JPS58207631A - レジスト塗布方法 - Google Patents
レジスト塗布方法Info
- Publication number
- JPS58207631A JPS58207631A JP8989482A JP8989482A JPS58207631A JP S58207631 A JPS58207631 A JP S58207631A JP 8989482 A JP8989482 A JP 8989482A JP 8989482 A JP8989482 A JP 8989482A JP S58207631 A JPS58207631 A JP S58207631A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- rotational speed
- coated
- predetermined
- rotation speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8989482A JPS58207631A (ja) | 1982-05-28 | 1982-05-28 | レジスト塗布方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8989482A JPS58207631A (ja) | 1982-05-28 | 1982-05-28 | レジスト塗布方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58207631A true JPS58207631A (ja) | 1983-12-03 |
| JPH046086B2 JPH046086B2 (OSRAM) | 1992-02-04 |
Family
ID=13983441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8989482A Granted JPS58207631A (ja) | 1982-05-28 | 1982-05-28 | レジスト塗布方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58207631A (OSRAM) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6334925A (ja) * | 1986-07-29 | 1988-02-15 | Nec Corp | フオトレジスト膜の形成方法 |
| JPH03245875A (ja) * | 1990-02-21 | 1991-11-01 | Mitsubishi Electric Corp | 塗布液の塗布方法 |
| JP2009207997A (ja) * | 2008-03-04 | 2009-09-17 | Toshiba Corp | 回転塗布方法、および回転塗布装置 |
| JP2015223556A (ja) * | 2014-05-28 | 2015-12-14 | 株式会社ディスコ | 保護被膜の被覆方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50136333A (OSRAM) * | 1974-04-17 | 1975-10-29 | ||
| JPS5530212A (en) * | 1978-08-25 | 1980-03-04 | Hitachi Ltd | Logical-operation type digital compander |
-
1982
- 1982-05-28 JP JP8989482A patent/JPS58207631A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50136333A (OSRAM) * | 1974-04-17 | 1975-10-29 | ||
| JPS5530212A (en) * | 1978-08-25 | 1980-03-04 | Hitachi Ltd | Logical-operation type digital compander |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6334925A (ja) * | 1986-07-29 | 1988-02-15 | Nec Corp | フオトレジスト膜の形成方法 |
| JPH03245875A (ja) * | 1990-02-21 | 1991-11-01 | Mitsubishi Electric Corp | 塗布液の塗布方法 |
| JP2009207997A (ja) * | 2008-03-04 | 2009-09-17 | Toshiba Corp | 回転塗布方法、および回転塗布装置 |
| JP2015223556A (ja) * | 2014-05-28 | 2015-12-14 | 株式会社ディスコ | 保護被膜の被覆方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH046086B2 (OSRAM) | 1992-02-04 |
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