JPS58202449A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS58202449A
JPS58202449A JP57084787A JP8478782A JPS58202449A JP S58202449 A JPS58202449 A JP S58202449A JP 57084787 A JP57084787 A JP 57084787A JP 8478782 A JP8478782 A JP 8478782A JP S58202449 A JPS58202449 A JP S58202449A
Authority
JP
Japan
Prior art keywords
substrate
reduction
lens
reticle
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57084787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328809B2 (enrdf_load_stackoverflow
Inventor
Yoshio Kawamura
河村　喜雄
Akihiro Takanashi
高梨　明紘
Shinji Kuniyoshi
伸治 国吉
Toshishige Kurosaki
利栄 黒崎
Tsuneo Terasawa
恒男 寺澤
Sumio Hosaka
純男 保坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57084787A priority Critical patent/JPS58202449A/ja
Publication of JPS58202449A publication Critical patent/JPS58202449A/ja
Publication of JPH0328809B2 publication Critical patent/JPH0328809B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57084787A 1982-05-21 1982-05-21 縮小投影露光装置 Granted JPS58202449A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57084787A JPS58202449A (ja) 1982-05-21 1982-05-21 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57084787A JPS58202449A (ja) 1982-05-21 1982-05-21 縮小投影露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4054756A Division JPH0712019B2 (ja) 1992-03-13 1992-03-13 投影露光方法及び投影露光装置

Publications (2)

Publication Number Publication Date
JPS58202449A true JPS58202449A (ja) 1983-11-25
JPH0328809B2 JPH0328809B2 (enrdf_load_stackoverflow) 1991-04-22

Family

ID=13840403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57084787A Granted JPS58202449A (ja) 1982-05-21 1982-05-21 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS58202449A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262421A (ja) * 1984-06-11 1985-12-25 Hitachi Ltd 投影露光方法およびその装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPS6442820A (en) * 1987-08-10 1989-02-15 Nec Corp Manufacture of semiconductor integrated circuit
JPH07183210A (ja) * 1994-07-13 1995-07-21 Hitachi Ltd 投影露光装置
JP2011014745A (ja) * 2009-07-02 2011-01-20 Canon Inc 露光方法、露光装置及びデバイス製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262421A (ja) * 1984-06-11 1985-12-25 Hitachi Ltd 投影露光方法およびその装置
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPS6442820A (en) * 1987-08-10 1989-02-15 Nec Corp Manufacture of semiconductor integrated circuit
JPH07183210A (ja) * 1994-07-13 1995-07-21 Hitachi Ltd 投影露光装置
JP2011014745A (ja) * 2009-07-02 2011-01-20 Canon Inc 露光方法、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JPH0328809B2 (enrdf_load_stackoverflow) 1991-04-22

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