (en
Inventor
Osamu Shiozaki
修 塩崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57095917A priority Critical patent/JPS58213456A/en
Publication of JPS58213456A publication Critical patent/JPS58213456A/en
Publication of JPS6327859B2 publication Critical patent/JPS6327859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6644Packaging aspects of high-frequency amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Abstract

PURPOSE:To reduce a parasitic reactance section in a ground section by forming a conductor layer for ground between a conductor layer for an output and a conductor layer for an input and connecting the conductor layer for ground to an external ground surface through a through-hole formed to a dielectric substrate. CONSTITUTION:Pairs in which the conductor layers 20, 22 for outputs, semiconductor chips 40, 42 and the conductor layers 12, 14 for inputs are arranged rectilineraly onto the dielectric substrate 10 are seperated mutually into a plurality of pairs in parallel. The conductor layers 32, 34 for ground used in common to each pair are formed among the conductor layers 20, 22 for outputs and the conductor layers 12, 14 for inputs of each pair. The conductor layers 36, 38 for ground are connected to the external ground surface through the through-holes 36, 38 formed to the dielectric substrate 10, and each electrode of the semiconductor chips 40, 42 is severally connected electrically to corresponding conductor layers.

Description

【発明の詳細な説明】 本発明は高周波帯で使用する半導体装置、特に2個以上
のトランジスタチップを1個のパッケージ内に実装した
高出力用半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device used in a high frequency band, and particularly to a high output semiconductor device in which two or more transistor chips are mounted in one package.

VHF帯及びUHF帯での高周波高出力トランジスタ分
野は埃在著しい進歩を続けており数100Wを越える電
力を出力出来るものが現われている。
The field of high-frequency, high-output transistors in the VHF and UHF bands continues to make remarkable progress, and devices capable of outputting power exceeding several 100 W have appeared.

こうした高出力化の傾向に対してこれを達成する方法は
S従来の技術では、多数のトランジスタチ、プを1つの
パッケージ内に納め、これらを並列に配置することであ
った。
The conventional technique for achieving this trend toward higher output has been to house a large number of transistor chips in one package and arrange them in parallel.

しかしこの構造はトランジスタチップとパッケージ内の
導線(ボンディング線)に関連する寄生リアクタンスが
トランジスタの入出力インピーダンスレベルを低下させ
てトランジスタの動作帯減幅を狭め、パワーロスを引き
起し、究極的にはインピーダンス整合能力に悪影智な与
えるという欠点があった。
However, with this structure, the parasitic reactance associated with the transistor chip and the conductive wires (bonding wires) inside the package lowers the transistor's input/output impedance level, narrows the transistor's operating band width, causes power loss, and ultimately It has the disadvantage of having a negative impact on impedance matching ability.

したがって本発明の目的唸良好なインピーダンスレベル
を有する半導体装置の構造を提供する仁とにあシ、広い
帯域幅、大電力及び外部回路の簡略化を満足できる高い
入出力インピーダンスを有する半導体装置が得られる。
Therefore, it is an object of the present invention to provide a semiconductor device structure having a good impedance level, and to provide a semiconductor device having a high input/output impedance that satisfies wide bandwidth, high power, and simplification of external circuits. It will be done.

本発明の半導体装置祉容器内に少なくとも1個の誘電体
部材と、この誘電体部材上に夫々分離して設けられた第
1の伝導入力部と第2の伝導入力部よシなる1対の入力
部分と、前記誘電体部材上に夫々分離して設けられた第
1の伝導出力部と第2の伝導出力部よりなる1対の出力
部分と、第1のトランジスタチップを搭載した第1のメ
タライズパターンと、第2のトランジスタチップ搭載し
た第2のメタライズパターンとを有し、前記第1の伝導
入力部、第1のトランジスタチップ、第1の伝導出力部
は一直線状に配植され、同様に前記第2の伝導入力部、
第2のトランジスタチップ、第2の伝導出力部も並行し
て一直線状に配置される。第1および第2のトランジス
タチップの各入力、出力電極は対向する伝導入力部およ
び伝導出力部とボンティング線によって接続される。さ
らに前記1対の入力部分かつ前記1対の出力部分との間
には前記第1および第2のトランジスタチップをはさむ
ように1対の伝導接地部分が設けられ、この1対の伝導
接地部分は前記誘電体部材上に設けられ、スルーホール
によシ外部接地面と接続されている。前記第1および第
2のトランジスタチ、プの接地1−極(共通電極)は前
記1対の伝導接地部分にボンディング接続されるが、そ
のボンディング線は伝導入力部および伝導出力部を結ぶ
直線と平りにカるように設けられる。
The semiconductor device storage container of the present invention includes at least one dielectric member, and a pair of conductive input portions and a second conductive input portion separately provided on the dielectric member. an input portion, a pair of output portions consisting of a first conductive output portion and a second conductive output portion provided separately on the dielectric member, and a first conductive output portion on which a first transistor chip is mounted. and a second metallization pattern carrying a second transistor chip, wherein the first conductive input part, the first transistor chip, and the first conductive output part are arranged in a straight line, and the first conductive input part, the first transistor chip, and the first conductive output part are arranged in a straight line. the second conductive input section;
A second transistor chip and a second conductive output are also arranged in parallel and in a straight line. Each input and output electrode of the first and second transistor chips is connected to an opposing conductive input and conductive output by a bonding wire. Further, a pair of conductive ground portions are provided between the pair of input portions and the pair of output portions so as to sandwich the first and second transistor chips, and the pair of conductive ground portions are It is provided on the dielectric member and connected to the external ground plane through a through hole. The ground terminals (common electrodes) of the first and second transistor chips are bonded to the conductive ground portions of the pair, and the bonding line is a straight line connecting the conductive input portion and the conductive output portion. It is set up so that it lies flat.

本発明の半導体装置は基本的には上記栴造を満足するも
のであれはよいが、望ましくは1対の伝導接地部分に関
して伝導入力部と伝導出力部とが対象に配置される方が
よい。オた、前記第1および第2のトランジスタチップ
が前111L第1および第2の伝導出力部上に載置され
る場合には、伝導接地部は1対にはならず、伝導入力部
と伝導出力部との間にこれらを分′鵬するように設けれ
ばよい。
Although the semiconductor device of the present invention basically satisfies the above-mentioned principle, it is preferable that the conductive input portion and the conductive output portion be arranged symmetrically with respect to a pair of conductive ground portions. Additionally, when the first and second transistor chips are placed on the first and second conduction output parts of the front 111L, the conduction ground parts are not paired, and the conduction input part and the conduction ground part are not paired. These may be provided so as to be separated from the output section.

更に、トランジスタチップ上の電極が伝導接地部を介し
てボンディング接続される状態では、その伝導接地部を
またいでその上にボンティング線を橋絡するように製造
する。
Further, in a state where the electrodes on the transistor chip are bonded and connected via the conductive ground part, the bonding wire is manufactured so as to bridge the conductive ground part and over it.

本発明によれば複数のトランジスタチップを1つの容器
内に収納してなる大電力用の半導体装置において、各ト
ランジスタチップに関係する伝導入力部および伝導出力
部は夫々−直線状に配置され、これを横切るように伝導
接地部が設けられ、この伝導接地部は全部のトランジス
タチップに対して動作上共用されるように工夫されてい
る。さらに、伝導接地部はスルーホールを介して外部接
地面に接続されている。これによシ、高入出力インピー
ダンス、広帯域特性が得られ、かつ寄生リアクタンスも
著しく低減することができる。とくに1共通の伝導接地
部分にスルーホールを設けると、トランジスタチップの
複数個の接地用型、極パ、ドがボンディング線等によ如
伝導接地部分に接続されて、そのスルーホールを介して
トランジスタチップの複数個の接地用電極パッドと外部
接地面との電気長をtx tx等しくできる利点がある
。これによって高周波動作の安定化、高出力化、高利得
化を達成することが可能となる。゛ 即ち本発明は共通の熱伝導性の無い誘電体に固定された
2個以上のトランジスタチップがプツシ、プル回路形式
を容易に構成できるような半導体装置を得ることができ
る。ζこでトランジスタチップの面積が同一の場合、本
発明に基づく半導体装置をプ、シープル回路方式にて利
用することによって、従来の単なる並列トランジスタ方
式に比較して入力インピーダンスと出力インピーダンス
がいずれも4倍となる。本発明の実装技術を使用すると
、入力インピーダンス、出力インピーダンスともに高い
ことKよシ回路構成が簡単になシ、パワーロスが減少し
その結果電力レベルが高くなると共に帯域幅が広くなる
According to the present invention, in a high-power semiconductor device in which a plurality of transistor chips are housed in one container, conductive input portions and conductive output portions related to each transistor chip are arranged in a straight line, respectively. A conductive ground portion is provided across the transistor chip, and this conductive ground portion is designed to be operationally shared by all transistor chips. Furthermore, the conductive ground portion is connected to the external ground plane via a through hole. As a result, high input/output impedance and broadband characteristics can be obtained, and parasitic reactance can also be significantly reduced. In particular, if a through hole is provided in a common conductive grounding part, multiple grounding molds, poles, and electrodes of the transistor chip are connected to the conductive grounding part by bonding wires, etc., and the transistors are connected through the through hole. There is an advantage that the electrical lengths of the plurality of ground electrode pads of the chip and the external ground plane can be equal to tx tx. This makes it possible to stabilize high frequency operation, increase output, and increase gain. That is, the present invention can provide a semiconductor device in which two or more transistor chips fixed to a common dielectric with no thermal conductivity can easily constitute a push/pull circuit type. ζIf the area of the transistor chip is the same, by using the semiconductor device based on the present invention in the double circuit system, the input impedance and output impedance are both 4. It will be doubled. Using the implementation technique of the present invention, both high input and output impedances result in simple circuit construction, reduced power loss, and resulting in higher power levels and wider bandwidths.

以下図面を用いて本発明の一実施例を詳細に説明する。An embodiment of the present invention will be described in detail below with reference to the drawings.

本実施例のトランジスタパッケージは熱伝導性の良いベ
リリア等のセラミ、り製のウェハー10を有し、この上
には公知の金属化技術に従って独立した金属部分または
パッドが被着されている。この金属部分は1対の入力部
分12.14を含む。入力端子16.18はそれぞれ金
属入力部分12.14に取シ付けられている。1対の出
力部分20.22もまたウェハー10に被着されている
。出力部分20.22の長軸は入力部分12.14の対
応する長軸にはげ一致してbる。出力端子24.26は
それぞれ出力部分20.22に取り付けられている。さ
らに1対のトランジスタチップ搭載用のメタライズ部分
28.30もまたウェハー10に被着されている。ここ
でメタライズ部分28は入出力部分12.20の間に、
またメタライズ部分30は入出力部分14.22の間に
配置されている。共通接地面は本例の場合は1対の全極
接地部分32.34からなる。これら接地部分はウェハ
ー10の上に被着され入力部分と出力部分の間にあシ入
出力部分の長軸方向に対してほぼ垂直の位置関係となっ
ている。さらに共通の接地部分32.34にはウェハー
10に設けられたスルーホール36..38によシウェ
ハ−10に取シ付けられた外部接地面との電気的接続を
可能にしでいる。即ち上記接続を可能にする為、スルー
ホール36.38の内側にはメタライズがウェハー10
の下面に至るまで施されている。さらにメタライズ部分
28.30上にそれぞれ1対のトランジスタチップ40
,42がマウントされ、チ、プ上の入力用軍、極パッド
及び接地用電極パッドはボンディングワイヤ44によっ
て、入力用電極イ(、ド′は入力部分12.14に接続
され、接地用を極パ、ドは接地部分32.34に接続さ
れている0 かかる構造によって、接地部での寄生リアクタンス分は
著しく減少し、同時に入出力間での浮遊各1も減少する
。また隣り合うトランジスタチップ相互間に生じる信号
もれや干渉等も有効に防止することができる。この結果
、電力損失が少なく、広帯域化、高利得化、高入出力イ
ンピーダンス化を達成することができる。
The transistor package of this embodiment includes a wafer 10 made of a highly thermally conductive ceramic such as beryllia, on which separate metal portions or pads are deposited according to known metallization techniques. This metal part includes a pair of input parts 12.14. Input terminals 16.18 are each attached to metal input portion 12.14. A pair of output portions 20.22 are also deposited on the wafer 10. The long axis of the output section 20.22 coincides with the corresponding long axis of the input section 12.14. Output terminals 24.26 are each attached to output portion 20.22. Furthermore, metallization portions 28, 30 for mounting a pair of transistor chips are also deposited on the wafer 10. Here, the metallized part 28 is between the input and output parts 12.20,
The metallized portion 30 is also arranged between the input and output portions 14.22. The common ground plane in this example consists of a pair of all-pole ground sections 32,34. These grounding portions are deposited on the wafer 10 and are located between the input portion and the output portion in a positional relationship substantially perpendicular to the longitudinal axis of the input and output portions. Further, the common ground portion 32.34 has through holes 36.34 provided in the wafer 10. .. 38 allows for electrical connection to an external ground plane attached to the wafer 10. That is, in order to make the above connection possible, metallization is placed inside the through holes 36 and 38 on the wafer 10.
It is applied all the way to the bottom of the. Furthermore, a pair of transistor chips 40 are placed on each of the metallized portions 28 and 30.
. The pads and gates are connected to the ground portions 32 and 34. With this structure, the parasitic reactance at the ground portion is significantly reduced, and at the same time the stray 1 between the input and output is also reduced. It is also possible to effectively prevent signal leakage, interference, etc. that occur between the two.As a result, it is possible to achieve a wide band, high gain, and high input/output impedance with little power loss.

尚、トランジスタチップ40.42を出力用導電部分の
上に載置する時は接地部1部分34を省略できる。
Incidentally, when the transistor chips 40, 42 are placed on the output conductive portion, the ground portion 1 portion 34 can be omitted.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例による半導体装置の構成図を
示す。 10・・・・・・ベリリア等のモツミックウェハー、1
2゜14・・・・・・1対の入力用導電部分、16.1
8・・・・・・1対の入力用引き出しリード、20.2
2・・・・・・1対の出力用導電部分、24.26・・
・・・・1対の出力用引き出しリード、28.30・・
・・・・1対のトランジスタ搭載用メタライズ部、32
.34・・・・・・共通の接地導電部分、36,38・
・・・・・スルーホール、40.42・・・・・・1対
のトランジスタチップ、44・・・・・・ボンディング
ワイヤ。 括 / l
FIG. 1 shows a configuration diagram of a semiconductor device according to an embodiment of the present invention. 10... Motsumic wafer such as beryllia, 1
2゜14...Pair of conductive parts for input, 16.1
8...1 pair of input pull-out leads, 20.2
2... A pair of output conductive parts, 24.26...
...1 pair of output pull-out leads, 28.30...
...metalized part for mounting a pair of transistors, 32
.. 34... Common ground conductive part, 36, 38.
...Through hole, 40.42...Pair of transistor chips, 44...Bonding wire. Bracket / l

Claims (1)

【特許請求の範囲】[Claims] 誘電体基板上に出力用導体層、半導体チップおよび入力
用導体層が直線状に配置された組を互いに分離して並列
に複数組設け、各組に対して共通に用いられる接地用導
体階を前記各組の前記出力用導体層と前記入力用導体層
との間に設け、当該接地用導体層は前記誘電体基板に設
けられたスルーホールを介して外部接地面と接続され、
前記半導体チップの各電極は夫々対応する導体層と電気
的に接続されていることを特徴とする半導体装置。
A plurality of sets in which an output conductor layer, a semiconductor chip, and an input conductor layer are arranged linearly on a dielectric substrate are separated from each other and arranged in parallel, and a grounding conductor layer commonly used for each set is provided. provided between the output conductor layer and the input conductor layer of each set, the ground conductor layer being connected to an external ground plane via a through hole provided in the dielectric substrate;
A semiconductor device, wherein each electrode of the semiconductor chip is electrically connected to a corresponding conductor layer.
JP57095917A 1982-06-04 1982-06-04 Semiconductor device Granted JPS58213456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57095917A JPS58213456A (en) 1982-06-04 1982-06-04 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57095917A JPS58213456A (en) 1982-06-04 1982-06-04 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS58213456A true JPS58213456A (en) 1983-12-12
JPS6327859B2 JPS6327859B2 (en) 1988-06-06

Family

ID=14150624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57095917A Granted JPS58213456A (en) 1982-06-04 1982-06-04 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS58213456A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4984065A (en) * 1989-01-11 1991-01-08 Kabushiki Kaisha Toshiba Hybrid resin-sealed semiconductor device
EP0598563A2 (en) * 1992-11-18 1994-05-25 Fuji Electric Co. Ltd. Semiconductor conversion device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56104146U (en) * 1980-01-08 1981-08-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56104146U (en) * 1980-01-08 1981-08-14

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4984065A (en) * 1989-01-11 1991-01-08 Kabushiki Kaisha Toshiba Hybrid resin-sealed semiconductor device
EP0598563A2 (en) * 1992-11-18 1994-05-25 Fuji Electric Co. Ltd. Semiconductor conversion device
EP0598563A3 (en) * 1992-11-18 1995-05-17 Fuji Electric Co Ltd Semiconductor conversion device.
EP0713251A2 (en) * 1992-11-18 1996-05-22 Fuji Electric Co. Ltd. Semiconductor conversion device
EP0713251A3 (en) * 1992-11-18 1996-08-14 Fuji Electric Co Ltd Semiconductor conversion device
US5576575A (en) * 1992-11-18 1996-11-19 Fuji Electric Co., Ltd. Semiconductor conversion device

Also Published As

Publication number Publication date
JPS6327859B2 (en) 1988-06-06

Similar Documents

Publication Publication Date Title
US5371405A (en) High-frequency high-power transistor
US3784883A (en) Transistor package
TW533562B (en) Power transistor package with integrated flange for surface mount heat removal
US5521431A (en) Semiconductor device with lead frame of molded container
KR20010080542A (en) High frequency power transistor divice
US4393392A (en) Hybrid transistor
EP0015709B1 (en) Constructional arrangement for semiconductor devices
WO2001056083A2 (en) Ldmos power package with a plurality of ground signal paths
EP0117434A1 (en) Hybrid microwave subsystem
JP2001502845A (en) RF power package with double grounding
US6094114A (en) Slotline-to-slotline mounted flip chip
JPS58213456A (en) Semiconductor device
JPH11330298A (en) Package provided with signal terminal and electronic device using the package
US5258646A (en) Package for microwave IC
JPS59112701A (en) Microwave integrated circuit
JPS6255721B2 (en)
JP4162819B2 (en) High frequency circuit equipment
JP2534841B2 (en) Envelope for microwave integrated circuit
JPS6031103B2 (en) High power transistor device for high frequency
JP2561036B2 (en) Semiconductor device package
JPS595640A (en) Semiconductor device
JPH07226489A (en) Microwave semiconductor device
JP3096046B2 (en) Microwave semiconductor device
JPH03217103A (en) Semiconductor device
JPS5861652A (en) Semiconductor device