JPS58206133A - キヤリヤ寿命測定装置 - Google Patents

キヤリヤ寿命測定装置

Info

Publication number
JPS58206133A
JPS58206133A JP8794482A JP8794482A JPS58206133A JP S58206133 A JPS58206133 A JP S58206133A JP 8794482 A JP8794482 A JP 8794482A JP 8794482 A JP8794482 A JP 8794482A JP S58206133 A JPS58206133 A JP S58206133A
Authority
JP
Japan
Prior art keywords
junction
photon beam
carrier
photocurrent
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8794482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0422019B2 (enrdf_load_stackoverflow
Inventor
Tadasuke Munakata
忠輔 棟方
Noriaki Honma
本間　則秋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8794482A priority Critical patent/JPS58206133A/ja
Priority to US06/432,805 priority patent/US4563642A/en
Priority to DE8282109245T priority patent/DE3271027D1/de
Priority to EP82109245A priority patent/EP0077021B1/en
Publication of JPS58206133A publication Critical patent/JPS58206133A/ja
Publication of JPH0422019B2 publication Critical patent/JPH0422019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/265—Contactless testing
    • G01R31/2656—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP8794482A 1981-10-09 1982-05-26 キヤリヤ寿命測定装置 Granted JPS58206133A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8794482A JPS58206133A (ja) 1982-05-26 1982-05-26 キヤリヤ寿命測定装置
US06/432,805 US4563642A (en) 1981-10-09 1982-10-05 Apparatus for nondestructively measuring characteristics of a semiconductor wafer with a junction
DE8282109245T DE3271027D1 (en) 1981-10-09 1982-10-06 Apparatus for nondestructively measuring characteristics of a semiconductor wafer having a junction
EP82109245A EP0077021B1 (en) 1981-10-09 1982-10-06 Apparatus for nondestructively measuring characteristics of a semiconductor wafer having a junction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8794482A JPS58206133A (ja) 1982-05-26 1982-05-26 キヤリヤ寿命測定装置

Publications (2)

Publication Number Publication Date
JPS58206133A true JPS58206133A (ja) 1983-12-01
JPH0422019B2 JPH0422019B2 (enrdf_load_stackoverflow) 1992-04-15

Family

ID=13928996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8794482A Granted JPS58206133A (ja) 1981-10-09 1982-05-26 キヤリヤ寿命測定装置

Country Status (1)

Country Link
JP (1) JPS58206133A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002083851A (ja) * 2000-09-08 2002-03-22 Mitsubishi Materials Silicon Corp 半導体基板の品質評価方法及びその品質評価装置
US7663385B2 (en) * 2002-12-13 2010-02-16 Nanometrics Incorporated Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002083851A (ja) * 2000-09-08 2002-03-22 Mitsubishi Materials Silicon Corp 半導体基板の品質評価方法及びその品質評価装置
US7663385B2 (en) * 2002-12-13 2010-02-16 Nanometrics Incorporated Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
US8232817B2 (en) 2002-12-13 2012-07-31 Nanometrics Incorporated Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
US9110127B2 (en) 2002-12-13 2015-08-18 Nanometrics Incorporated Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor

Also Published As

Publication number Publication date
JPH0422019B2 (enrdf_load_stackoverflow) 1992-04-15

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