JPS58205149A - 溶解速度差現像液の像鮮明性増大剤 - Google Patents

溶解速度差現像液の像鮮明性増大剤

Info

Publication number
JPS58205149A
JPS58205149A JP8921982A JP8921982A JPS58205149A JP S58205149 A JPS58205149 A JP S58205149A JP 8921982 A JP8921982 A JP 8921982A JP 8921982 A JP8921982 A JP 8921982A JP S58205149 A JPS58205149 A JP S58205149A
Authority
JP
Japan
Prior art keywords
fluorine
dissolution rate
hydrogen
pattern
image sharpness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8921982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0332782B2 (enrdf_load_stackoverflow
Inventor
Tsuneo Fujii
藤井　恒男
Takayuki Deguchi
出口　隆行
Masami Kakuchi
覚知　正美
Hiroshi Asakawa
浩 浅川
Osamu Kogure
小暮　攻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Daikin Industries Ltd
Nippon Telegraph and Telephone Corp
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Nippon Telegraph and Telephone Corp, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Priority to JP8921982A priority Critical patent/JPS58205149A/ja
Publication of JPS58205149A publication Critical patent/JPS58205149A/ja
Publication of JPH0332782B2 publication Critical patent/JPH0332782B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8921982A 1982-05-26 1982-05-26 溶解速度差現像液の像鮮明性増大剤 Granted JPS58205149A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8921982A JPS58205149A (ja) 1982-05-26 1982-05-26 溶解速度差現像液の像鮮明性増大剤

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8921982A JPS58205149A (ja) 1982-05-26 1982-05-26 溶解速度差現像液の像鮮明性増大剤

Publications (2)

Publication Number Publication Date
JPS58205149A true JPS58205149A (ja) 1983-11-30
JPH0332782B2 JPH0332782B2 (enrdf_load_stackoverflow) 1991-05-14

Family

ID=13964610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8921982A Granted JPS58205149A (ja) 1982-05-26 1982-05-26 溶解速度差現像液の像鮮明性増大剤

Country Status (1)

Country Link
JP (1) JPS58205149A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120107749A1 (en) * 2009-05-21 2012-05-03 Tokuyama Corporation Resist pattern forming method and developer
JP2012150445A (ja) * 2010-12-27 2012-08-09 Hoya Corp レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法
JP2012150446A (ja) * 2010-12-27 2012-08-09 Hoya Corp レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法
JP2012150443A (ja) * 2010-12-27 2012-08-09 Hoya Corp レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
JPS55100548A (en) * 1979-01-26 1980-07-31 Japan Synthetic Rubber Co Ltd Developer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
JPS55100548A (en) * 1979-01-26 1980-07-31 Japan Synthetic Rubber Co Ltd Developer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120107749A1 (en) * 2009-05-21 2012-05-03 Tokuyama Corporation Resist pattern forming method and developer
US8703402B2 (en) * 2009-05-21 2014-04-22 Tokuyama Corporation Resist pattern forming method and developer
JP2012150445A (ja) * 2010-12-27 2012-08-09 Hoya Corp レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法
JP2012150446A (ja) * 2010-12-27 2012-08-09 Hoya Corp レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法
JP2012150443A (ja) * 2010-12-27 2012-08-09 Hoya Corp レジスト現像剤、レジストパターンの形成方法及びモールドの製造方法

Also Published As

Publication number Publication date
JPH0332782B2 (enrdf_load_stackoverflow) 1991-05-14

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