JPS6327859B2 - - Google Patents

Info

Publication number
JPS6327859B2
JPS6327859B2 JP57095917A JP9591782A JPS6327859B2 JP S6327859 B2 JPS6327859 B2 JP S6327859B2 JP 57095917 A JP57095917 A JP 57095917A JP 9591782 A JP9591782 A JP 9591782A JP S6327859 B2 JPS6327859 B2 JP S6327859B2
Authority
JP
Japan
Prior art keywords
metal layer
input
output
conductive
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57095917A
Other languages
Japanese (ja)
Other versions
JPS58213456A (en
Inventor
Osamu Shiozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57095917A priority Critical patent/JPS58213456A/en
Publication of JPS58213456A publication Critical patent/JPS58213456A/en
Publication of JPS6327859B2 publication Critical patent/JPS6327859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6644Packaging aspects of high-frequency amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Amplifiers (AREA)

Description

【発明の詳細な説明】 本発明は高周波帯で使用する半導体装置、特に
2個以上のトランジスタチツプを1個のパツケー
ジ内に実装した高出力用半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device used in a high frequency band, and particularly to a high output semiconductor device in which two or more transistor chips are mounted in one package.

VHF帯及びUHF帯での高周波高出力トランジ
スタ分野は現在著しい進歩を続けており数100W
を越える電力を出力出来るものが現われている。
こうした高出力化の傾向に対してこれを達成する
方法は、従来の技術では、多数のトランジスタチ
ツプを1つのパツケージ内に納め、これらを並列
に配置することであつた。
The field of high-frequency, high-power transistors in the VHF and UHF bands is currently making remarkable progress, and is now several hundred W.
There are now devices that can output power exceeding this amount.
In the prior art, the way to achieve this trend toward higher output power has been to house a large number of transistor chips in one package and arrange them in parallel.

しかしこの構造はトランジスタチツプとパツケ
ージ内の導線(ボンデイング線)に関連する寄生
リアクタンスがトランジスタの入出力インピーダ
ンスレベルを低下させてトランジスタの動作帯減
幅を狭め、パワーロスを引き起し、究極的にはイ
ンピーダンス整合能力に悪影響を与えるという欠
点があつた。
However, with this structure, the parasitic reactance associated with the transistor chip and the conductive wires (bonding wires) inside the package lowers the transistor's input/output impedance level, narrows the transistor's operating band width, causes power loss, and ultimately This had the disadvantage of adversely affecting impedance matching ability.

したがつて本発明の目的は良好なインピーダン
スレベルを有する半導体装置の構造を提供するこ
とにあり、広い帯域幅、大電力及び外部回路の簡
略化を満足できる高い入出力インピーダンスを有
する半導体装置が得られる。
Therefore, an object of the present invention is to provide a structure of a semiconductor device having a good impedance level, and it is possible to obtain a semiconductor device having a high input/output impedance that satisfies wide bandwidth, high power, and simplification of external circuits. It will be done.

本発明の半導体装置は容器内に少なくとも1個
の誘電体部材と、この誘電体部材上に夫々分離し
て設けられた第1の伝導入力部と第2の伝導入力
部よりなる1対の入力部分と、前記誘電体部材上
に夫々分離して設けられた第1の伝導出力部と第
2の伝導出力部よりなる1対の出力部分と、第1
のトランジスタチツプを搭載した第1のメタライ
ズパターンと、第2のトランジスタチツプ搭載し
た第2のメタライズパターンとを有し、前記第1
の伝導入力部、第1のトランジスタチツプ、第1
の伝導出力部は一直線状に配置され、同様に前記
第2の伝導入力部、第2のトランジスタチツプ、
第2の伝導出力部も並行して一直線状に配置され
る。第1および第2のトランジスタチツプの各入
力、出力電極は対向する伝導入力部および伝導出
力部とボンデイング線によつて接続される。さら
に前記1対の入力部分かつ前記1対の出力部分と
の間には前記第1および第2のトランジスタチツ
プをはさむように1対の伝導接地部分が設けら
れ、この1対の伝導接地部分は前記誘電体部材上
に設けられ、スルーホールにより外部接地面と接
続されている。前記第1および第2のトランジス
タチツプの接地電極(共通電極)は前記1対の伝
導接地部分にボンデイング接続されるが、そのボ
ンデイング線は伝導入力部および伝導出力部を結
ぶ直線と平行になるように設けられる。
The semiconductor device of the present invention includes at least one dielectric member in a container, and a pair of inputs comprising a first conductive input section and a second conductive input section separately provided on the dielectric member. a pair of output parts each consisting of a first conduction output part and a second conduction output part provided separately on the dielectric member, and a first conduction output part;
a first metallized pattern on which a transistor chip is mounted, and a second metallized pattern on which a second transistor chip is mounted;
a conductive input of a first transistor chip;
The conductive outputs of the transistor chips are arranged in a straight line, and likewise the second conductive inputs, the second transistor chip,
The second conducting output is also arranged in parallel and in a straight line. Each input and output electrode of the first and second transistor chips is connected to an opposing conductive input and conductive output by a bonding line. Furthermore, a pair of conductive ground portions are provided between the pair of input portions and the pair of output portions so as to sandwich the first and second transistor chips, and the pair of conductive ground portions are It is provided on the dielectric member and connected to an external ground plane through a through hole. The ground electrodes (common electrodes) of the first and second transistor chips are bonded to the pair of conductive ground portions, and the bonding line is parallel to a straight line connecting the conductive input portion and the conductive output portion. established in

本発明の半導体装置は基本的には上記構造を満
足するものであればよいが、望ましくは1対の伝
導接地部分に関して伝導入力部と伝導出力部とが
対象に配置される方がよい。また、前記第1およ
び第2のトランジスタチツプが前記第1および第
2の伝導出力部上に載置される場合には、伝導接
地部は1対にはならず、伝導入力部と伝導出力部
との間にこれらを分断するように設ければよい。
更に、トランジスタチツプ上の電極が伝導接地部
を介してボンデイング接続される状態では、その
伝導接地部をまたいでその上にボンデイング線を
橋絡するように製造する。
Basically, the semiconductor device of the present invention may have any structure as long as it satisfies the above structure, but it is preferable that the conductive input section and the conductive output section are arranged symmetrically with respect to a pair of conductive ground portions. Further, when the first and second transistor chips are placed on the first and second conductive output parts, the conductive ground parts are not paired, but the conductive input part and the conductive output part These may be separated between the two.
Furthermore, when the electrodes on the transistor chip are bonded together via a conductive ground, a bonding line is fabricated to bridge the conductive ground.

本発明によれば複数のトランジスタチツプを1
つの容器内に収納してなる大電力用の半導体装置
において、各トランジスタチツプに関係する伝導
入力部および伝導出力部は夫々一直線状に配置さ
れ、これを横切るように伝導接地部が設けられ、
この伝導接地部は全部のトランジスタチツプに対
して動作上共用されるように工夫されている。さ
らに、伝導接地部はスルーホールを介して外部接
地面に接続されている。これにより、高入出力イ
ンピーダンス、広帯域特性が得られ、かつ寄生リ
アクタンスも著しく低減することができる。とく
に、共通の伝導接地部分にスルーホールを設ける
と、トランジスタチツプの複数個の接地用電極パ
ツドがボンデイング線等により伝導接地部分に接
続されて、そのスルーホールを介してトランジス
タチツプの複数個の接地用電極パツドと外部接地
面との電気長をほぼ等しくできる利点がある。こ
れによつて高周波動作の安定化、高出力化、高利
得化を達成することが可能となる。
According to the present invention, a plurality of transistor chips can be combined into one
In a high-power semiconductor device housed in a single container, a conduction input section and a conduction output section related to each transistor chip are arranged in a straight line, and a conduction ground section is provided to cross this.
This conductive ground portion is designed to be operationally shared by all transistor chips. Furthermore, the conductive ground portion is connected to the external ground plane via a through hole. As a result, high input/output impedance and broadband characteristics can be obtained, and parasitic reactance can also be significantly reduced. In particular, if a through hole is provided in a common conductive grounding part, multiple grounding electrode pads of a transistor chip are connected to the conductive grounding part by bonding wires, etc. There is an advantage that the electrical length of the external electrode pad and the external ground plane can be made almost equal. This makes it possible to stabilize high frequency operation, increase output, and increase gain.

即ち本発明は共通の熱伝導性の高い誘電体に固
定された2個以上のトランジスタチツプがプツシ
ユプル回路形式を容易に構成できるような半導体
装置を得ることができる。ここでトランジスタチ
ツプの面積が同一の場合、本発明に基づく半導体
装置をプツシユプル回路方式にて利用することに
よつて、従来の単なる並列トランジスタ方式に比
較して入力インピーダンスと出力インピーダンス
がいずれも4倍となる。本発明の実装技術を使用
すると、入力インピーダンス、出力インピーダン
スともに高いことにより回路構成が簡単になり、
パワーロスが減少しその結果電力レベルが高くな
ると共に帯域幅が広くなる。
That is, the present invention can provide a semiconductor device in which two or more transistor chips fixed to a common dielectric having high thermal conductivity can easily constitute a push-pull circuit type. Here, when the area of the transistor chip is the same, by using the semiconductor device based on the present invention in a push-pull circuit system, both the input impedance and the output impedance are four times as large as those using the conventional simple parallel transistor system. becomes. When the mounting technology of the present invention is used, the circuit configuration is simplified due to the high input impedance and output impedance.
Power losses are reduced resulting in higher power levels and wider bandwidth.

以下図面を用いて本発明の一実施例を詳細に説
明する。本実施例のトランジスタパツケージは熱
伝導性の良いベリリア等のセラミツク製のウエハ
ー10を有し、この上には公知の金属化技術に従
つて独立した金属部分またはパツドが被着されて
いる。この金属部分は1対の入力部分12,14
を含む。入力端子16,18はそれぞれ金属入力
部分12,14に取り付けられている。1対の出
力部分20,22もまたウエハー10に被着され
ている。出力部分20,22の長軸は入力部分1
2,14の対応する長軸にほぼ一致している。出
力端子24,26はそれぞれ出力部分20,22
に取り付けられている。さらに1対のトランジス
タチツプ搭載用のメタライズ部分28,30もま
たウエハー10に被着されている。ここでメタラ
イズ部分28は入出力部分12,20の間に、ま
たメタライズ部分30は入出力部分14,22の
間に配置されている。共通接地面は本例の場合は
1対の金属接地部分32,34からなる。これら
接地部分はウエハー10の上に被着され入力部分
と出力部分の間にあり入出力部分の長軸方向に対
してほぼ垂直の位置関係となつている。さらに共
通の接地部分32,34にはウエハー10に設け
られたスルーホール36,38によりウエハー1
0に取り付けられた外部接地面との電気的接続を
可能にしている。即ち上記接続を可能にする為、
スルーホール36,38の内側にはメタライズが
ウエハー10の下面に至るまで施されている。さ
らにメタライズ部分28,30上にそれぞれ1対
のトランジスタチツプ40,42がマウントさ
れ、チツプ上の入力用電極パツド及び接地用電極
パツドはボンデイングワイヤ44によつて、入力
用電極パツドは入力部分12,14に接続され、
接地用電極パツドは接地部分32,34に接続さ
れている。
An embodiment of the present invention will be described in detail below with reference to the drawings. The transistor package of this embodiment includes a wafer 10 made of a thermally conductive ceramic, such as beryllia, on which separate metal parts or pads are deposited according to known metallization techniques. This metal part is a pair of input parts 12, 14.
including. Input terminals 16 and 18 are attached to metal input portions 12 and 14, respectively. A pair of output portions 20, 22 are also deposited on wafer 10. The long axis of the output parts 20 and 22 is the input part 1
It almost coincides with the corresponding long axes of Nos. 2 and 14. Output terminals 24 and 26 are connected to output portions 20 and 22, respectively.
is attached to. Furthermore, a pair of metallized portions 28, 30 for mounting transistor chips are also deposited on the wafer 10. Here, the metallized part 28 is arranged between the input and output parts 12 and 20, and the metallized part 30 is arranged between the input and output parts 14 and 22. The common ground plane in this example consists of a pair of metal ground portions 32,34. These grounding portions are deposited on the wafer 10 and are located between the input portion and the output portion and are positioned approximately perpendicular to the longitudinal direction of the input and output portions. Further, through holes 36 and 38 provided in the wafer 10 are provided in the common ground portions 32 and 34 to connect the wafer 1
0 to allow electrical connection to an external ground plane attached to the ground plane. In other words, in order to enable the above connection,
Metallization is applied inside the through holes 36 and 38 up to the bottom surface of the wafer 10. Furthermore, a pair of transistor chips 40 and 42 are mounted on the metallized parts 28 and 30, respectively, and the input electrode pad and the ground electrode pad on the chip are connected to each other by bonding wires 44, and the input electrode pad is connected to the input part 12, connected to 14,
A grounding electrode pad is connected to the grounding portions 32,34.

かかる構造によつて、接地部での寄生リアクタ
ンス分は著しく減少し、同時に入出力間での浮遊
容量も減少する。また隣り合うトランジスタチツ
プ相互間に生じる信号もれや干渉等を有効に防止
することができる。この結果、電力損失が少な
く、広帯域化、高利得化、高入出力インピーダン
ス化を達成することができる。
With this structure, the parasitic reactance at the ground portion is significantly reduced, and at the same time, the stray capacitance between the input and output is also reduced. Furthermore, signal leakage and interference between adjacent transistor chips can be effectively prevented. As a result, it is possible to achieve a wide band, high gain, and high input/output impedance with little power loss.

尚、トランジスタチツプ40,42を出力用導
電部分の上に載置する時は接地導電部分34を省
略できる。
Incidentally, when the transistor chips 40, 42 are placed on the output conductive part, the ground conductive part 34 can be omitted.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例による半導体装置の
構成図を示す。 10……ベリリア等のセラミツクウエハー、1
2,14……1対の入力用導電部分、16,18
……1対の入力用引き出しリード、20,22…
…1対の出力用導電部分、24,26……1対の
出力用引き出しリード、28,30……1対のト
ランジスタ搭載用メタライズ部、32,34……
共通の接地導電部分、36,38……スルーホー
ル、40,42……1対のトランジスタチツプ、
44……ボンデイングワイヤ。
FIG. 1 shows a configuration diagram of a semiconductor device according to an embodiment of the present invention. 10...ceramic wafer such as beryllia, 1
2, 14...a pair of conductive parts for input, 16, 18
...One pair of input pull-out leads, 20, 22...
...1 pair of output conductive parts, 24, 26...1 pair of output lead-out leads, 28, 30...1 pair of transistor mounting metallized parts, 32, 34...
common ground conductive part, 36, 38... through hole, 40, 42... a pair of transistor chips,
44...Bonding wire.

Claims (1)

【特許請求の範囲】[Claims] 誘電体基板上に、直線上に配置して形成された
出力用金属層、半導体チツプ載置用金属層と入力
用金属層との組を有し、該出力用、半導体チツプ
載置用および入力用の各金属層の組は複数組が並
列に同じ順序で配置されており、各組の前記入力
用金属層と前記半導体チツプ載置用金属層との間
の前記誘電体基板には連続する共通の接地用金属
層が設けられ、各組の前記入力用金属層と各組の
前記半導体チツプ載置用金属層とは前記接地用金
属層によつて直接対面しないようになされてお
り、且つ前記接地用金属層は該接地用金属層が設
けられた部分の前記誘電体基板に形成されたスル
ーホールを介して接地用電位が与えられており、
各組の半導体チツプ載置用金属層に取り付けられ
る半導体チツプの入力電極および出力電極はそれ
ぞれ各組の入力用金属層および出力用金属層に電
気的に接続されていることを特徴とする半導体装
置。
A set of a metal layer for output, a metal layer for mounting a semiconductor chip, and a metal layer for input are arranged on a dielectric substrate in a straight line. A plurality of metal layer sets are arranged in parallel in the same order, and the dielectric substrate between the input metal layer and the semiconductor chip mounting metal layer of each set has a continuous layer. A common grounding metal layer is provided, and each set of the input metal layer and each set of the semiconductor chip mounting metal layer are prevented from directly facing each other by the grounding metal layer, and The grounding metal layer is provided with a grounding potential through a through hole formed in the dielectric substrate in a portion where the grounding metal layer is provided,
A semiconductor device characterized in that the input electrode and the output electrode of the semiconductor chip attached to each set of the semiconductor chip mounting metal layer are electrically connected to the input metal layer and the output metal layer of each set, respectively. .
JP57095917A 1982-06-04 1982-06-04 Semiconductor device Granted JPS58213456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57095917A JPS58213456A (en) 1982-06-04 1982-06-04 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57095917A JPS58213456A (en) 1982-06-04 1982-06-04 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS58213456A JPS58213456A (en) 1983-12-12
JPS6327859B2 true JPS6327859B2 (en) 1988-06-06

Family

ID=14150624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57095917A Granted JPS58213456A (en) 1982-06-04 1982-06-04 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS58213456A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02184054A (en) * 1989-01-11 1990-07-18 Toshiba Corp Hybrid type resin sealed semiconductor device
EP0713251B1 (en) * 1992-11-18 1999-01-07 Fuji Electric Co. Ltd. Semiconductor conversion device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56104146U (en) * 1980-01-08 1981-08-14

Also Published As

Publication number Publication date
JPS58213456A (en) 1983-12-12

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