JPS5861652A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5861652A JPS5861652A JP56159935A JP15993581A JPS5861652A JP S5861652 A JPS5861652 A JP S5861652A JP 56159935 A JP56159935 A JP 56159935A JP 15993581 A JP15993581 A JP 15993581A JP S5861652 A JPS5861652 A JP S5861652A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- transistor
- emitter
- conductor
- terminal
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6644—Packaging aspects of high-frequency amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01072—Hafnium [Hf]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Microwave Amplifiers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は半導体装置、特に内部に整合回路を有する高周
波半導体装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device, and particularly to a high frequency semiconductor device having an internal matching circuit.
従来、高周波高出力トランジスタは、接地インダクタン
スを最小にし最大の利得または出力を得るために、絶縁
性基板から成るトランジスタ容器内に、例えばエミッタ
接地で使用するトランジスタであれば、同一直線上に互
いに180°方向の異るエミッタ端子電極を2本設けて
、それぞれにトランジスタチップのエミッタボンデング
バットを介してボンデング細線を接続したり、トランジ
スタチップのエミッタ電極からトランジスタ容器のエミ
ッタ端子電極゛までの接地インダクタンスを更に減らす
ために、上述のトランジスタ容器の両工ミッタ端子電極
間にあらかじめリボン状等の接地電極板を般けておき、
トランジスタチップのエミッタボンデングパッドからは
この接地電極板にボンデング細線等を用いて短かい距離
で接続する構造がめった。Conventionally, high-frequency, high-power transistors are placed in a transistor container made of an insulating substrate in order to minimize ground inductance and obtain maximum gain or output. Two emitter terminal electrodes with different directions are provided, and a thin bonding wire is connected to each via the emitter bonding butt of the transistor chip, or the ground inductance from the emitter electrode of the transistor chip to the emitter terminal electrode of the transistor container is In order to further reduce
A structure in which the emitter bonding pad of the transistor chip is connected to this ground electrode plate over a short distance using a thin bonding wire or the like is rarely used.
その他、接地インダクタンスを減らす方法として、絶縁
性基板から成るトランジスタ容器内のトランジスタチッ
プに平行してエミッタポンディングパッド側の接地電極
にたんざく状のスルーホールを設は絶縁性基板の裏面に
設けられた接地メタライズ面と導通する方法等が一般に
行われていた。In addition, as a method to reduce grounding inductance, a tanza-like through hole is provided on the back side of the insulating substrate, parallel to the transistor chip in the transistor container made of the insulating substrate, and connected to the grounding electrode on the emitter bonding pad side. The commonly used method was to connect the ground metallized surface to a ground metallized surface.
しかしながら、上述の如き接地インダクタンスを減らす
方法は、いずれも構造および製法が複雑で、トランジス
タ容器の価格を上げる要因となりていた。また上述のい
ずれの方法においても、物理的に接地インダクタンスを
零にすることはできず、高利得、高出力を得ることには
限界がらりた。However, the above-described methods for reducing grounding inductance all have complicated structures and manufacturing methods, which are factors that increase the price of transistor containers. Furthermore, in any of the above-mentioned methods, it is impossible to physically reduce the ground inductance to zero, and there are limits to obtaining high gain and high output.
本発明の目的は、上述の如き価格上昇の原因をと9除き
、また接地インダクタンスの低減をはかり高出力、高帯
域の高周波高出力トランジスタを提供することにある。An object of the present invention is to eliminate the causes of the price increase as described above, reduce ground inductance, and provide a high-output, wide-band, high-frequency, high-output transistor.
本発明の他の目的は、トランジスタ全チップキャリアと
して、もしくは膜回路基板の一部として用いることを可
能とし、高周波出力混成獲集慣回路を容易に実現できる
トランジスタを提供することにある。Another object of the present invention is to provide a transistor that can be used as an entire transistor chip carrier or as part of a membrane circuit board, and that can easily realize a high frequency output hybrid acquisition/concentration circuit.
本発明によれは、トランジスタ容器内にもしくは混成膜
集積回路内に接地電極板ft設けることなく、接地イン
ダクタンスを物理的にも、回路的にも、減らすことを可
能ならしめる。即ち本発明は、絶縁性基板の狭面のほぼ
中央に帯状にメタライズされ、両端がスルーホールまた
は側面メタライズによシ基板の裏面メタライズと接続さ
れカニゴミツタ接地導体部と、該エミッタ接地部をはさ
んで前記絶縁性基板の表面の両側にそれぞれメタライザ
されたベース、コレクタ各端子4体部とを有する絶縁性
基板と、該絶縁性基板上に搭載されたトランジスタチッ
プお↓び複数のコンデンサチップと、該トランジスタチ
ップおよびコンデンサチップと前記エミッタ接地導体部
および前記各端子導体部とを接続する複数のボンデング
線とよ構成る半導体装置において、前記トランジスタチ
ップは、前記エミッタ接地導体部のほぼ中央に設けられ
エミッタ接地導体部とは分離された島状のコレクタ導体
部に搭載接続され、かつ前記コンデンサチップは、その
一方の電極が前記トランジスタチップと前記ベース端子
導体部の間のエミッタ接地導体部上に搭載接続されてお
シ、エミッタボンデング線、ベースボンデング線、コレ
クタボンデング線、それぞれは、前記トランジスタチッ
プと前記コレクタ端子部の間にあるエミッタ接地導体部
から前記トランジスタチップのエミッタボンデングパッ
ドを介して前記複数のコンデンサチップのうちのいずれ
かの他の電極に、前記トランジスタチップのベースボン
デングパッドから前記複数のコンデンサチップのうちの
残シの他の電極を介して前記ベース端子部に、前記コレ
クタ導体部から前記コレクタ端子部にそれぞれ接続され
ていることを特徴とする。According to the present invention, it is possible to reduce the ground inductance both physically and circuit-wise without providing a ground electrode plate ft within the transistor container or within the hybrid film integrated circuit. That is, in the present invention, metallization is carried out in a band shape approximately at the center of the narrow surface of an insulating substrate, and both ends are connected to the metallization on the back side of the substrate through through holes or side metallization, and the crab ivy grounding conductor portion and the emitter grounding portion are sandwiched therebetween. an insulating substrate having a base and four collector terminals respectively metallized on both sides of the surface of the insulating substrate; a transistor chip and a plurality of capacitor chips mounted on the insulating substrate; In a semiconductor device comprising a plurality of bonding lines connecting the transistor chip and capacitor chip to the emitter grounded conductor section and each terminal conductor section, the transistor chip is provided approximately at the center of the emitter grounded conductor section. The capacitor chip is mounted and connected to an island-shaped collector conductor section separated from the emitter ground conductor section, and one electrode of the capacitor chip is mounted on the emitter ground conductor section between the transistor chip and the base terminal conductor section. The emitter bonding line, the base bonding line, and the collector bonding line connected to each other connect the emitter bonding pad of the transistor chip from the emitter ground conductor section located between the transistor chip and the collector terminal section. from the base bonding pad of the transistor chip to the base terminal portion via the other electrode of the remaining capacitor chips; The collector conductor portion is connected to the collector terminal portion, respectively.
以下に本発明の実施例を図面を用いて説萌する。Embodiments of the present invention will be explained below with reference to the drawings.
第1図は本発明の半導体装置の第1の実施例で、第2図
はその等価回路図である。第2図の各回路素子は、第1
図の各部品と対応させるため第1図の部品の番号と同じ
番号に「ダッシユ」を付けて示しである。第1図におい
て、絶縁性基板1のほぼ中央にメタライズ層で帯状のエ
ミッタ接地導体部2を設けてあり、このエミッタ接地導
体部は絶縁性基板lの両側で側面メタライズ21.22
によシ絶縁性基板の裏面メタ2イズ層と導通している。FIG. 1 shows a first embodiment of a semiconductor device of the present invention, and FIG. 2 is an equivalent circuit diagram thereof. Each circuit element in FIG.
In order to correspond to each part in the figure, the same number as the part number in FIG. 1 is shown with a dash added. In FIG. 1, a strip-shaped emitter grounding conductor part 2 is provided with a metallized layer approximately in the center of an insulating substrate 1, and this emitter grounding conductor part has side metallization 21, 22 on both sides of the insulating substrate l.
It is electrically connected to the back metal layer of the highly insulating substrate.
また、エミッタ接地導体部の両端にはそれぞれ外部導出
用のエミック端子23 、24を設けである。Further, emic terminals 23 and 24 for leading to the outside are provided at both ends of the emitter grounded conductor portion, respectively.
一方、絶縁性基板1上には、エミッタ導体部2をはさん
でその両側に互いに1806方向の異るベース端子部−
3とコレクタ端子部4とがメタライズされており、ベー
ス、コレクタ各端子部にはそれぞれベース端子31、コ
レクタ端子41が接続されている。更に、エミッタ接地
導体部2のほぼ中央にはエミッタ接地導体27ドと電気
的に絶縁するための隙25を置いて島状のコレクタ導体
部5が設けである。コレクタ導体部5、ベース端子部剛
のエミッタ接地導体部とにそれぞれ、トランジスタチッ
プ50.5個のコンデンサを内臓した1個のコンデンサ
アレイチップ60がダイボンデングされている。そして
、エミッタボンデング線71と72は、トランジスタチ
ップ50のエミッタボンデングパッドを介してコレクタ
端子部4例のエミッタ接地導体部2から、コンデンサア
レイチップ60内のコンデンサに接続されている。ペー
スボンデング線81と82は、コンデンサアレイチップ
60の残りのコンデンサを介して、トランジスタチップ
50のベースボンデングノくツドカラヘース端子部3に
接続されている。コレクタボンデング線90.91はそ
れぞれコレクタ導体部5の端からコレクタ端子部4に接
続されている。On the other hand, on the insulating substrate 1, there are base terminal portions on both sides of the emitter conductor portion 2 in different directions.
3 and a collector terminal portion 4 are metallized, and a base terminal 31 and a collector terminal 41 are connected to the base and collector terminal portions, respectively. Furthermore, an island-shaped collector conductor part 5 is provided approximately at the center of the emitter ground conductor part 2 with a gap 25 for electrical insulation from the emitter ground conductor 27. One capacitor array chip 60 containing 50.5 transistor chips and capacitors is die-bonded to the collector conductor portion 5 and the emitter ground conductor portion of the rigid base terminal portion, respectively. The emitter bonding lines 71 and 72 are connected from the emitter ground conductor portions 2 of the four collector terminal portions to the capacitors in the capacitor array chip 60 via the emitter bonding pads of the transistor chip 50. The pace bonding lines 81 and 82 are connected to the base bonding terminal portion 3 of the transistor chip 50 via the remaining capacitors of the capacitor array chip 60. Collector bonding wires 90 and 91 are each connected from the end of the collector conductor section 5 to the collector terminal section 4.
周知のように、高周波高出力のトランジスタチップを、
エミッタ共通として動作させる場合1ペース・エミッタ
間の入力インピーダンスは、インダクタンス性であシ、
一方コレクタ・エミッタ間の出力インピーダンスは容量
性であるのでこのトランジスタチップを容器に収納して
使用する場合、動作周波数で高利得高出力を得るには、
エミッタ接地インピーダンスを極小にする構造にするこ
とのほか、入力側、出力側ともにできるだけトランジス
タチップのQ以上はQが上がないように、即ち、入力側
にはインダクタンス性を相殺するための容量性の、また
出力側には容量性を相殺するためのインダクタンス性の
トランジスタ容器またはトランジスタ各端子とトランジ
スタチップ間に整合回路を構成することが必要である。As is well known, high-frequency, high-output transistor chips,
When operating as a common emitter, the input impedance between one pace and the emitter must be inductance.
On the other hand, since the output impedance between the collector and emitter is capacitive, when using this transistor chip in a container, in order to obtain high gain and high output at the operating frequency,
In addition to creating a structure that minimizes emitter grounding impedance, we also ensure that the Q does not exceed the Q of the transistor chip on both the input and output sides. Also, on the output side, it is necessary to construct an inductance transistor container or a matching circuit between each terminal of the transistor and the transistor chip to cancel out the capacitance.
ところがこのようなトランジスタ容器または内部整合回
路を有するトランジスタ容器に収納されたトランジスタ
を設計しようとすれば、エミッタ接地インダクタンスを
極小にしようとすれば、入力または出力インピータンス
のQが上シ、逆に入出力インピーダンスのQを極小にし
ようとすればエミッタ接地インダクタンスが大きくなシ
やすく、そのため、入出力インピーダンスのQと、接地
インダクタンスの両方を同時に極小にすることは、言い
かえればトランジスタの性能をよりトランジスタチップ
の持つ性能に高めることは困難であった。本発明の半導
体装置は、トランジスタのエミッタ接地インダクタンス
とトランジスタの人、出力インピーダンスのQとの両方
を同時に極小にすることを意−図しており、第2図の等
膜回路からもわかるように、エミッタ接地インピーダン
スは動作周波数においてエミッタボンデング線72とコ
ンデンサ62とが直列共振するようにコンデンサ62の
容量を選ぶことにより最小にすることができる。このと
きトランジスタのエミッタ電流分はボンデング線71を
バイパスして接地に流すことができる。However, if you try to design a transistor housed in such a transistor container or a transistor container with an internal matching circuit, if you try to minimize the common emitter inductance, the Q of the input or output impedance will increase, or vice versa. If you try to minimize the Q of the input/output impedance, the common emitter inductance tends to become large.Therefore, minimizing both the Q of the input/output impedance and the grounding inductance at the same time will improve the performance of the transistor. It has been difficult to improve the performance of transistor chips. The semiconductor device of the present invention is intended to minimize both the common emitter inductance of the transistor and the output impedance Q of the transistor at the same time, as can be seen from the equal film circuit in FIG. , the emitter grounded impedance can be minimized by selecting the capacitance of capacitor 62 such that emitter bonding line 72 and capacitor 62 have series resonance at the operating frequency. At this time, the emitter current of the transistor can bypass the bonding line 71 and flow to the ground.
トランジスタのペース側入力インピーダンスのQは、ボ
ンデング線81と、エミッタボンデングパッドに最も近
接したエミッタ接地部2上にあるコンデンサアレイチッ
プ60内の容量65と、ボンデング線82とからなる整
合回路によシ極小に押えることが可能となる。Q of the input impedance on the pace side of the transistor is determined by a matching circuit consisting of the bonding line 81, the capacitor 65 in the capacitor array chip 60 on the emitter grounding part 2 closest to the emitter bonding pad, and the bonding line 82. This makes it possible to keep it to a minimum.
次にトランジスタのコレクタ側出力インピーダンスのQ
は、コレクタダイボンデングするためのコレクタ導体部
をコレクタ端子部から分離して、エミッタ接地導体部内
に島状にして最小の面積にして設けであるので、出力イ
ンピーダンスの容蓋成分はチップのそれと比べてほとん
ど増えず、ボンデング線90.91を経てコレクタ端子
部4に接続されるので、これも、動作周波数においてボ
ンデング線90.91とコレクタ端子部4とを整合回路
と倣してその長さを設計すれば極小に押えることができ
る。Next, Q of the output impedance on the collector side of the transistor
The collector conductor part for collector die bonding is separated from the collector terminal part and is provided in the form of an island within the emitter grounded conductor part to minimize the area, so the capacitor component of the output impedance is smaller than that of the chip. Since the bonding wire 90.91 and the collector terminal section 4 are connected to the collector terminal section 4 through the bonding wire 90.91 with almost no increase in the length, the bonding wire 90.91 and the collector terminal section 4 can be connected to each other at the operating frequency by imitating a matching circuit to increase their length. If you design it, you can make it extremely small.
第3図は、本発明の半導体装置の他の実施例で、第1図
の実施例のエミッタ端子23,24、ペース端子部3、
ペース端子31、コレクタ端子部4、コレクタ端子41
の無い場合のもので、その等膜回路図は第2図の点11
00で囲まれたものである。この半導体装置は、混成膜
集積回路内で使用すれば、即ち、膜回路基板の間にもし
くは、膜回路基板内に設けた穴の中に入れ、本実施例の
左側に位置する膜回路基板上の入力回路とコンデンサチ
ップの容量61,63.65とをボンデング線で接続す
ることによシ、かつ本実施例の右側に位置する膜回路基
板上の出力回路と、コレクタ導体部5とをボンデング線
で接続することによシ、本発明の第1の半導体装置と同
じ機能を持つことが可能となる。このとき、膜回路と半
導体装置とを接続するための人、出力側のボンデング線
はそれぞれ整合回路の一部としての役割を果たすことは
熱論のことである。躯1、第3図の実施例ではエミッタ
接地用のコンデンサ62.64と、ペース側入力整合回
路用シャントコンデンサ61,63.65とは片側裏面
を共通電極とするコンデンサアレイテップを用いたが、
本発明の半導体装置は、コンデンサアレイチップでなく
とも、即ち入力整合回路用コンデンサとエミッタ接地用
のコンデンサはそれぞれ別個にトランジスタのペース側
ボンデング側のエミッタ接地導体部にその一方の電柾が
接続されていさえすれば良い。FIG. 3 shows another embodiment of the semiconductor device of the present invention, in which the emitter terminals 23 and 24 of the embodiment of FIG.
Pace terminal 31, collector terminal section 4, collector terminal 41
The isomembrane circuit diagram is shown at point 11 in Figure 2.
It is surrounded by 00. If this semiconductor device is used in a hybrid film integrated circuit, that is, it is inserted between the film circuit boards or into a hole provided in the film circuit board, and placed on the film circuit board located on the left side of this embodiment. By connecting the input circuit and the capacitances 61, 63.65 of the capacitor chip with bonding wires, the output circuit on the membrane circuit board located on the right side of this embodiment and the collector conductor portion 5 are bonded. By connecting with a wire, it becomes possible to have the same function as the first semiconductor device of the present invention. At this time, it is a hot theory that the wire for connecting the membrane circuit and the semiconductor device and the bonding wire on the output side each play a role as a part of the matching circuit. In the embodiments shown in Figures 1 and 3, the capacitors 62, 64 for grounding the emitter and the shunt capacitors 61, 63, 65 for the input matching circuit on the pace side use a capacitor array tip with the back surface of one side serving as a common electrode.
The semiconductor device of the present invention does not need to be a capacitor array chip; in other words, the capacitor for the input matching circuit and the capacitor for emitter grounding are each connected separately to the emitter grounding conductor on the bonding side of the transistor. All you have to do is
高周波高出力トランジスタは、よシ高出力にするため、
同一チップ内に多数のトランジスタ素子を配列した9、
このよう表チップを同一容器内に複数個配列したシして
用いるのが一般的であるが、このような高周波高出力ト
ランジスタでは、しばしば熱的、高周波電力的不調和が
生じ、そのため使用したトランジスタ素子数に比例した
出力が取シ出せないことがある。この不調和を解消する
ためには、各トランジスタ素子のエミッタとエミッタ接
地導体部までの接地インダクタンスは適当量であった方
が高出力が得られる場合がオリ、このため接地キャパシ
タンス62,64およびボンデング線72.74は設け
ない方が良いことがある。High-frequency, high-output transistors are used to achieve even higher output.
9, where many transistor elements are arranged in the same chip;
It is common to use a plurality of such chips arranged in the same container, but such high frequency, high power transistors often cause thermal and high frequency power disharmony. It may not be possible to obtain an output proportional to the number of elements. In order to eliminate this disharmony, higher output can be obtained by setting an appropriate amount of grounded inductance between the emitter of each transistor element and the emitter grounded conductor. It may be better not to provide lines 72 and 74.
以上説明したように、本発明の半導体装置は、(1)絶
縁性基板の表面にエミッタ接地導体部を設けこれを裏面
接地メタライズと導通したこと、■)エミッタ接地導体
部内に島状に最小の面積のコレクタ導体部を設けて、そ
こにトランジスタチップをダイボンデングしたこと、(
3)トランジスタチップに近接、平行してペースボンデ
ングパッド側のエミッタ接地導体部上に、少くともペー
ス入力整合回路用シャフトコンデンサをダイボンデング
したこと、(4)エミッタ、ペースボンデング線それぞ
れハ、少くトもエミッタボンデングパッドから同じ側に
あるエミッタ接地導体ランドに、ペースボンデングパッ
ドから入力整合用シャントコンデンサに、それぞれ接続
すること、罠よ)(1)エミッタ接地導体部から裏面メ
タライズ接地までのインピーダンスは最小になる、■)
コレクタ端子部の寄生容量を排除でき、このためコレク
タ、接地間の容量は最小に押えられるので出力側Qを不
必要に上げなくて済む、(3)ペースボンデングパッド
からシャント容量に接続するボンデング線の長さを最小
にできるので、Qの最も低い入力整合回路を提供できる
、Q)エミッタボンデングパッドからエミッタ、接地導
体部までのインダクタンスを最適化できる。As explained above, the semiconductor device of the present invention has (1) a grounded emitter conductor on the surface of the insulating substrate and electrical continuity with the grounded metallization on the back surface; (
3) At least the shaft capacitor for the pace input matching circuit is die-bonded on the emitter grounding conductor on the pace bonding pad side close to and parallel to the transistor chip, (4) the emitter and pace bonding wires are each Also connect the emitter bonding pad to the emitter grounding conductor land on the same side, and the pace bonding pad to the input matching shunt capacitor. Impedance becomes minimum, ■)
Parasitic capacitance at the collector terminal can be eliminated, and the capacitance between the collector and ground can be kept to a minimum, so there is no need to unnecessarily increase the Q on the output side. (3) Bonding from the pace bonding pad to the shunt capacitor Since the line length can be minimized, the inductance from the emitter bonding pad to the emitter to ground conductor can be optimized to provide the lowest Q input matching circuit.
以上の理由から本発明は従来の高周波高山カド2ンジス
タと比べて構造上簡単で、かつそのため廉価で、高性能
で、Qの低い、従って回路上使いやすい半導体装置を提
供できる。For the above reasons, the present invention can provide a semiconductor device that is structurally simpler than the conventional high frequency high-frequency quadrupole transistor, is inexpensive, has high performance, has a low Q, and is therefore easy to use in terms of circuitry.
高出力トランジスタは熱の発生が大きいが、この熱の放
散をよくするために絶縁性基板としてしばしばBeO基
板が用いられる。このBeO基板の大きさは、熱抵抗を
小さくしようとすれはトランジスタチップの大きさよ多
かな)大きくしなければならず、このため従来はトラン
ジスタの入、出力インピーダンスのQが上ることを犠牲
にして来た。本発明の他の利点は本発明の第2の半導体
装置を混成膜集積回路に用いれば、上述の説明かられか
るようにトランジスタチップの人、出力インピーダンス
のQを上げることな(BeO基板の大きさをトランジス
タチップの大きさよりかなシ大きくすることができるの
で、熱抵抗を小さくし信頼性のよい高周波高出力混成膜
集積回路を提供することができる。High-power transistors generate a large amount of heat, and in order to improve the dissipation of this heat, a BeO substrate is often used as an insulating substrate. In order to reduce the thermal resistance, the size of this BeO substrate must be increased (perhaps more than the size of the transistor chip), and for this reason, conventionally, the size of the BeO substrate has to be increased at the expense of increasing the Q of the input and output impedance of the transistor. It's here. Another advantage of the present invention is that if the second semiconductor device of the present invention is used in a hybrid film integrated circuit, it is possible to avoid increasing the Q of the output impedance of the transistor chip (as can be seen from the above explanation). Since the size can be made slightly larger than the size of a transistor chip, it is possible to provide a high-frequency, high-output hybrid film integrated circuit with low thermal resistance and high reliability.
同、上記にエミッタ接地用のものの実施例を説明したが
、ペース接地用のものにも同様に適用でき、この場合ペ
ース電極が接地電極となシ、エミッタ電極が入力電極と
なる。Although the embodiment for emitter grounding has been described above, it can be similarly applied to pace grounding, in which case the pace electrode becomes the ground electrode and the emitter electrode becomes the input electrode.
第1図、第2図、第3叫はそれぞれ本発明の一実施例に
よる半導体装置の平面図、その等膜回路図、および本発
明の他の実施例による半導体装置の平面図である。
1・・・・・・絶縁性基板、2・・・・・・エミッタ接
地導体うンド、21.22・・・・・・側面メタライズ
、23,24・・・・・・エミッタ(外部接続)端子、
25・・・・・・隙、3・・・・・・ベース端子ランド
、31・・・・・・ベース(外部接続)端子、4・・・
・・・コレクタ端子ランド、41・・・・・・コレクタ
(外部接続)端子、5・・・・・・コレクタ導体ランド
、50・・・・・・トランジスタチップ、60・・・・
・・コンデンサアレイチップ、61,62,63,64
.65 ・・・・・・コンデンサアレイ内の各コンデ
ンサ、70(71゜72)・・・・・・エミッタボンデ
ング線、80(81,82)・・・・・・ベースボンデ
ング線、90(91,92)・・;・・・コレクタボン
デング線、100・・・・・・第3図の等膜回路図。
劣 / 良
んソ
鵠 2 図
父と Z/
笑 J1, 2, and 3 are a plan view of a semiconductor device according to one embodiment of the present invention, an isometric circuit diagram thereof, and a plan view of a semiconductor device according to another embodiment of the present invention, respectively. 1...Insulating substrate, 2...Emitter ground conductor bond, 21.22...Side metalization, 23, 24...Emitter (external connection) terminal,
25...Gap, 3...Base terminal land, 31...Base (external connection) terminal, 4...
...Collector terminal land, 41...Collector (external connection) terminal, 5...Collector conductor land, 50...Transistor chip, 60...
...Capacitor array chip, 61, 62, 63, 64
.. 65... Each capacitor in the capacitor array, 70 (71°72)... Emitter bonding line, 80 (81, 82)... Base bonding line, 90 ( 91, 92)... Collector bonding line, 100... Isofilm circuit diagram of FIG. 3. Inferior / Good Moose 2 With the Father Z / Lol J
Claims (1)
、該共通電極導体部をはさんτ前記絶縁性基板表面の両
側に対向してそれぞれ形成された入力および出力用導体
部と、前記絶縁性基板上に搭載されたトランジスタチッ
プおよびコンデンサチップとを有する半導体装置におい
て、前記トランジスタチップは、前記共通電極導体部の
ほぼ中天にこれから分離して設けられた島状の導体部上
に搭載続続され、かつ前記コンデンサチップは、その一
方の電極が前記トランジスタ容器”プと前記入力用導体
部間の前記共通電極導体部上に搭載接続され、共通電極
細線は前記トラン・ジスタチップと前記出力導体部間に
ある前記共通電極導体部から前記トランジスタチップの
共通電極を介して前記コンデンサチップに接続され、入
力細線は前記トランジスタチップの入力電極から前記コ
ンデンサチップを介して前記入力導体部に接続され、出
力細線は前記出力導体部から前記島状導体部に夫々接続
されていることを特徴とする半導体装14゜a common electrode conductor portion formed in a strip shape on the surface of the insulating substrate; input and output conductor portions formed respectively on opposite sides of the surface of the insulating substrate with the common electrode conductor portion sandwiched therebetween; In a semiconductor device having a transistor chip and a capacitor chip mounted on an insulating substrate, the transistor chip is mounted on an island-shaped conductor portion provided approximately in the middle of the common electrode conductor portion and separated from the common electrode conductor portion. one electrode of the capacitor chip is mounted and connected on the common electrode conductor portion between the transistor container and the input conductor portion, and a thin common electrode wire is connected between the transistor chip and the output conductor portion. The common electrode conductor part located between the parts is connected to the capacitor chip via the common electrode of the transistor chip, and the input thin wire is connected from the input electrode of the transistor chip to the input conductor part via the capacitor chip, 14. A semiconductor device characterized in that output thin wires are connected from the output conductor portion to the island-shaped conductor portion, respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56159935A JPS5861652A (en) | 1981-10-07 | 1981-10-07 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56159935A JPS5861652A (en) | 1981-10-07 | 1981-10-07 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5861652A true JPS5861652A (en) | 1983-04-12 |
JPS647682B2 JPS647682B2 (en) | 1989-02-09 |
Family
ID=15704364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56159935A Granted JPS5861652A (en) | 1981-10-07 | 1981-10-07 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5861652A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6022839U (en) * | 1983-07-22 | 1985-02-16 | 日本電気株式会社 | semiconductor equipment |
US4577213A (en) * | 1984-03-05 | 1986-03-18 | Honeywell Inc. | Internally matched Schottky barrier beam lead diode |
-
1981
- 1981-10-07 JP JP56159935A patent/JPS5861652A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6022839U (en) * | 1983-07-22 | 1985-02-16 | 日本電気株式会社 | semiconductor equipment |
US4577213A (en) * | 1984-03-05 | 1986-03-18 | Honeywell Inc. | Internally matched Schottky barrier beam lead diode |
Also Published As
Publication number | Publication date |
---|---|
JPS647682B2 (en) | 1989-02-09 |
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